| Patent application number | Description | Published |
|---|
| 20090136654 | Contact Angle Attenuations on Multiple Surfaces - A template is treated to provide a surfactant rich region and a surfactant depleted region. A contact angle at the surfactant rich region may be greater than, less than, or substantially similar to a contact angle of the surfactant depleted region. | 05-28-2009 |
| 20090256289 | Preserving Filled Features When Vacuum Wiping - A method/process for curing imprint on a template prior to contact with a substrate. A curing process is used to adhere the imprint to a wafer or substrate. Monomer is deposited on a template and then partially cured using a UV exposure. The exposure is controlled so that the imprint is cured past the gel point, but still retains a thin liquid layer of uncured monomer at the surface that will bond with the wafer. Further, this partially cured layer enables the alignment adjustments between the template and the substrate to be performed after contact between the two without pulling any monomer out of the features. | 10-15-2009 |
| 20100059914 | Chucking System Comprising an Array of Fluid Chambers - The present invention is directed towards a chucking system to hold a substrate, said system including, inter alia, a chuck body having first and second opposed sides, said first side including an array of fluid chambers arranged in rows and columns, said fluid chambers each comprising first and second spaced-apart recesses defining first and second spaced-apart support regions, with said first support region cincturing said second support region and said first and second recesses, and said second support region cincturing said second recess, with said substrate resting against said first and second support regions, with said first recess and a portion of said substrate in superimposition therewith defining a first chamber and said second recess and a portion of said substrate in superimposition therewith defining a second chamber, with each column of said first chambers and each row of said second chambers being in fluid communication with a differing source of fluid to control a flow of fluid in said array of fluid chambers. | 03-11-2010 |
| 20100143521 | Method for Expelling Gas Positioned Between a Substrate and a Mold - The present invention is directed towards a system for expelling a gas positioned between a substrate and a mold, the substrate and the mold further having a liquid positioned therebetween. | 06-10-2010 |
| 20100286811 | Residual Layer Thickness Measurement and Correction - In nano-imprint lithography it is important to detect thickness non-uniformity of a residual layer formed on a substrate. Such non-uniformity is compensated such that a uniform residual layer may be formed. Compensation is performed by calculating a corrected fluid drop pattern. | 11-11-2010 |
| 20110031651 | DESIRABLE WETTING AND RELEASE BETWEEN AN IMPRINT LITHOGRAPHY MOLD AND A POLYMERIZABLE COMPOSITION - Improved wetting characteristics together with improved release characteristics with respect to a substrate and an imprint lithography mold having imprinting material disposed therebetween. | 02-10-2011 |
