| Patent application number | Description | Published |
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| 20100103663 | LED ARRAY BEAM CONTROL LUMINAIRES - The present invention provides LED array systems with which provides for a LED array luminair with reduced color fringing, light spill reduction and beam angle control and LED protection. | 04-29-2010 |
| 20100225639 | ARRAY OF LED ARRAY LUMINAIRES - The present invention provides LED array systems with a control system for arrays of LED array luminaires that allows for display of images or light patterns across and array of luminiairs over a low bandwidth control protocol. | 09-09-2010 |
| 20100245279 | DISPLAY AND DISPLAY CONTROL SYSTEM FOR AN AUTOMATED LUMINAIRE - A display and control system for automated luminaires for easier and quicker service and usage monitoring. | 09-30-2010 |
| 20110103049 | UNIVERSAL COLOR CONTROL MATRIX - The present invention provides an improved paradigm for controlling multicolored LED's in an automated lighting system that is particularly useful for LED fixtures using LED colors other than or in addition to Red, Green and Blue and with LED fixtures used in combination with subtractive (CMY) color mixing fixtures. | 05-05-2011 |
| 20110121749 | LED ARRAY LUMINAIRES - The present invention provides LED array systems with improved methods of powering LED in the array by monitoring the relationship between temperature and driving power to predict how much power can be safely applied to the LEDs. The present invention also provides for a control system for LED arrays that allows for display of images or light patterns across and array of luminiairs over a low bandwidth control protocol. The present invention also provides for a LED array luminair with reduced color fringing, light spill reduction and beam angle control. | 05-26-2011 |
| Patent application number | Description | Published |
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| 20080264870 | Cooling water corrosion inhibition method - A method of providing corrosion inhibition to copper, nickel, aluminum, zinc, tin, lead, beryllium, carbon steel, various alloys of such metals, and galvanized coatings in evaporative cooling water applications approaching zero liquid discharge that are specifically attacked by cooling water with residuals of corrosive chemistry or ions such as ammonia/ammonium ion, chloride, high TDS, OH | 10-30-2008 |
| 20090159420 | COOLING WATER CORROSION INHIBITION METHOD - Methods for inhibiting corrosion in aqueous evaporative systems where soluble silica (SiO | 06-25-2009 |
| 20100173071 | COOLING WATER CORROSION INHIBITION METHOD - A method of providing corrosion inhibition to copper, nickel, aluminum, zinc, tin, lead, beryllium, carbon steel, various alloys of such metals, and galvanized coatings in evaporative cooling water applications approaching zero liquid discharge that are specifically attacked by cooling water with residuals of corrosive chemistry or ions such as ammonia/ammonium ion, chloride, high TDS, OH | 07-08-2010 |
| Patent application number | Description | Published |
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| 20100040983 | Compensation of Process-Induced Displacement - A method of manufacturing integrated circuits includes determining a process-induced displacement (e.g., a stress-induced displacement) between primary structures on a substrate and providing a photomask with mask features assigned to the primary structures. The distances between the mask features are set such that the process-induced displacement is compensated. | 02-18-2010 |
| 20110027704 | Methods and Scatterometers, Lithographic Systems, and Lithographic Processing Cells - In a method of determining the focus of a lithographic apparatus used in a lithographic process on a substrate, the lithographic process is used to form a structure on the substrate, the structure having at least one feature which has an asymmetry in the printed profile which varies as a function of the focus of the lithographic apparatus on the substrate. A first image of the periodic structure is formed and detected while illuminating the structure with a first beam of radiation. The first image is formed using a first part of non-zero order diffracted radiation. A second image of the periodic structure is foamed and detected while illuminating the structure with a second beam of radiation. The second image is formed using a second part of the non-zero order diffracted radiation which is symmetrically opposite to the first part in a diffraction spectrum. The ratio of the intensities of the measured first and second portions of the spectra is determined and used to determine the asymmetry in the profile of the periodic structure and/or to provide an indication of the focus on the substrate. In the same instrument, an intensity variation across the detected portion is determined as a measure of process-induced variation across the structure. A region of the structure with unwanted process variation can be identified and excluded from a measurement of the structure. | 02-03-2011 |
| 20120013881 | Method and Apparatus for Determining an Overlay Error - A method of determining an overlay error. Measuring an overlay target having process-induced asymmetry. Constructing a model of the target. Modifying the model, e.g., by moving one of the structures to compensate for the asymmetry. Calculating an asymmetry-induced overlay error using the modified model. Determining an overlay error in a production target by subtracting the asymmetry-induced overlay error from a measured overlay error. In one example, the model is modified by varying asymmetry p | 01-19-2012 |
