Patent application number | Description | Published |
20090146238 | CMOS-BASED PLANAR TYPE SILICON AVALANCHE PHOTO DIODE USING SILICON EPITAXIAL LAYER AND METHOD OF MANUFACTURING THE SAME - A complementary metal-oxide semiconductor (CMOS)-based planar type avalanche photo diode (APD) using a silicon epitaxial layer and a method of manufacturing the APD, the photo diode including: a substrate; a well layer of a first conductivity type formed in the substrate; an avalanche embedded junction formed in the well layer of the first conductivity type by low energy ion implantation; the silicon epitaxial layer formed in the avalanche embedded junction; a doping area of a second conductivity type opposite to the first conductive type, formed from a portion of a surface of the well layer of the first conductivity type in the avalanche embedded junction and forming a p-n junction; positive and negative electrodes formed on the doping area of the second conductivity type and the well layer of the first conductivity type separated from the doping area of the second conductivity type, respectively; and an oxide layer formed on an overall surface excluding a window where the positive and negative electrodes are formed. | 06-11-2009 |
20090321641 | BIPOLAR JUNCTION TRANSISTOR-BASED UNCOOLED INFRARED SENSOR AND MANUFACTURING METHOD THEREOF - A BJT (bipolar junction transistor)-based uncooled IR sensor and a manufacturing method thereof are provided. The BJT-based uncooled IR sensor includes: a substrate; at least one BJT which is formed to be floated apart from the substrate; and a heat absorption layer which is formed on an upper surface of the at least one BJT, wherein the BJT changes an output value according heat absorbed through the heat absorption layer. Accordingly, it is possible to provide a BJT-based uncooled IR sensor capable of being implemented through a CMOS compatible process and obtaining more excellent temperature change detection characteristics. | 12-31-2009 |
20110097853 | VIA FORMING METHOD AND METHOD OF MANUFACTURING MULTI-CHIP PACKAGE USING THE SAME - A via forming method is provided. The via forming method includes: forming via-holes in a substrate; putting the substrate having the via-holes in a first solution to fill the via-holes with the first solution; sinking the metal particles into the via-holes by supplying a second solution containing metal particles to the first solution, in which there is the substrate; and performing a first curing process of heat-treating the substrate having the via-holes filled with the metal particles so as to form vias in the via-holes. Further, a method of manufacturing a multi-chip package using the via forming method is provided. | 04-28-2011 |
20110147468 | RFID TAG - Provided is a radio frequency identification (RFID) tag whose data can be stably read at a long distance on the basis of a passive RFID tag. The RFID tag includes a rechargeable unit charged to a predetermined voltage, and a power source including a direct current (DC) power source including a rectifier for converting an RF signal into DC power and a regulator for supplying a predetermined DC voltage, an interceptor disposed between the rechargeable unit and the DC power source to connecting or disconnecting the power to the rechargeable unit, and an overvoltage preventor connected to an output terminal of the DC power source in parallel. | 06-23-2011 |
20110147787 | ORGANIC LIGHT EMITTING DIODE AND MANUFACTURING METHOD THEREOF - An organic light emitting diode (OLED) and a method for manufacturing the same are provided. In the OLED, patterned metal electrodes are positioned on one or more of upper and lower portions of a light emission layer to allow light generated from the light emission layer to emit to an area between the patterned metal electrodes. | 06-23-2011 |
20120057106 | POLARIZER AND LIQUID CRYSTAL DISPLAY - Provided are a polarizer and a liquid crystal display (LCD) in which wire grid polarizers are formed on a thin film transistor substrate and a color filter substrate, respectively, so that it is possible to reduce fabrication cost and the number of processes and decrease the thickness of the LCD. An LCD includes a thin film transistor substrate, a color filter substrate opposite to the thin film transistor substrate, and a liquid crystal layer positioned between the thin film transistor substrate and the color filter substrate. In the LCD, wire grid polarizing patterns are formed on the thin film transistor substrate and the color filter substrate, respectively. | 03-08-2012 |
20120161941 | RFID TAG - An RFID tag includes: an antenna receiving an RF signal from a reader; an AFE (analog front end) generating voltage using the RF signal; and one or more switches interposed between the antenna and the AFE and controlling the connection between the antenna and the AFE through the switch operation. | 06-28-2012 |
20130294172 | NON-VOLATILE MEMORY (NVM) AND METHOD FOR MANUFACTURING THEREOF - A nonvolatile memory and a method of manufacturing a nonvolatile memory are disclosed. A nonvolatile memory according to an exemplary embodiment may include a deep well formed on a substrate, a first well formed within the deep well, a second well formed separately from the first well within the deep well, a first metal-oxide-semiconductor field-effect transistor (MOSFET) formed on the first well, and a second MOSFET formed on the second well. According to a method of manufacturing a nonvolatile memory according to an exemplary embodiment, a well region of a control MOSFET of a memory cell may be shared with a control MOSFET of an adjacent memory cell, or a well region of a tunneling MOSFET of a memory cell may be shared with a tunneling MOSFET of an adjacent memory cell, thereby reducing an area of the memory cells. Further, the nonvolatile memory according to the exemplary embodiment may constantly maintain a voltage of a shared well region in the tunneling MOSFET and apply a different voltage to a source/drain from that of an adjacent cell, thereby recording data only in the selected memory cell or deleting recorded data from the selected memory cell while sharing the well region. | 11-07-2013 |