Patent application number | Description | Published |
20080214093 | CMP polishing slurry and polishing method - The present invention relates to a CMP polishing slurry, comprising cerium oxide particles, a dispersing agent, a water-soluble polymer and water, wherein the water-soluble polymer is a compound having a skeleton of any one of an N-mono-substituted product and an N,N-di-substituted product of any one selected from the group consisting of acrylamide, methacrylamide and α-substituted products thereof. The amount of the water-soluble polymer is preferably in the range of 0.01 part or more by weight and 10 parts or less by weight for 100 parts by weight of the polishing slurry. Thus it is possible to provide a polishing slurry and a polishing method which make it possible to polish a film made of silicon oxide or the like effectively and rapidly and further control the process therefor easily in CMP technique for flattening an interlayer insulating film, a BPSG film, an insulator film for shallow trench isolation, and other films. | 09-04-2008 |
20080254717 | Cmp Polishing Slurry and Method of Polishing Substrate - A CMP polishing slurry of the present invention contains cerium oxide particles, water, and a polymer of at least one of a methacrylic acid and the salt thereof, and/or a polymer of at least one of a methacrylic acid and the salt thereof and a monomer having an unsaturated double bond, preferably contains furthermore a dispersant or a polymer of monomers containing at least one of an acrylic acid and the salt thereof. The present invention provides a CMP polishing slurry and a polishing method that, after polishing, give a polished film having a smaller difference in residual film thickness due to a pattern density difference. | 10-16-2008 |
20090047786 | CMP Abrasive Slurry for Polishing Insulation Film, Polishing Method, and Semiconductor Electronic Part Polished by the Polishing Method - The present invention provides a CMP abrasive slurry for polishing insulation film, that allow efficiently and high-speed polishing of insulation films such as SiO | 02-19-2009 |
20110039475 | POLISHING AGENT AND METHOD FOR POLISHING SUBSTRATE USING THE POLSHING AGENT - Disclosed is a polishing agent comprising: water; tetravalent metal hydroxide particles; and an additive, wherein the additive contains at least one of a cationic polymer and a cationic polysaccharide. The present invention can provide a polishing agent which is capable of polishing an insulating film at a high speed with less polishing flaws, and having a high polishing rate ratio of a silicon oxide film and a stopper film, in the CMP technology of flattening insulating film. The present invention can also provide a polishing agent set for storing the polishing agent, and a method for polishing a substrate using this polishing agent. | 02-17-2011 |
20120302699 | RESIN COMPOSITION, MOLDED BODY AND COMPOSITE MOLDED BODY - In accordance with the present invention, by using a resin composition including lignin and a curing agent in which the lignin is soluble in an organic solvent and contained in the resin composition in an amount of from 10 to 90% by mass, there are provided a molded product and a composite molded product which are obtained from plant resources as a main raw material and to which a good flame retardance and a good antibacterial property are imparted. | 11-29-2012 |
Patent application number | Description | Published |
20090092736 | Method for Production of Chlorogenic Acid-Containing Material - The present invention relates to a method for production of a chlorogenic acid-containing material, including the method of contacting a coffee bean extract (A) with a mixture of a water-miscible organic solvent (B) and water (C) under such conditions that the weight ratio between the components (B) and (C) obtained after the mixture is mixed with the component (A) becomes 70/30 to 99.5/0.5; and recovering a solid portion. | 04-09-2009 |
20090246851 | METHOD FOR PRODUCTION OF ENZYME - The present invention provides a process for producing an enzyme, which includes recovering an enzyme by microfiltering an enzyme-containing solution, having a cell density of 1% (v/v) or less and an enzyme concentration of 1% (w/v) or more in terms of the amount of proteins, with a cationic surfactant added in an amount of 0.01 to 1% (w/v) to the enzyme-containing solution. | 10-01-2009 |
20100028964 | METHOD FOR PRODUCTION OF MICROBIAL FERMENTATION PRODUCT - The present invention relates to a method for production of a diol form represented by the formula (2), which includes filtering a culture fluid obtained by microbial conversion using a compound represented by the following formula (1a) and/or formula (1b) as a substrate, using a filter having an aperture size of 10 to 100 μm; washing the residue on the filter with water or a solvent having an SP value outside the range of 8.3 to 20 (cal/cm | 02-04-2010 |
20110306104 | PROCESS FOR PRODUCING MICROBIAL FERMENTATION PRODUCT - Provided is a process for producing a diol, which can efficiently produce a diol having a low intensity of abnormal odor and high purity. A process for producing 1-(2-hydroxyethyl)-2,5,5,8a-tetramethyldecahydronaphthalen-2-ol represented by formula (2): | 12-15-2011 |