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Kuijper, NL
Andre Kuijper, Drachten NL
| Patent application number | Description | Published |
|---|---|---|
| 20100139098 | CAP HAVING A COMFORT PROFILE, WHICH IS INTENDED TO BE APPLIED IN A SHAVING HEAD OF A SHAVING APPRATUS | 06-10-2010 |
Anthonie Kuijper, Best NL
| Patent application number | Description | Published |
|---|---|---|
| 20100045950 | LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface. | 02-25-2010 |
| 20100208221 | FLUID SUPPLY SYSTEM, A LITHOGRAPHIC APPARATUS, A METHOD OF VARYING FLUID FLOW RATE AND A DEVICE MANUFACTURING METHOD - A fluid supply system for a lithographic apparatus, includes a controller configured to vary fluid flow rate to a first component from a fluid source while maintaining total flow resistance to fluid downstream of the fluid source substantially constant. | 08-19-2010 |
| 20100328634 | LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS - A method of cleaning an immersion lithographic apparatus is disclosed in which a cleaner is added to immersion liquid for use during exposure of a substrate. The cleaner may be a combination of a soap and a solvent. The cleaner maybe present at a concentration of less than 300 ppb. | 12-30-2010 |
| 20110013159 | LITHOGRAPHIC APPARATUS AND A METHOD OF MEASURING FLOW RATE IN A TWO PHASE FLOW - A lithographic apparatus is disclosed that includes a conduit for two phase flow therethrough. A flow separator is provided to separate the two phase flow into a gas flow and a liquid flow. A flow meter measures the flow rate of fluid in the gas flow or the liquid flow. | 01-20-2011 |
| 20110080567 | LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS - A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed. | 04-07-2011 |
Anthonie Kuijper, Breugel NL
| Patent application number | Description | Published |
|---|---|---|
| 20090134488 | Immersion Liquid, Exposure Apparatus, and Exposure Process - An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, that has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid. | 05-28-2009 |
Hans Wicher Kuijper, Giekerk NL
Jelle Jacob Kuijper, Gendt NL
| Patent application number | Description | Published |
|---|---|---|
| 20080302006 | Method and Container for Substrate-Free Cultivation of a Germination Product - A method for substrate-free cultivation of a germination product, comprising the steps of accommodating a bean or seed in a chamber, for example in a container; setting the conditions in the chamber, such as humidity and temperature, in such a way that the bean is made to sprout; providing the chamber with a restraining means, wherein the restraining means interact with the shell of the bean or the seed in such a way that the shell is kept in the chamber while a shoot of the bean or the seed or emerges from the chamber. | 12-11-2008 |