Lachowicz
Agata Lachowicz, Erkrath DE
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20100012500 | DEPOSITION OF CONDUCTIVE POLYMER AND METALLIZATION OF NON-CONDUCTIVE SUBSTRATES - A process is provided for metallizing a surface of a substrate with electrolytically plated copper metallization, the process comprising electrolytically depositing copper over the electrically conductive polymer by immersing the substrate in an electrolytic composition and applying an external source of electrons, wherein the electrolytic composition comprises a source of copper ions and has a pH between about 0.5 and about 3.5. In another aspect, a process is provided for metallizing a surface of a dielectric substrate with electrolytically plated copper metallization, the process comprising immersing the substrate into a catalyst composition comprising a precursor for forming an electrically conductive polymer on the surface of the dielectric substrate and a source of Mn(II) ions in an amount sufficient to provide an initial concentration of Mn(II) ions of at least about 0.1 g/L to form an electrically conductive polymer on the surface of the dielectric substrate, and electrolytically depositing copper over said electrically conductive polymer. | 01-21-2010 |
Agata Lachowicz, Karlstein DE
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20130220420 | METHOD FOR THE WET-CHEMICAL ETCHING BACK OF A SOLAR CELL EMITTER - A method for the wet-chemical etching of a solar cell emitter is provided. The method performs homogeneous etching using an alkaline etching solution containing at least one oxidizing agent selected from the group consisting of peroxodisulphates, peroxomonosulphates and hypochlorite. | 08-29-2013 |
20130255772 | METHOD FOR THE WET-CHEMICAL ETCHING BACK OF A SOLAR CELL EMITTER - A method for the wet-chemical etching of a highly doped silicon layer in an etching solution is provided. The method includes using, as an etching solution so as to perform etching homogeneously, an HF-containing etching solution containing at least one oxidizing agent selected from the group of peroxodisulfates, peroxomonosulfates, and hydrogen peroxide. | 10-03-2013 |
20130280898 | METHOD FOR FORMING A DOPANT PROFILE - A method is provided for forming a dopant profile based on a surface of a wafer-like semiconductor component with phosphorus as a dopant. The method includes the steps of applying a phosphorus dopant source onto the surface, forming a first dopant profile with the dopant source that is present on the surface, removing the dopant source, and forming a second dopant profile that has a greater depth in comparison to the first dopant profile. In order to form an optimized dopant profile, the dopant source is removed after forming the first dopant profile, and precipitates that are crystallized selectively on or in the surface from the precipitates Si | 10-24-2013 |
20150064835 | METHOD FOR PRODUCING A SOLAR CELL - The invention relates to a method for producing a solar cell having a substrate made of silicon, which substrate has a silicon oxide layer present on the surface of the substrate and an antireflection layer applied to the silicon oxide layer, which antireflection layer is deposited onto the dielectric passivation layer in a process chamber. According to the invention, in order to achieve a stability of corresponding solar cells or solar cell modules produced therefrom against a potential induced degradation (PID), the dielectric passivation layer is formed from the surface of the substrate in the process chamber by means of a plasma containing an oxidizing gas. | 03-05-2015 |
Agata Lachowicz, Kahl DE
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20130228220 | METHOD FOR THE WET-CHEMICAL ETCHING OF A HIGHLY DOPED SEMICONDUCTOR LAYER - A method for the wet-chemical etching of a silicon layer in an alkaline etching solution is provided, where the silicon layer is the surface region of a solar cell emitter. The method ensures that the surface region of the emitter is etched-back homogeneously using an oxidant-free alkaline etching solution comprising at least one organic moderator is used for the isotropic etching back of the surface region of the emitter, where the moderator has a dopant concentration of at least 10 | 09-05-2013 |
Artur Lachowicz, Berlin DE
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20090209677 | Ultraviolet-Curable Resin Composition Containing a Polyfunctional Oxetanyl Group - An ultraviolet curable resin composition, which comprises a cationic photopolymerization initiator (B) and a urethane prepolymer (A) having a structure represented by the general formula ( | 08-20-2009 |
20100210751 | RADIATION CURABLE COMPOSITION AND METHOD FOR PRODUCING THE SAME - The present invention relates to a composition which is curable by radiation such as an ultraviolet ray or an electron beam. Specifically, the present invention relates to a curable composition which is useful for coatings and inks. The present invention provides a radiation curable composition that is highly cationically polymerizable and highly adhesive to substrates. A radiation curable composition of the present invention includes, as essential ingredients, a cationically polymerizable compound (a) represented by the following general formula 1 (wherein, R represents an alkyl group of 1 to 10 carbon atoms, R | 08-19-2010 |
Jean E. Lachowicz, Berkeley Heights, NJ US
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20090270432 | 7-[2-[4-(6-FLUORO-3-METHYL-1,2-BENZISOXAZOL-5-YL)-1-PIPERAZINYL]ETHYL]-2-(- 1-PROPYNYL)-7H-PYRAZOLO-[4,3-e]-[1,2,4]-TRIAZOLO-[1,5-c]-PYRIMIDIN-5-AMINE - The compound having the structural formula I | 10-29-2009 |
20100093692 | PIPERIDINYL-PIPERIDINE AND PIPERAZINYL-PIPERIDINE FOR USE IN THE TREATMENT OF DIABETES OR PAIN - The present invention relates to Compounds of Formula (I), compositions comprising the compounds, and methods of using the compounds to treat or prevent pain, diabetes, a diabetic complication, impaired glucose tolerance (IGT) or impaired fasting glucose (IFG) in a patient. | 04-15-2010 |
20100144591 | BENZIMIDAZOLE DERIVATIVES AND METHODS OF USE THEREOF - The present invention relates to compounds of formula (I); compositions comprising the compounds, and methods of using the compounds to treat or prevent pain, diabetes, a diabetic complication, impaired glucose tolerance (IGT) or impaired fasting glucose (IGT) in a patient. | 06-10-2010 |