| Patent application number | Description | Published |
|---|
| 20080210548 | Method for Controlling Plasma Density or the Distribution Thereof - Magnetron source has a target configuration with a sputter surface, a magnet configuration generating above the sputter surface a magnetic field which forms, in top view onto the sputter surface, at least one magnet field loop. Viewed in a cross-sectional direction upon the target configuration, a tunnel-shaped arc magnet field is formed and further an electrode configuration is provided which generates, when supplied by a positive electric potential with respect to an electric potential applied to the target configuration, an electric field which crosses at an angle the magnetic field and wherein the electrode configuration comprises a distinct electrode arrangement in a limited segment area of the electrode configuration, which is substantially shorter than the overall length of the magnet field loop. The electrode arrangement along the limited segment area is electrically isolated from the remainder of the electrode configuration so as to be electrically operated differently than the remainder of the electrode configuration. | 09-04-2008 |
| 20090107396 | Vacuum chamber on a frame basis for coating installations - The present invention relates to a vacuum chamber and to its production. According to the invention, the vacuum chamber comprises a frame into which insert plates are placed. The insert plates form together with the frame a closed space in which a vacuum can be created. Preferably, the shell of the frame is extracted from an integrally formed metal piece, with a large portion of material being removed, leading to openings for the insert plates to be created. This has among others the advantage that no welding seams are necessary where the individual plates are inserted. | 04-30-2009 |
| 20090145554 | Procedure and device for the production of a plasma - The present invention concerns a procedure for the production of a plasma that is at least co-produced in the vacuum chamber ( | 06-11-2009 |
| 20090260977 | METHOD FOR MANUFACTURING WORKPIECES WITH ION-ETCHED SURFACE - Planetary carriers ( | 10-22-2009 |
