| Patent application number | Description | Published |
| 20090305596 | METHOD FOR PRODUCING PLASMA DISPLAY PANEL - A method for producing a front panel of a plasma display panel wherein an electrode, a dielectric layer and a protective layer are formed on a substrate of the front panel, a formation of the protective layer comprising the steps of: (i) forming a first protective layer by sputtering or vapor deposition process on a dielectric layer of a substrate; (ii) applying a MgO material onto the first protective layer to form a MgO material layer; and (iii) drying the Mgo material layer so as to form a second protective layer therefrom, wherein the MgO material comprises a MgO powder, a solvent A and a solvent B; a vapor pressure of the solvent A is higher than and equal to 50 Pa at 20° C.; a vapor pressure of the solvent B is lower than and equal to 7 Pa at 20° C.; and a proportion of the solvent B to all solvents contained in the MgO material is higher than and equal to 3% by weight. | 12-10-2009 |
| 20100244686 | PLASMA DISPLAY PANEL AND METHOD FOR MANUFACTURING THE SAME - A plasma display of this invention includes a front panel, and this front panel includes a substrate, a plurality of display electrode pairs formed in stripes on the substrate, a dielectric layer formed to cover the display electrode pair and the substrate, a dielectric-protective layer formed to cover the dielectric layer, and fine particles containing a crystal of a metal oxide, the fine particles being dispersed on a surface of the dielectric-protective layer. The display electrode pair is provided with a strip-shaped scanning electrode and a strip-shaped sustaining electrode each having a laminate structure of a transparent electrode and a bus electrode. In the surface of the dielectric-protective layer, a first region corresponding to a region facing the bus electrode of the scanning electrode is smaller than a second region corresponding to a region except the first region, with regard to a cover rate of the surface covered with the fine particles. This configuration allows effective increase of a charge accumulation amount in the first region, and also allows suppression of increase of a discharge start voltage. | 09-30-2010 |
| 20100248576 | METHOD FOR PRODUCING PLASMA DISPLAY PANEL - A method for producing a plasma display panel comprising a front panel wherein an electrode, a dielectric layer and a protective layer are formed on a substrate of the front panel, a formation of the dielectric layer comprising: (i) preparing a dielectric material comprising a glass component and an organic solvent; (ii) supplying the dielectric material onto the substrate having the electrode thereon, and then reducing the organic solvent contained in the supplied dielectric material to form a dielectric precursor layer therefrom; and (iii) heating the dielectric precursor layer to form a dielectric layer therefrom, wherein the content N of the organic solvent contained in the dielectric material of the above (i) satisfies Inequality 1: N<(6.5×Dz+500)/Ez wherein N [% by weight]: content of organic solvent based on the weight of dielectric material Ez [μm]: thickness of electrode provided on substrate of front panel, and Dz [μm]: thickness of dielectric layer of front panel. | 09-30-2010 |
| 20100289400 | PLASMA DISPLAY PANEL AND METHOD FOR PRODUCING THE SAME - A method for producing a plasma display panel comprising a front panel wherein an electrode, a dielectric layer and a protective layer are formed on a substrate of the front panel, a formation of the dielectric layer comprising: (i) preparing a dielectric material comprising a glass component, an organic solvent and silica particles; (ii) supplying the dielectric material onto the substrate having the electrode thereon, and then allowing the organic solvent contained in the supplied dielectric material to evaporate to form a dielectric precursor layer therefrom; (iii) heating the dielectric precursor layer to form a first dielectric layer therefrom; and (iv) heating the surface of the first dielectric layer as a local heat treatment to form a second dielectric layer to a limited depth from the surface of the first dielectric layer. | 11-18-2010 |