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Lian, CA

Chenyang Lian, El Cerrito, CA US

Patent application numberDescriptionPublished
20090265281Account Portfolio Risk Characterization - Input characterizing one or more economic indicators and a portfolio of accounts can be used to estimate a portfolio level effect of the economic indicators on the portfolio of accounts is estimated. Based on this estimation, an account level effect of the economic indicators is simulated for each of the accounts. The overall affect of the simulated account level effects approximates the portfolio level effect. Simulated account level effects can thereafter be aggregated in order to characterize future risk for the portfolio of accounts. Related apparatus, systems, techniques and articles are also described.10-22-2009
20100125532METHOD AND APPARATUS FOR MODELING ECONOMIC CONDITIONS AS APPLIED TO MULTIPLE RISK GRADES - A computerized method includes scoring a plurality of loans, and banding the plurality of loans into risk pools on the basis of the scores associated with the plurality of loans. The computerized method also includes modeling a change in y-intercept and slope of the natural log of the odds to the loan scores relationship, using that predicted log odds to calculate the probability of default for the plurality of risk pools over time as a function of a set of macro-economic data. A machine readable medium provides instructions that, when executed by a machine, cause the machine to perform the above on a system for determining an amount of capital to hold in reserve for a plurality of loan risk pools and to set strategies for managing risk for a plurality of risk pools.05-20-2010

George J. Lian, Sacramento, CA US

Patent application numberDescriptionPublished
20110218542Systems and instrumentalities for use in total ankle replacement surgery - Custom radiographically designed tibial and talar cutting guide system and instrumentalities including a tibial cutting guide position verification device is disclosed. A computer-based system and method for making the custom radiographically designed tibial and talar cutting guides is also disclosed. Further disclosed is an adjustable tibial reaming guide positioning system for allowing a position for reaming of a distal tibia to be adjusted during total ankle replacement surgery and, particularly, during total ankle arthroplasty for prostheses with an intramedullary stem.09-08-2011

George John Lian, Sacramento, CA US

Patent application numberDescriptionPublished
20100262150Custom radiographically designed cutting guides and instruments for use in total ankle replacement surgery - A system comprised of custom radiographically designed tibial and talar cutting guides, a tibial reaming guide and bit, and instrumentalities for use in total ankle replacement surgery and a computer-based system and method for making the custom radiographically designed tibial and talar cutting guides.10-14-2010

Lei Lian, Santa Clara, CA US

Patent application numberDescriptionPublished
20090158265IMPLEMENTATION OF ADVANCED ENDPOINT FUNCTIONS WITHIN THIRD PARTY SOFTWARE BY USING A PLUG-IN APPROACH - Embodiments described herein generally relate to a method of updating a software routine with subprograms and subroutines that can be accessed by an end user on an as-needed basis. In one embodiment, a method of providing a control function for a semiconductor process to a pre-existing software architecture is described. The method includes providing a plug-in to the pre-existing software architecture, providing an upgrade library file having the control function therein, and uploading the upgrade library file to the pre-existing software architecture at the plug-in to facilitate process control of the semiconductor process.06-18-2009
20090218314ADVANCED PROCESS SENSING AND CONTROL USING NEAR INFRARED SPECTRAL REFLECTOMETRY - Embodiments described herein provide a method and apparatus for obtaining process information in a substrate manufacturing process using plasma. In one embodiment, a chamber is provided having one or more optical metrology modules that are positioned such that optical energy from the plasma process is detected at substantially orthogonal angles. Metrics derived from detected optical energy may be used for endpoint determination, substrate temperature, and monitoring of critical dimensions on the substrate.09-03-2009
20100133232DETERMINING ENDPOINT IN A SUBSTRATE PROCESS - An endpoint detection system for detecting an endpoint of a process comprises a polychromatic light source which emits polychromatic light. The light is reflected from a substrate. A light wavelength selector receives the reflected polychromatic light and determines a wavelength of light at which a local intensity of the reflected light is maximized during the process. In one version, the wavelength selector comprises a diffraction grating to generate a plurality of light beams having different wavelengths from the reflected polychromatic light and a light detector to receive the light beams having different wavelengths and generate an intensity signal trace of the intensity of each wavelength of the polychromatic reflected light.06-03-2010
20110019201DETERMINING ENDPOINT IN A SUBSTRATE PROCESS - An endpoint detection method for detecting an endpoint of a process comprises reflecting polychromatic light from a substrate, the polychromatic light having a plurality of wavelengths. A plurality of light beams having different wavelengths are generated from the reflected polychromatic light. A wavelength of light is determined from the plurality of light beams, at which a local intensity of the reflected light is maximized.01-27-2011

Patent applications by Lei Lian, Santa Clara, CA US

Lei Lian, Fremont, CA US

Patent application numberDescriptionPublished
20100009470WITHIN-SEQUENCE METROLOGY BASED PROCESS TUNING FOR ADAPTIVE SELF-ALIGNED DOUBLE PATTERNING - An apparatus for adaptive self-aligned dual patterning and method thereof. The method includes providing a substrate to a processing platform configured to perform an etch process and a deposition process and a metrology unit configured for in-vacuo critical dimension (CD) measurement. The in-vacuo CD measurement is utilized for feedforward adaptive control of the process sequence processing platform or for feedback and feedforward adaptive control of chamber process parameters. In one aspect, a first layer of a multi-layered masking stack is etched to form a template mask, an in-vacuo CD measurement of the template mask is made, and a spacer is formed, adjacent to the template mask, to a width that is dependent on the CD measurement of the template mask.01-14-2010
20100076729SELF-DIAGNOSTIC SEMICONDUCTOR EQUIPMENT - Methods and apparatus for predictive maintenance of semiconductor process equipment are provided herein. In some embodiments, a method of performing predictive maintenance on semiconductor processing equipment may include performing at least one self-diagnostic test on the semiconductor processing equipment with no substrate present in the equipment. The self-diagnostic test may include measuring one or more predictor parameters and one or more response parameters from the semiconductor process equipment. One or more expected response parameters may be calculated based upon the measured predictor parameters utilizing a predictive model. The one or more measured response parameters may be compared with the one or more expected response parameters. A determination may be made whether equipment maintenance is required based upon the comparison.03-25-2010
20110013175METHOD AND APPARATUS FOR IN-SITU METROLOGY OF A WORKPIECE DISPOSED IN A VACUUM PROCESSING CHAMBER - A method and apparatus for in-situ metrology of a workpiece disposed in a vacuum processing chamber. The apparatus may include an optical assembly external to the processing chamber configured to focus a relatively large optical spot over a relatively large working distance to acquire a TE and TM spectra from a periodic array on the workpiece. The workpiece may be disposed in the processing chamber with an arbitrary orientation which is first determined via a reflectance measurement. TE and/or TM spectra may then be acquired by initiating a periodic triggering of a flash lamp based on the determined workpiece orientation to account for variation in placement of the workpiece within the processing chamber. The periodic array from which spectra are collected may be a memory array being fabricated in a semiconductor wafer.01-20-2011

Roger Jia-Jyi Lian, San Jose, CA US

Patent application numberDescriptionPublished
20100281533METHOD AND APPARATUS FOR IMPLEMENTING A LAYER 3/LAYER 7 FIREWALL IN AN L2 DEVICE - Methods and apparatus for transferring packets in a packet switched communication system. A system is provided that includes an L11-04-2010

Simon Lian, San Jose, CA US

Patent application numberDescriptionPublished
20090271560Dynamic Fix-Up of Global Variables During System BIOS Execution - A method is described for preserving the flexibility associated with relative memory addressing in programs designed to be stored in read-only memory.10-29-2009

Wei Lian, Fremont, CA US

Patent application numberDescriptionPublished
20110211441SEQUENTIAL HEARTBEAT PACKET ARRANGEMENT AND METHODS THEREOF - An arrangement in a network tap for monitoring state of a monitoring system is provided. The arrangement includes a set of network ports that includes a set of input network ports for receiving data traffic and a set of output network ports for outputting the data traffic from the network tap. The arrangement also includes a monitoring port that is configured to receive the data traffic from the set of network ports and to forward the data traffic onward to the monitoring system. The arrangement further includes a logic component configured for executing a sequential heartbeat diagnostic test. The sequential heartbeat diagnostic test is configured for providing a first set of sequential heartbeat packets for testing and determining the state of the monitoring system. The arrangement yet also includes a logic component for activating one or more events when a failure condition exists for the state of the monitoring system.09-01-2011
20110211492IBYPASS HIGH DENSITY DEVICE AND METHODS THEREOF - A high density network arrangement for managing an integrated secured multiple networks arrangement is provided. The arrangement includes a power module for providing power to a circuitry of the high density network arrangement. The arrangement also includes a plurality of network interfaces, wherein each network interface of the plurality of network interfaces is configured for coupling with a network arrangement. The arrangement further includes a processor for providing processing capability to the high density network arrangement. The arrangement yet also includes logic arrangement for managing data traffic flowing through the plurality of network interfaces, wherein the data traffic is configured to traverse the high density network arrangement between the plurality of network arrangement interfaces irrespective whether the power is provided to the circuitry of the high density network arrangement.09-01-2011
20110214181DUAL BYPASS MODULE AND METHODS THEREOF - A dual bypass module for managing an integrated secured network environment is provided. The module includes network ports that receive and transmit data traffic flowing through the network. The module also includes a set of monitoring ports that is configured for transmitting the data traffic between the dual bypass module and a set of monitoring systems. The module further includes a set of relays configured for controlling the flow of data through the dual bypass module. The module yet also includes a configurable integrated circuit. The configurable integrated circuit includes at least one of a first logic arrangement for determining conditions of the set of monitoring systems, a second logic arrangement for redirecting the data traffic through a secured alternate path when a monitoring system is unavailable, and a third logic arrangement for redirecting the data traffic through a secured alternate path when a communication path becomes unavailable.09-01-2011

Ying Lian, Vallejo, CA US

Patent application numberDescriptionPublished
20090208530HIV polynucleotides and polypeptides derived from Botswana MJ4 - The present disclosure relates to novel polynucleotides that encode HIV Env polypeptides. In particular, the disclosure relates to sequences derived from HIV strain Botswana MJ4 encoding Env polypeptides. Compositions comprising these polynucleotides and methods of using polynucleotides are also disclosed.08-20-2009
20100316698POLYNUCLEOTIDES ENCODING ANTIGENIC HIV TYPE C POLYPEPTIDES, POLYPEPTIDES AND USES THEREOF - The present invention relates to polynucleotides encoding immunogenic HIV type C polypeptides. Uses of the polynucleotides in applications including DNA immunization, generation of packaging cell lines, and production of HIV Type C proteins are also described.12-16-2010
20110045017HIV VACCINE FOR MUCOSAL DELIVERY - This invention is directed to pharmaceutical compositions comprising an HIV antigen and a mucosal adjuvant and methods for raising an immune response in a subject by administering these compositions. Preferably, the pharmaceutical compositions of the invention can be used to treat or prevent HIV infection.02-24-2011
20110052632HIV POLYNUCLEOTIDES AND POLYPEPTIDES DERIVED FROM BOTSWANA MJ4 - The present disclosure relates to novel polynucleotides that encode HIV Env polypeptides. In particular, the disclosure relates to sequences derived from HIV strain Botswana MJ4 encoding Env polypeptides. Compositions comprising these polynucleotides and methods of using these polynucleotides are also disclosed.03-03-2011
20110065146Expression of HIV polypeptides and production of virus-like particles - The present invention relates to the efficient expression of HIV polypeptides in a variety of cell types, including, but not limited to, mammalian, insect, and plant cells. Synthetic expression cassettes encoding the HIV Gag-containing polypeptides are described, as are uses of the expression cassettes in applications including DNA immunization, generation of packaging cell lines, and production of Env-, tat- or Gag-containing proteins. The invention provides methods of producing Virus-Like Particles (VLPs), as well as, uses of the VLPs including, but not limited to, vehicles for the presentation of antigens and stimulation of immune response in subjects to whom the VLPs are administered.03-17-2011
20110110977Multiclade HIV Vaccines - Compositions comprising multivalent and adjuvanted HIV Env glycoproteins are described. Methods of using these compositions for treatment and prevention of HIV are also provided.05-12-2011

Patent applications by Ying Lian, Vallejo, CA US

Ying Lian, Albany, CA US

Patent application numberDescriptionPublished
20080261271EXPRESSION OF HIV POLYPEPTIDES AND PRODUCTION OF VIRUS-LIKE PARTICLES - The present invention relates to the efficient expression of HIV polypeptides in a variety of cell types, including, but not limited to, mammalian, insect, and plant cells. Synthetic expression cassettes encoding the HIV Gag-containing polypeptides are described, as are uses of the expression cassettes in applications including DNA immunization, generation of packaging cell lines, and production of Env-, tat- or Gag-containing proteins. The invention provides methods of producing Virus-Like Particles (VLPs), as well as, uses of the VLPs including, but not limited to, vehicles for the presentation of antigens and stimulation of immune response in subjects to whom the VLPs are administered.10-23-2008

Yingwu Lian, Artesia, CA US

Patent application numberDescriptionPublished
20100007882RAPID ACQUISITION ELLIPSOMETRY - Disclosed embodiments pertain to optical assemblies which impart a spatially dependent rotation to linearly polarized light. A pair of optical assemblies may be used to apply a spatially dependent rotation to linearly polarized light in the region between the optical assemblies, and produce a spatially independent rotation after traversing the second optical assembly. A pair of optical assemblies may be used in combination with a wave plate to allow a determination of the Stokes parameters of an elliptically polarized beam of light.01-14-2010
20100246013LOW ABSORPTION OPTICAL COATING APPARATUS AND RELATED METHODS USING THF4/BAF2 COMBINATION - A very low energy-absorption coating and related methods for use with high power CO09-30-2010