Krivtsun
Vladimir Mihailovitc Krivtsun, Troitsk RU
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20110043777 | TARGET MATERIAL, A SOURCE, AN EUV LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD USING THE SAME - A target material is configured to be used in a source constructed and arranged to generate a radiation beam having a wavelength in an extreme ultraviolet range. The target material includes a Gd-based composition configured to modify a melting temperature of Gd. | 02-24-2011 |
Vladimir Mihailovitch Krivtsun, Moscow Region RU
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20110020752 | EXTREME ULTRAVIOLET RADIATION SOURCE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET RADIATION - A radiation source is constructed and arranged to produce extreme ultraviolet radiation. The radiation source includes a chamber, a first electrode at least partially contained in the chamber, a second electrode at least partially contained in the chamber, and a supply constructed and arranged to provide a discharge gas to the chamber. The first electrode and the second electrode are configured to create a discharge in the discharge gas to form a plasma so as to generate the extreme ultraviolet radiation. The source also includes a gas supply constructed and arranged to provide a gas at a partial pressure between about 1 Pa and about 10 Pa at a location near the discharge. The gas is selected from the group consisting of hydrogen, helium, and a mixture of hydrogen and helium. | 01-27-2011 |
20130287968 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A method for generating radiation includes supplying a fuel to a discharge space, creating a discharge in the fuel to form a plasma, and reducing a volume defined by the plasma by controlling radiation emission by the plasma. The reducing includes supplying a substance including at least one of Ga, In, Bi, Pb or Al to the plasma to control the radiation emission. | 10-31-2013 |
Vladimir Mihailovitch Krivtsun, Moscow RU
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20110164236 | RADIATION SOURCE AND LITHOGRAPHIC APPARATUS - A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma, an outlet configured to allow gas to exit the radiation source, and a contamination trap at least partially located inside the outlet. The contamination trap is configured to trap debris particles that are generated with the formation of the plasma. | 07-07-2011 |
20110170079 | RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS - A radiation system is configured to generate a radiation beam. The radiation system includes a radiation source configured to generate a plasma that emits radiation and debris, and a radiation collector configured to direct collected radiation to a radiation beam emission aperture. A magnetic field generator is configured to generate a magnetic field with a gradient in magnetic field strength to direct the plasma away from the radiation collector. | 07-14-2011 |
20120140196 | EX-SITU REMOVAL OF DEPOSITION ON AN OPTICAL ELEMENT - A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume. | 06-07-2012 |
20130015373 | EUV Radiation Source and EUV Radiation Generation Method - An EUV radiation source comprising a fuel supply ( | 01-17-2013 |
20150108373 | Photon Source, Metrology Apparatus, Lithographic System and Device Manufacturing Method - A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma. | 04-23-2015 |
Vladimir Mihailòvitch Krivtsun, Troitsk RU
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20100141909 | RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS - A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight. | 06-10-2010 |
Vladimir Mikhailovich Krivtsun, Troitsk, Moscow RU
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20150311058 | LIGHT SOURCE WITH LASER PUMPING AND METHOD FOR GENERATING RADIATION - The invention relates to light sources with laser pumping and to methods for generating radiation with a high luminance in the ultraviolet (UV) and visible spectral ranges. The technical result of the invention includes extending the functional possibilities of a light source with laser pumping by virtue of increasing the luminance, increasing the coefficient of absorption of the laser radiation by a plasma, and significantly reducing the numerical aperture of a divergent laser beam which is to be occluded and which is passing through the plasma. The device comprises a chamber containing a gas, a laser producing a laser beam, an optical element, a region of radiating plasma produced in the chamber by the focused laser beam, an occluder, which is mounted on the axis of the divergent laser beam on the second side of the chamber and an optical system for collecting plasma radiation. | 10-29-2015 |