| Patent application number | Description | Published |
|---|
| 20080285353 | Flash memory device, method of manufacturing the same, and method of operating the same - Provided are a memory device, a method of manufacturing the same, and a method of operating the same. The memory device may include a channel region having an upper end where both sides of the upper end are curved, the curved portions of both sides allowing charges to be injected thereinto in a program or erase voltage such that the curved portions into which the charges are injected are separate from a portion which determines a threshold voltage, and a gate structure on the channel region. | 11-20-2008 |
| 20090059671 | Method of programming non-volatile memory device - A method of programming a non-volatile memory device may include performing a first programming operation including applying a program voltage to a memory cell and verifying the memory cell using a first verification voltage. A perturbation pulse may be applied to the memory cell to facilitate thermalization of charges in the memory cell if the memory cell passes the verification using the first verification voltage. The memory cell may be verified using a second verification voltage greater than the first verification voltage after the perturbation pulse is applied. | 03-05-2009 |
| 20090067247 | Method of programming nonvolatile memory device - A method of programming a nonvolatile memory device may include applying a program voltage to a memory cell. A supplementary pulse may be applied to the memory cell to facilitate thermalization of charges after the application of the program voltage. A recovery voltage may be applied to the memory cell after the application of the supplementary pulse. A program state of the memory cell may be verified using a verification voltage after the application of the recovery voltage. | 03-12-2009 |
| 20090078989 | Method of forming silicon nitride at low temperature, charge trap memory device including crystalline nano dots formed by using the same, and method of manufacturing the charge trap memory device - Provided are a method of forming silicon nitride at a low temperature, a charge trap memory device including crystalline nano dots formed by using the same, and a method of manufacturing the charge trap memory device. The method of forming silicon nitride includes loading a substrate into a chamber of a silicon nitride deposition device comprising a filament; increasing a temperature of the filament to a temperature whereby a reactant gas to be injected into the chamber may be dissociated; and injecting the reactant gas into the chamber so as to form a crystalline silicon nitride film or crystalline silicon nitride nano dots on the substrate. In the method, the temperature of the filament may be maintained at 1,400° C.˜2,000° C., and a pressure in the chamber may be maintained at several to several ten torr when the reactant gas in injected into the chamber. | 03-26-2009 |
| 20090244980 | Method for reducing lateral movement of charges and memory device thereof - Provided is a method and device for reducing lateral movement of charges. The method may include pre-programming at least one memory cell that is in an erased state by applying a pre-programming voltage to the at least one memory cell to have a narrower distribution of threshold voltages than the at least one erased state memory cell and verifying that the pre-programmed memory cell is in the pre-programmed state using a negative effective verifying voltage. | 10-01-2009 |
| 20090251963 | Non-volatile memory device and method of manufacturing the same - A multi-layered non-volatile memory device and a method of manufacturing the same. The non-volatile memory device may include a plurality of first semiconductor layers having a stack structure. A plurality of control gate electrodes may extend across the first semiconductor layers. A first body contact layer may extend across the first semiconductor layers. A plurality of charge storage layers may be interposed between the control gate electrodes and the first semiconductor layers. | 10-08-2009 |
| 20090292972 | Error correction apparatus, method thereof and memory device comprising the apparatus - An error correction apparatus, a method thereof, and a memory device including the apparatus are provided. The error correction apparatus may include: a determination unit configured to determine whether a number of errors in a read word being read and extracted from a multi-level cell (MLC) exists in an error correcting capability range; a read voltage control unit configured to either increase or decrease a read voltage applied to the MLC when the number of errors in the read word is outside the error correcting capability range; and a codeword determination unit configured to analyze a bit error based on the increase or decrease of the read voltage, and to select a codeword corresponding to the analyzed bit error based on a selected read error pattern. Through this, it may be possible to efficiently correct a read error that occurs when the data of the memory device is maintained for a long time. | 11-26-2009 |
| 20090292973 | Memory device and method of storing data - Memory devices and/or methods of storing memory data bits may be provided. A memory device may include a multi-level cell (MLC) array including a plurality of MLCs, an error correction unit configured to encode data to be recorded in an MLC, where the encoded data is converted to convert the encoded data into a codeword, an error pattern analysis unit configured to analyze a first data pattern included in the codeword corresponding to an error pattern included in the codeword and a data conversion unit configured to convert the analyzed first data pattern into a second data pattern. According to the above memory devices and/or methods, it may be possible to efficiently reduce a data error that occurs when the data is stored for a relatively long period of time, thereby improving reliability. | 11-26-2009 |
| 20090294633 | Image sensor using photo-detecting molecule and method of operating the same - Provided is an image sensor using a photo-detecting molecule and a method of operating the image sensor. The image sensor may include a plurality of first electrodes disposed parallel to each other and a plurality of second electrodes disposed parallel to each other in a direction perpendicular to the first electrodes and above the first electrodes, and a plurality of subpixels formed in regions where the first electrodes cross the second electrodes. Each of the subpixels may comprise a photo-detecting molecule layer that may generate charges by absorbing light having a certain wavelength, a charge generation layer that may form a plurality of secondary electrons by receiving the charges from the photo-detecting molecule layer when a known voltage is applied between the first electrodes and the second electrodes, and a variable resistance layer, an electrical state of which is changed by receiving the secondary electrons generated from the charge generation layer. | 12-03-2009 |
| 20100008136 | Methods of operating memory devices - Provided are methods of operating NAND nonvolatile memory devices. The operating methods include applying a read voltage or a verify voltage to a selected memory cell from among a plurality of memory cells of a cell string to verify or read a programmed state of the selected memory cell; applying a first pass voltage to non-selected memory cells closest to the selected memory cell of the cell string; applying a second pass voltage to second closest non-selected memory cells to the selected memory cell; and applying a third pass voltage to other non-selected memory cells, where the first pass voltage is less than each of the second and third pass voltages and the second pass voltage is greater than the third pass voltage. | 01-14-2010 |
| 20100027351 | Memory device and memory programming method - A memory device and a memory programming method are provided. The memory device may program data in a multi-level cell (MLC) or a multi-bit cell (MBC) memory device. The memory device may include a memory cell array, a programming unit and a program level stabilization unit. The memory cell array may include a plurality of multi-level cells. The programming unit may be configured to program a first data page in the plurality of multi-level cells and to program a second data page in the plurality of multi-level cells having the programmed first data page. The program level stabilization unit may be configured to stabilize a program level of at least one of the first data page and the second data page. | 02-04-2010 |
| 20100044778 | Non-volatile memory device and method of manufacturing same - A non-volatile memory device and a method of manufacturing the non-volatile memory device are provided. At least one first semiconductor layer and at least one second semiconductor layer are disposed. At least one control gate electrode is disposed between the at least one first semiconductor layer and the at least one second semiconductor layer. At least one first layer selection line is capacitively coupled to the at least one first semiconductor layer. At least one second layer selection line is capacitively coupled to the at least one second semiconductor layer. | 02-25-2010 |
| 20100044779 | Memory devices capable of reducing lateral movement of charges - Memory devices is provided, the memory devices include a tunneling insulating layer disposed on a substrate, a charge storage layer disposed on the tunneling insulating layer, a blocking insulating layer disposed on the charge storage layer and a control gate electrode disposed on the blocking insulating layer. The control gate electrode may have an edge portion spaced farther apart from the blocking insulating layer than a central portion of the control gate electrode to concentrate charge density distribution on a central portion of a memory cell. | 02-25-2010 |
| 20100126584 | SOLAR CELLS AND SOLAR CELL MODULES - A solar cell module includes a solar cell provided at a center area of a support to expose an edge area of the support. An optical waveguide layer is provided on the edge area of the support to concentrate light to the solar cell. | 05-27-2010 |
| 20100172182 | Nonvolatile memory device and method for operating the same - Disclosed is a nonvolatile memory device which includes a plurality of cell array layers stacked on a semiconductor substrate. Each of the plurality of cell array layers includes a plurality of strings. Each of the plurality of strings has string and ground select transistors and a plurality of memory cells connected in series between the string and ground select transistors. A common source line is on each of the plurality of cell array layers. Each common source line is connected with first sides of the plurality of strings on a corresponding cell array layer. A plurality of bit lines is connected with second sides of the plurality of strings disposed on the cell array layers and arranged in the vertical direction to the semiconductor substrate. A plurality of word lines is connected with the plurality of memory cells. | 07-08-2010 |
| 20100237312 | Nonvolatile memory device - The nonvolatile memory device includes at least one pair of first electrode lines, at least one device structure disposed between the at least one pair of first electrode lines and a dielectric layer disposed between the at least one device structure and the at least one pair of first electrode lines. The at least one device structure includes a second electrode line including a first conductive type semiconductor, a resistance changing material layer adjacent to the second electrode line, a channel adjacent to the resistance changing material layer and including a second conductive type semiconductor different from the first conductive type semiconductor and a third electrode line adjacent to the channel and including the first conductive type semiconductor. | 09-23-2010 |
| 20100323509 | Nonvolatile semiconductor memory device and method of manufacturing the same - Provided is a nonvolatile semiconductor memory device and a method of manufacturing the same. The nonvolatile semiconductor memory device may include a tunnel insulating layer formed on a semiconductor substrate, a charge trap layer including a dielectric layer doped with a transition metal formed on the tunnel insulating layer, a blocking insulating layer formed on the charge trap layer, and a gate electrode formed on the blocking insulating layer. The dielectric layer may be a high-k dielectric layer, for example, a HfO | 12-23-2010 |
| 20110038197 | VARIABLE RESISTANCE MEMORY AND MEMORY SYSTEM INCLUDING THE SAME - A variable resistance memory array includes at least one variable resistance memory cell, wherein each variable resistance memory cell includes a well having a first type; and a cell structure on the well, the cell structure including a structure having a second type different from the first type and a variable resistance layer on the structure. | 02-17-2011 |
| 20110079839 | Non-Volatile Memory Devices Having Reduced Susceptibility to Leakage of Stored Charges and Methods of Forming Same - Provided is a semiconductor device. The semiconductor device includes a substrate, a tunnel insulating layer, a charge storage pattern, a blocking layer, a gate electrode. The tunnel insulating layer is disposed over the substrate. The charge storage pattern is disposed over the tunnel insulating layer. The charge storage pattern has an upper surface, a sidewall, and an edge portion between the upper surface and the sidewall. The blocking layer includes an insulating pattern covering the edge portion of the charge storage pattern, and a gate dielectric layer covering the upper surface, the sidewall, and the edge portion of the charge storage pattern. The gate electrode is disposed over the blocking layer, the gate electrode covering the upper surface, the sidewall, and the edge portion of the charge storage pattern. | 04-07-2011 |
| 20110090744 | CHANNEL PRECHARGE AND PROGRAM METHODS OF A NONVOLATILE MEMORY DEVICE - A channel pre-charge method of a nonvolatile memory device including a cell string includes pre-charging a channel of the cell string according to a first word line bias condition and pre-charging the channel of the cell string according to a second word line bias condition, different than the first word line bias condition. | 04-21-2011 |
| 20110103154 | LOCAL SELF-BOOSTING METHOD OF FLASH MEMORY DEVICE AND PROGRAM METHOD USING THE SAME - Provided is a local self-boosting method of a flash memory device including at least one string having memory cells respectively connected to wordlines. The local self-boosting method includes forming a potential well at a channel of the string and forming potential walls at the potential well to be disposed at both sides of a channel of a selected one of the memory cells. The channel of the selected memory cell is locally limited by the potential walls and boosted when a program voltage is applied to the selected memory cell. | 05-05-2011 |
