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Liang, Fremont
Ardis Liang, Fremont, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090041332 | METHODS FOR GENERATING A STANDARD REFERENCE DIE FOR USE IN A DIE TO STANDARD REFERENCE DIE INSPECTION AND METHODS FOR INSPECTING A WAFER - Methods for generating a standard reference die for use in a die to standard reference die inspection and methods for inspecting a wafer are provided. One computer-implemented method for generating a standard reference die for use in a die to standard reference die inspection includes acquiring output of an inspection system for a centrally located die on a wafer and one or more dies located on the wafer. The method also includes combining the output for the centrally located die and the one or more dies based on within die positions of the output. In addition, the method includes generating the standard reference die based on results of the combining step. | 02-12-2009 |
| 20100329540 | METHODS FOR GENERATING A STANDARD REFERENCE DIE FOR USE IN A DIE TO STANDARD REFERENCE DIE INSPECTION AND METHODS FOR INSPECTING A WAFER - Methods for generating a standard reference die for use in a die to standard reference die inspection and methods for inspecting a wafer are provided. One computer-implemented method for generating a standard reference die for use in a die to standard reference die inspection includes acquiring output of an inspection system for a centrally located die on a wafer and one or more dies located on the wafer. The method also includes combining the output for the centrally located die and the one or more dies based on within die positions of the output. In addition, the method includes generating the standard reference die based on results of the combining step. | 12-30-2010 |
Chao Liang, Fremont, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090100082 | REPLICATION AND MAPPING MECHANISM FOR RECREATING MEMORY DURATIONS - Techniques for migrating duration trees from a source database server (or instance) to a destination database server (or instance) are provided. A duration is a memory management construct that allows database components to group related areas of memory together. A source duration tree is captured at the source database server and combined with a destination duration tree at the destination database server. Any duration identifiers in the source duration tree that conflict with (i.e., are the same as) a duration identifier in the destination duration tree are mapped to new duration identifiers. | 04-16-2009 |
| 20100005097 | CAPTURING AND RESTORING DATABASE SESSION STATE - Techniques are described herein for capturing and restoring database session state. Production database server components save the session state of each of a plurality of database sessions. The components store workload units that are processed in these sessions. The components store updated session states in response to certain events. Thus, the components may capture multiple session states, pertaining to various different points in time, for each session. The captured session states and the captured workload are moved to a test database server. A user selects, from among the time points represented by the session states, a point in time at which the user would like workload replay to begin. Sessions are re-created on the test database server. Session states of these sessions are set to reflect the session states as they existed at the user-selected time point. Workload units are replayed in the sessions relative to the test database server. | 01-07-2010 |
Jianjun Liang, Fremont, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100065111 | SOLAR CELLS FABRICATED BY USING CVD EPITAXIAL SI FILMS ON METALLURGICAL-GRADE SI WAFERS - One embodiment of the present invention provides a method for fabricating a solar cell. The method includes: melting a metallurgical-grade (MG) Si feedstock, lowering a single-crystalline Si seed to touch the surface of the molten MG-Si, slowly pulling out a single-crystal Si ingot of the molten MG-Si, processing the Si ingot into single crystal Si wafers to form MG-Si substrates for subsequent epitaxial growth, leaching out residual metal impurities in the MG-Si substrate, epitaxially growing a layer of single-crystal Si thin film doped with boron on the MG-Si substrate, doping phosphor to the single-crystal Si thin film to form an emitter layer, depositing an anti-reflection layer on top of the single-crystal Si thin film, and forming the front and the back electrical contacts. | 03-18-2010 |
| 20100229927 | HETEROJUNCTION SOLAR CELL BASED ON EPITAXIAL CRYSTALLINE-SILICON THIN FILM ON METALLURGICAL SILICON SUBSTRATE DESIGN - One embodiment of the present invention provides a heterojunction solar cell. The solar cell includes a metallurgical-grade Si (MG-Si) substrate, a layer of heavily doped crystalline-Si situated above the MG-Si substrate, a layer of lightly doped crystalline-Si situated above the heavily doped crystalline-Si layer, a backside ohmic-contact layer situated on the backside of the MG-Si substrate, a passivation layer situated above the heavily doped crystalline-Si layer, a layer of heavily doped amorphous Si (a-Si) situated above the passivation layer, a layer of transparent-conducting-oxide (TCO) situated above the heavily doped a-Si layer, and a front ohmic-contact electrode situated above the TCO layer. | 09-16-2010 |
Qiwei Liang, Fremont, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090277587 | FLOWABLE DIELECTRIC EQUIPMENT AND PROCESSES - Substrate processing systems are described that may include a processing chamber having an interior capable of holding an internal chamber pressure different from an external chamber pressure. The systems may also include a remote plasma system operable to generate a plasma outside the interior of the processing chamber. In addition, the systems may include a first process gas channel operable to transport a first process gas from the remote plasma system to the interior of the processing chamber, and a second process gas channel operable to transport a second process gas that is not treated by the remote plasma system. The second process gas channel has a distal end that opens into the interior of the processing chamber, and that is at least partially surrounded by the first process gas channel. | 11-12-2009 |
| 20090280650 | FLOWABLE DIELECTRIC EQUIPMENT AND PROCESSES - Methods of depositing and curing a dielectric material on a substrate are described. The methods may include the steps of providing a processing chamber partitioned into a first plasma region and a second plasma region, and delivering the substrate to the processing chamber, where the substrate occupies a portion of the second plasma region. The methods may further include forming a first plasma in the first plasma region, where the first plasma does not directly contact with the substrate, and depositing the dielectric material on the substrate to form a dielectric layer. One or more reactants excited by the first plasma are used in the deposition of the dielectric material. The methods may additional include curing the dielectric layer by forming a second plasma in the second plasma region, where one or more carbon-containing species is removed from the dielectric layer. | 11-12-2009 |
| 20100098882 | PLASMA SOURCE FOR CHAMBER CLEANING AND PROCESS - Apparatus and methods for processing a substrate and processing a process chamber are provided. In one embodiment, an apparatus is provided for processing a substrate including a power source, a switch box coupled to the power source and the switch box having a switch interchangeable between a first position and a second position, a first match box coupled to the switch box, a plasma generator coupled to the first match box, a second match box coupled to the switch box, and a remote plasma source coupled to the second match box. | 04-22-2010 |
| 20110011338 | FLOW CONTROL FEATURES OF CVD CHAMBERS - Apparatus and methods for gas distribution assemblies are provided. In one aspect, a gas distribution assembly is provided comprising an annular body comprising an annular ring having an inner annular wall, an outer wall, an upper surface, and a bottom surface, an upper recess formed into the upper surface, and a seat formed into the inner annular wall, an upper plate positioned in the upper recess, comprising a disk-shaped body having a plurality of first apertures formed therethrough, and a bottom plate positioned on the seat, comprising a disk-shaped body having a plurality of second apertures formed therethrough which align with the first apertures, and a plurality of third apertures formed between the second apertures and through the bottom plate, the bottom plate sealingly coupled to the upper plate to fluidly isolate the plurality of first and second apertures from the plurality of third apertures. | 01-20-2011 |
| 20110045676 | REMOTE PLASMA SOURCE SEASONING - Methods of seasoning a remote plasma system are described. The methods include the steps of flowing a silicon-containing precursor into a remote plasma region to deposit a silicon containing film on an interior surface of the remote plasma system. The methods reduce reactions with the seasoned walls during deposition processes, resulting in improved deposition rate, improved deposition uniformity and reduced defectivity during subsequent deposition. | 02-24-2011 |
Tao Liang, Fremont, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20080243842 | Optimizing the performance of duplicate identification by content - In accordance with the disclosure, there is provided a method for identifying duplicate documents comprising drafting a first document and creating a near unique representative string based on the document content. The method further comprises searching for other documents with the same NRS and selectively assigning a duplicate group identification to the first document, the duplicate group identification is unique if no near unique representative string matches are found, or the duplicate group identification is the same as an associated duplicate document's duplicate group identification that matches the NRS. The method further comprises placing the DGI into a meta-data of the first document and recalling a list of duplicates of a particular document based upon user demand by searching the meta-data and selecting documents using the same DGI. | 10-02-2008 |
| 20100223234 | SYSTEM AND METHOD FOR PROVIDING S/MIME-BASED DOCUMENT DISTRIBUTION VIA ELECTRONIC MAIL MECHANISMS - A content or document management system includes a content or document repository; a dedicated e-mail account; and a mail agent associated with the dedicated e-mail account. The mail agent processes a received e-mail message to determine a sender's identity; authenticates the identity of the sender and an authorization of the sender with respect to the content or document repository; parses, when a sender is authenticated and authorized, document request information from the e-mail message; and either stores a document to or retrieves a document from the content or document repository. The mail agent may authenticate the identity of the sender using a digital signature, or may authenticate the identity of the sender using an e-mail address in a FROM header field of the received e-mail message header. The mail agent may decrypt encrypted messages from the sender, and may sign and encrypt responses to the sender. | 09-02-2010 |
Yikai Liang, Fremont, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090167405 | Reduced Leakage Voltage Level Shifting Circuit - A level shifting circuit includes a first stage and a second stage. The first stage and second stage are operatively coupled to a first and second power supply. The first stage translates a differential input voltage into an intermediate differential voltage. The second stage translates the intermediate differential voltage into a differential output voltage and provides feedback to the first stage in response to translating the intermediate differential voltage. The first stage reduces current flow between the first and second power supply through the second stage in response to the feedback. | 07-02-2009 |
| 20110133788 | DUAL FUNCTION VOLTAGE AND CURRENT MODE DIFFERENTIAL DRIVER - A dual function differential driver includes a voltage mode differential driver portion and a current mode differential driver portion. Control circuitry is connected to the voltage mode differential driver portion and the current mode differential driver portion. The control circuitry switches the dual function differential driver between operation as a voltage mode differential driver and operation as a current mode differential driver. | 06-09-2011 |