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Kurosawa, Kawasaki-Shi
Akira Kurosawa, Kawasaki-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100094941 | INFORMATION PROCESSING METHOD, ELECTRONIC MAIL PROCESSING METHOD, INFORMATION PROCESSING APPARATUS, ELECTRONIC MAIL PROCESSING APPARATUS AND COMPUTER READABLE MEDIUM - An information processing method for acquiring entity information or reference information including information for specifying the entity information, the method includes: outputting the entity information when accepting an output request for outputting the entity information; | 04-15-2010 |
Hideo Kurosawa, Kawasaki-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090103403 | OPTICAL DISC APPARATUS AND LENS SHIFT CORRECTION METHOD - An optical disc apparatus, which executes tracking control for an objective lens by generating a push-pull signal, includes a determination unit which detects symmetry of the push-pull signal and determines whether balance of signal characteristics of the push-pull signal is good, a lens shift amount detection unit which detects, in a case where the determination unit determines that the balance of the signal characteristics of the push-pull signal is not good, a lens shift amount of the objective lens in such a manner as to improve the balance of the signal characteristics, a memory unit which stores the lens shift amount that is detected by the lens shift amount detection unit, and an addition unit which constantly applies the lens shift amount, which is stored in the memory unit, to a tracking actuator which shifts the objective lens. | 04-23-2009 |
Hitoshi Kurosawa, Kawasaki-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20110010492 | Data Protection for Non-Volatile Semiconductor Memory Using Block Protection Flags - Receiving a request for canceling setting, a control circuit erases data stored in a corresponding block, changes a value of a protection flag, and cancels protection setting. When an overall protection is set for any block, the control circuit prohibits access to all blocks, except when it is an operation mode for activating a memory program contained in the microcomputer. Further, control circuit permits an access to a block M only when partial protection is set, CPU is in the mode for activating a memory program contained in the microcomputer and the access is for reading an instruction code in accordance with an instruction fetch. | 01-13-2011 |
Tsuyoshi Kurosawa, Kawasaki-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090068591 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, AND ACID GENERATOR - A compound represented by formula (I); and a compound represented by formula (b1-1): | 03-12-2009 |
| 20090311627 | Resist composition for immersion exposure and method of forming resist pattern using the same - A resist composition for immersion exposure, including a base component (A) that exhibits changed solubility in an alkali developing solution under action of acid, an acid generator component (B) that generates acid upon exposure, and a fluorine-containing compound (C) represented by general formula (c-1) (in formula (c-1), R | 12-17-2009 |
| 20090317743 | Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compound - A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure. | 12-24-2009 |
| 20100104973 | COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN - There are provided a compound preferable as an acid generator for a resist composition, an acid generator including the compound, a resist composition containing the acid generator, and a method of forming a resist pattern using the resist composition, and the compound is represented by general formula (b1-12) shown below: | 04-29-2010 |
| 20100233623 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A positive resist composition including: | 09-16-2010 |
Wataru Kurosawa, Kawasaki-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100152291 | PRODUCTION METHOD OF CAPSINOID BY DEHYDRATING CONDENSATION, STABILIZING METHOD OF CAPSINOID, AND CAPSINOID COMPOSITION - Capsinoids of formula (3) may be conveniently prepared in a high yield, in a short time, without using a dehydrating agent by esterification of a fatty acid of formula (1) with a hydroxymethylphenol of formula (2) using an enzyme without a solvent or in a low-polar solvent. Addition of a fatty acid represented by formula (4) is effective for stabilizing the ester compound of formula (3). | 06-17-2010 |