| Patent application number | Description | Published |
|---|
| 20080206655 | MASK BLANK, METHOD OF MANUFACTURING AN EXPOSURE MASK, AND METHOD OF MANUFACTURING AN IMPRINT TEMPLATE - A mask blank includes a substrate and a thin film formed thereon and used to form a pattern. The mask blank is adapted to be subjected to dry etching corresponding to a method of producing an exposure mask by patterning the thin film by dry etching using an etching gas substantially free from oxygen with a resist pattern formed on the thin film used as a mask. The thin film has a protective layer formed at least at its upper layer and containing 60 atomic % or more oxygen. For example, the dry etching is performed by the use of a chlorine-based gas substantially free from oxygen. | 08-28-2008 |
| 20100255411 | MASK BLANK AND METHOD OF MANUFACTURING AN IMPRINT MOLD - Provided is a method of manufacturing an imprint mold formed with a highly accurate fine pattern by the use of a mask blank. | 10-07-2010 |
| 20110002026 | POLARIZATION ELEMENT - Disclosed is a polarization element which, by utilizing the fact that the plasmon resonance frequency of a metal piece varies according to the polarization direction of a light irradiated on the metal piece, is constituted by a polarizer comprising such an aggregate of metal pieces that the plasmon resonance frequency in a predetermined direction of a metal piece is substantially equal to the frequency of light irradiated on a polarization element, and the real part and the imaginary part of permittivity at the plasmon resonance frequency of a metal material constituting the metal piece and the refractive index (na) of a dielectric layer satisfy a particular relation. | 01-06-2011 |
