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Krivtsun
Vladimir Mihailovitc Krivtsun, Troitsk RU
| Patent application number | Description | Published |
|---|---|---|
| 20110043777 | TARGET MATERIAL, A SOURCE, AN EUV LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD USING THE SAME - A target material is configured to be used in a source constructed and arranged to generate a radiation beam having a wavelength in an extreme ultraviolet range. The target material includes a Gd-based composition configured to modify a melting temperature of Gd. | 02-24-2011 |
Vladimir Mihailovitch Krivtsun, Moscow Region RU
| Patent application number | Description | Published |
|---|---|---|
| 20110020752 | EXTREME ULTRAVIOLET RADIATION SOURCE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET RADIATION - A radiation source is constructed and arranged to produce extreme ultraviolet radiation. The radiation source includes a chamber, a first electrode at least partially contained in the chamber, a second electrode at least partially contained in the chamber, and a supply constructed and arranged to provide a discharge gas to the chamber. The first electrode and the second electrode are configured to create a discharge in the discharge gas to form a plasma so as to generate the extreme ultraviolet radiation. The source also includes a gas supply constructed and arranged to provide a gas at a partial pressure between about 1 Pa and about 10 Pa at a location near the discharge. The gas is selected from the group consisting of hydrogen, helium, and a mixture of hydrogen and helium. | 01-27-2011 |
Vladimir Mihailovitch Krivtsun, Moscow RU
| Patent application number | Description | Published |
|---|---|---|
| 20110164236 | RADIATION SOURCE AND LITHOGRAPHIC APPARATUS - A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma, an outlet configured to allow gas to exit the radiation source, and a contamination trap at least partially located inside the outlet. The contamination trap is configured to trap debris particles that are generated with the formation of the plasma. | 07-07-2011 |
Vladimir Mihailòvitch Krivtsun, Troitsk RU
| Patent application number | Description | Published |
|---|---|---|
| 20100141909 | RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS - A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight. | 06-10-2010 |