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Kutsukake

Hiroyuki Kutsukake, Kanagawa-Ken JP

Patent application numberDescriptionPublished
20110062509SEMICONDUCTOR DEVICE HAVING UPPER LAYER PORTION OF SEMICONDUCTOR SUBSTRATE DIVIDED INTO A PLURALITY OF ACTIVE AREAS - A semiconductor memory device includes: a semiconductor substrate; a plurality of element isolation insulators disposed in parts of an upper layer portion of the semiconductor substrate and dividing the upper layer portion into a plurality of active areas extended in one direction; tunnel insulating films provided on the active areas: charge storage members provided on the tunnel insulating films; and control gate electrodes provided on the charge storage members. A width of a middle portion of one of the active areas in the up-to-down direction being smaller than a width of a portion of the active areas upper of the middle portion and a width of a portion of the active areas below the middle portion.03-17-2011

Makoto Kutsukake, Kyoto JP

Patent application numberDescriptionPublished
20090196540DYNAMIC FLUID PRESSURE BEARING, SPINDLE MOTOR, DISK DRIVE APPARATUS AND METHOD FOR MANUFACTURING THE DYNAMIC FLUID PRESSURE BEARING - A fluid dynamic pressure bearing includes a shaft arranged along a central axis, an annular member fixed to the shaft, a sleeve, a lubricant, and a lubricating film. A stepped surface is provided on the outer circumferential surface of the shaft. The annular member preferably includes a lower surface extending radially with respect to the central axis and arranged to make contact with the stepped surface in the inner edge portion of the lower surface. The sleeve preferably includes an upper surface axially opposed to the lower surface of the annular member. The lubricant is provided between the shaft and the sleeve and between the annular member and the sleeve. The lubricating film is provided on the lower surface of the annular member at least over a region lying radially outwardly of the inner edge portion of the lower surface.08-06-2009

Yozo Kutsukake, Saitama JP

Patent application numberDescriptionPublished
20100108036COMMON RAIL AND METHOD OF MANUFACTURING COMMON RAIL - To provide a common rail that can prevent stress concentration from arising locally with respect to intersecting portions between a flow path and branching paths and can prevent damage such as cracks.05-06-2010

Yumi Kutsukake, Tokyo JP

Patent application numberDescriptionPublished
20110130698PRESSURE-SENSITIVE ADHESIVE AGENT FOR SKIN, PRESSURE-SENSITIVE ADHESIVE SHEET FOR SKIN, AND FACE PLATE OF OSTOMY APPLIANCE - [Objective] To provide a pressure-sensitive adhesive agent for skin containing a pressure-sensitive adhesive agent for skin that has favorable shape retention properties and skin-follow up properties without being adversely affected by moisture from excrement or the like even when adhered to the skin over a long period of time and yet leaves no adhesive residue after separation and a pressure-sensitive adhesive sheet for skin contains a base material and a layer of the pressure-sensitive adhesive agent for skin.06-02-2011

Yusuke Kutsukake, Nagano-Ken JP

Patent application numberDescriptionPublished
20090232978Process for Producing Optical Article - A process for producing an optical article includes subjecting a work in which an antireflection layer is formed on an optical substrate directly or via another layer interposed therebetween and an antifouling layer is formed on a surface of the antireflection layer to an acid treatment by dipping it in an acidic liquid; rinsing the work subjected to the acid treatment; and annealing the rinsed work.09-17-2009

Yusuke Kutsukake, Minowa-Machi Nagano-Ken JP

Patent application numberDescriptionPublished
20090040457PLASTIC LENS AND MANUFACTURING METHOD OF PLASTIC LENS - A plastic lens includes: a plastic lens base material; a hard coat layer formed on the plastic lens base material; an organic antireflection film formed on the hard coat layer; and a primer layer between the plastic lens base material and the hard coat layer. The plastic lens base material contains at least a sulfur atom. The hard coat layer contains at least: fine metal oxide particles containing a titanium oxide having a rutile-type crystalline structure; and an organosilicon compound represented by a general formula of R02-12-2009

Yusuke Kutsukake, Nagano JP

Patent application numberDescriptionPublished
20090029153PLASTIC LENS AND METHOD FOR PRODUCING PLASTIC LENS - Disclosed herein is a plastic lens which exhibits outstanding weather resistance and light resistance with a minimum of deteriorating effect on the organic antireflection thin film formed thereon. The plastic lens is composed of a plastic lens base material, a hard coating layer formed on the plastic lens base material, and an antireflection film formed on the hard coating layer, wherein the hard coating layer is one which is formed from a coating composition comprising inorganic oxide fine particles containing titanium oxide with a rutile-type crystallite and an organosilicon compound as a binder.01-29-2009