Koutake
Masayoshi Koutake, Tokyo JP
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20120100667 | ORGANIC SEMICONDUCTOR INK COMPOSITION AND METHOD FOR FORMING ORGANIC SEMICONDUCTOR PATTERN USING THE SAME - Provided is an ink that is the most suitable for a method for forming an organic transistor by transferring a pattern using a liquid-repellent transfer substrate, for example, a microcontact printing method or a reverse printing method. Specifically, provided is an organic semiconductor ink composition which can provide a uniform ink coating film on a surface of a liquid-repellent transfer substrate and which can provide a dry ink film or a semi-dry ink film capable of being easily transferred from the transfer substrate to a transfer-receiving base material. Also provided is a method for forming an organic semiconductor pattern of an organic transistor, the method using the organic semiconductor ink composition. The organic semiconductor ink composition used for obtaining a desired pattern by transferring an ink layer formed on a liquid-repellent transfer substrate to a printing base material contains an organic semiconductor, an organic solvent, and a fluorine-based surfactant. | 04-26-2012 |
Ryota Koutake, Kakegawa-Shi JP
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20150292387 | EXHAUST PURIFICATION DEVICE FOR INTERNAL COMBUSTION ENGINE - A particulate filter arranged in an engine exhaust passage is provided with alternately arranged exhaust gas inflow and outflow passages and porous partition walls separating these passages from each other. In each partition wall, a coated zone where a coated layer with an average pore size smaller than that of a partition wall substrate is used to cover the substrate surface and a non-coated zone downstream of the coated zone where the substrate surface is not covered by the coated layer are defined, and the ash in the exhaust gas can pass through the partition wall in the non-coated zone. The quantity of particulate matter trapped at the non-coated zones is calculated, and PM removal control for removing particulate matter from the particulate filter is performed when it is judged that the quantity of trapped particulate matter is greater than an allowable upper limit amount. | 10-15-2015 |
Ryota Koutake, Susono-Shi, Shizuoka-Ken JP
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20150298058 | EXHAUST GAS PURIFICATION FILTER - An exhaust gas purification filter that is suitable for arrangement in an exhaust passage of an internal combustion engine and for collecting particulate matter contained in exhaust gas, comprises: exhaust gas inflow passages and exhaust gas outflow passages that are arranged alternately; and porous partitions that separate the exhaust gas inflow passages and the exhaust gas outflow passages from each other. Each of the partitions is divided into a coated zone in which a surface of a partition base is coated with a coating layer having a smaller average pore diameter than an average pore diameter of the partition base and a non-coated zone that is located on a downstream side of the coated zone and in which a surface of the partition base is not coated with the coating layer. A pore diameter of the partitions is set such that ash contained in the exhaust gas is able to pass through the partitions in the non-coated zone. A passage resistance of a partition portion located in the coated zone, the passage resistance being in a thickness direction of the partition portion located in the coated zone, is lower than a passage resistance of a partition portion located in the non-coated zone, the passage resistance being in a thickness direction of the partition portion located in the non-coated zone. | 10-22-2015 |
Ryota Koutake, Kakegawa-Shi, Shizuoka JP
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20150322832 | EXHAUST PURIFICATION FILTER - An exhaust cleaning filter for collecting particulate matter contained in exhaust gas and suitable for being disposed in an exhaust passage of an internal combustion engine is provided with: an exhaust gas inflow passage and an exhaust gas outflow passage disposed in alternating fashion; and a porous partition wall for setting the exhaust gas inflow passage and the exhaust gas outflow passage at a distance from each other. A small pore region is sectioned off on the upstream side of the partition wall and a large pore region is sectioned off on the downstream side of the partition wall. The average pore diameter of the partition wall in the large pore region is set to be greater than the average pore diameter of the partition wall in the small pore region, and is set so that ash contained in the exhaust gas is able to pass through the partition wall. The exhaust purification filter is provided with a promoting member for promoting the passing of exhaust gas that has flowed into the exhaust gas inflow passage, through the partition wall in the small pore region, and promoting inflow into the exhaust gas outflow passage. | 11-12-2015 |