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Koshimizu, JP
Chishio Koshimizu, Nirasaki JP
| Patent application number | Description | Published |
|---|---|---|
| 20100243162 | PLASMA PROCESSING APPARATUS - A uniformity of plasma density in a target object surface and plasma processing characteristics can be improved. A plasma processing apparatus | 09-30-2010 |
| 20100243608 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - There is provided a plasma processing apparatus capable of varying an AC ratio without installing a largely scaled-up movable unit. An etching apparatus | 09-30-2010 |
| 20100304572 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - An optimum application voltage for reducing deposits on a peripheral portion of a substrate as well as improving a process result in balance is effectively found without changing a height of a focus ring. A plasma processing apparatus includes a focus ring which includes a dielectric ring provided so as to surround a substrate mounting portion of a mounting table and a conductive ring provided on the dielectric ring; a voltage sensor configured to detect a floating voltage of the conductive ring; a DC power supply configured to apply a DC voltage to the conductive ring. An optimum voltage to be applied to the conductive ring is obtained based on a floating voltage actually detected from the conductive ring, and the optimum application voltage is adjusted based on a variation in the actually detected floating voltage for each plasma process. | 12-02-2010 |
| 20110211817 | METHOD FOR HEATING PART IN PROCESSING CHAMBER OF SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR MANUFACTURING APPARATUS - There is provided a method for heating a part within a processing chamber of a semiconductor manufacturing apparatus having a substrate in the processing chamber and performing a process on the substrate. The heating method includes generating heating lights which is generated by a heating light source provided outside the processing chamber and has a wavelength band capable of passing through a first part in the processing chamber and being absorbed into a second part in the processing chamber made of a material different from that of the first part, and heating the second part in the processing chamber by passing the heating lights through the first part in the processing chamber and irradiating the heating lights to the second part in the processing chamber. | 09-01-2011 |
| 20110235056 | METHOD FOR MEASURING WEAR RATE - A wear rate measurement method includes thermally coupling a focus ring having a top surface and a bottom surface with a reference piece having a bottom surface facing a susceptor and a top surface facing the focus ring; measuring a first optical path length of a low-coherence light beam that travels forward and backward within the focus ring by irradiating the low-coherence light beam to the focus ring orthogonally to the top surface and the bottom surface thereof; measuring a second optical path length of a low-coherence light beam that travels forward and backward within the reference piece by irradiating the low-coherence light beam to the reference piece orthogonally to the top surface and the bottom surface thereof; and calculating a wear rate of the focus ring based on a ratio between the first optical path length and the second optical path length. | 09-29-2011 |
| 20110235675 | SUBSTRATE MOUNTING TABLE - There is provided a substrate mounting table capable of accurately measuring a temperature of a wafer supported on the substrate mounting table without incurring contamination within a chamber and without forming a hole for measuring a temperature in the substrate mounting table. The substrate mounting table includes a mounting surface | 09-29-2011 |
| 20120031560 | PLASMA PROCESSING APPARATUS - A plasma processing apparatus includes: an evacuable chamber | 02-09-2012 |
| 20120037597 | PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD - There is provided a plasma processing apparatus capable of performing a uniform plasma process on a substrate by controlling a plasma distribution within a chamber to a desired state and uniformizing a plasma density within the chamber. The plasma processing apparatus includes an evacuable chamber | 02-16-2012 |
Chishio Koshimizu, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20080218744 | TEMPERATURE MEASURING APPARATUS AND TEMPERATURE MEASURING METHOD - A temperature measuring apparatus includes a light source, a first splitter, a second splitter, a reference beam reflector, an optical path length adjuster, a reference beam transmitting member, a first to an nth measuring beam transmitting member and a photodetector. The temperature measuring apparatus further includes a controller that stores, as initial peak position data, positions of interference peaks respectively measured in advance by irradiating the first to the nth measuring beam onto the first to the nth measurement point of the temperature measurement object, and compares the initial peak position data to positions of interference peaks respectively measured during a temperature measurement to thereby estimate a temperature at each of the first to the nth measurement point. | 09-11-2008 |
Ichiro Koshimizu, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20120088765 | PURINE DERIVATIVE AND ANTITUMOR AGENT USING SAME - Disclosed are: a novel purine derivative, a composition thereof, a method for treating tumor using the purine derivative, and an antitumor agent using the purine derivative. Specifically disclosed is a compound represented by formula (I), or a pharmaceutically acceptable salt, solvate or hydrate thereof, or a prodrug thereof. | 04-12-2012 |
Masanori Koshimizu, Sendai-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090121188 | High Counting Rate Scintillator - [PROBLEMS] To provide a scintillator responding to high counting rate sustaining high-speed and high detection efficiency of BaF | 05-14-2009 |
Naganori Koshimizu, Kai-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20080223034 | Master cylinder - Disclosed is a master cylinder comprising a stepped cylinder having a large diameter cylinder portion and a small diameter cylinder portion, a stepped piston inserted into the stepped cylinder, a reverse-flow-checking opening and closing portion for partitioning the inside of the stepped cylinder into a large diameter pressurizing chamber and a small diameter hydraulic chamber, and a control valve device in which a control valve body releases a hydraulic pressure in the large diameter pressurizing chamber to a reservoir side such that the hydraulic pressure in the large diameter pressurizing chamber is gradually reduced in accordance with a rise in a hydraulic pressure in the small hydraulic chamber, the master cylinder characterized in further comprising a check valve device comprising a check valve chamber communicating with an relief passage, which releases a hydraulic pressure in the large diameter pressurizing chamber to the reservoir via the control valve device, and with a small diameter hydraulic chamber, respectively, and a check valve body accommodated in the check valve chamber for permitting flow of a brake fluid from the relief passage to the small hydraulic chamber, and for preventing flow of the brake fluid in a reverse direction. | 09-18-2008 |
| 20080264248 | Master cylinder and method of manufacturing the same - An object of the present invention is to provide a master cylinder capable of controlling an increase in an intruding amount of a cup seal while relieving a stress concentration therein to thereby prevent the cup seal from being damaged. Provided is a master cylinder in which a piston is moved in slidable contact with an inner circumference of a cup seal held in a cylinder main body so as to pressurize a brake fluid in a pressure chamber formed of the piston and the cylinder main body, wherein an annular wall configured integrally with the cylinder main body is provided behind the cup seal. Further, a chamfered portion having a curved shape in a cross-section taken along a diameter direction of the cylinder main body is provided between the annular wall and a cylinder wall to which the piston is facing. One end of the chamfered portion is formed continuously so that a tangent thereto is in line with the annular wall, and the other end of the chamfered portion is formed to constitute a flexed portion in combination with the cylinder wall. | 10-30-2008 |
| 20100244549 | Vehicle braking system and master cylinder - Provided are a vehicle braking system and a master cylinder which are capable of providing a good pedal feel. A valve-opening pressure for a pressure-reducing valve of the master cylinder is set higher than a hydraulic pressure which is obtained with a pressing force on a brake pedal being 500 N and lower than a hydraulic pressure obtained at a time when a booster reaches a full-load point in case of failure of the booster so as to be specialized for improving pedal feel. Required performance in case of failure of the booster is realized by a pressure-intensifying unit. | 09-30-2010 |
| 20110048226 | MASTER CYLINDER - A master cylinder includes a cylinder body which an operating fluid is introduced from a reservoir, a piston which is slidably fitted in the cylinder body and defines a pressure chamber inside the cylinder body, a supply pathway which is formed in the cylinder body and supplies the operating fluid from the reservoir to the pressure chamber, a bypass pathway which bypasses the supply pathway and allows the reservoir to communicate with the pressure chamber, and a check valve which is installed in the bypass pathway and opens a valve when the pressure inside the pressure chamber is lower than the pressure of the reservoir. | 03-03-2011 |
Takaharu Koshimizu, Hachinohe-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100126415 | CONVEYOR AND DEPOSITION APPARATUS, AND MAINTENANCE METHOD THEREOF - A conveyor and a deposition apparatus, and a maintenance method thereof are disclosed. The conveyor includes a frame; a lower support mechanism for supporting a carrier on which is longitudinally mounted a substrate and for transferring the carrier; and an upper support mechanism for supporting the carrier, in which the frame comprises a lower frame and an upper frame, and in which the lower support mechanism is provided on the lower frame and the upper support mechanism is provided on the upper frame, the upper frame and the lower frame being configured to be separately movable. Therefore, with the rotational movement of the upper frame, it is possible to arrange a cathode member in a space formed above the lower frame. This can make the spacing between the deposition treatment passage and the carrier transfer passage small. As a result, it is possible to make an inner court of the deposition apparatus narrow. Therefore, in the conveyor capable of transferring a carrier and in the deposition apparatus including the conveyor and further including a vacuum treatment apparatus and a transfer system, it is possible to make the installation area thereof small and narrow. | 05-27-2010 |
Takahiro Koshimizu, Hadano-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100171146 | OPTICAL SEMICONDUCTOR-SEALING COMPOSITION - The present invention provides an optical semiconductor encapsulating composition comprising (A) an epoxy compound, (B) a carboxylic anhydride curing agent, (C) a curing accelerator, and (D) surface-coated silica particles having an average particle diameter of 5 to 50 nm in which 0.2 to 3 mmol of a silane coupling agent (D2) that contains an epoxy group-containing silane coupling agent (d1) is reacted with 1 g of silica particles (D1) to surface-coat the silica particles, the epoxy group being converted into a hydroxyl group through ring opening; and an optical semiconductor device in which an optical semiconductor is encapsulated with the composition. | 07-08-2010 |
Takashi Koshimizu, Zama JP
| Patent application number | Description | Published |
|---|---|---|
| 20110290125 | SERVO PRESS APPARATUS DRIVEN BY MULTIPLE MOTORS - This invention is intended to provide a large-capacity servo press apparatus driven by multiple motors, the servo press apparatus enabling a drive at a high efficiency and with reduced torque pulsations in a simple structure. The disclosed servo press comprises a slide that is moved up and down by a plurality of crank structures (including eccentric rings and connecting rods), main gears that drive the crank structures, a plurality of drive gears interlinked with the main gears directly or indirectly, intermediate gears interlinked with the main gears directly or indirectly, and servo motor sets connected to drive shafts to drive the drive gears. In each of the servo motor sets, a plurality of servo motors are directly connected to each servo motor shaft. | 12-01-2011 |
Takashi Koshimizu, Toyama JP
| Patent application number | Description | Published |
|---|---|---|
| 20090137128 | Substrate Processing Apparatus and Semiconductor Device Producing Method - Disclosed is a substrate processing apparatus including: a reaction tube to accommodate at least one substrate; at least a pair of electrodes disposed outside the reaction tube; and a dielectric member, wherein a plasma generation region is formed at least in a space between an inner wall of the reaction tube and an outer circumferential edge of the substrate, the member includes a main face extending in a radial direction of the substrate and in a substantially entire circumferential direction of the substrate in a horizontal plane parallel to a main face of the substrate, and is disposed in an outer circumferential region of the substrate, and gas activated in the plasma generation region is supplied through a surface region of the main face of the member to the substrate. | 05-28-2009 |
Takashi Koshimizu, Sagamihara JP
| Patent application number | Description | Published |
|---|---|---|
| 20110290126 | MULTIPOINT SERVO PRESS MACHINE - The invention provides a servo press machine including a slide moved up and down by multiple crank structures, the machine which provides perfect synchronism between main gears driving the respective crank structures and in which a compact, efficient power transmission structure can be implemented in a simple construction. In the servo press machine including the slide moved up and down by the multiple crank structures, synchronous distribution gears are driven by servo motors; the multiple main gears are driven in synchronism by the synchronous distribution gears; and each of the crank structures is driven by each of the main gears. | 12-01-2011 |
Takumi Koshimizu, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20090158775 | Method For Producing Glass Substrate For Magnetic Disk And Method For Manufacturing Magnetic Disk - When mirror polishing is performed on a glass substrate by bringing a polishing pad into contact with the surface of the glass substrate while supplying a polishing liquid containing polishing grains to the substrate surface, the pH of the polishing liquid is maintained within a certain range or the agglomeration degree or dispersion degree of the polishing liquid is controlled. Consequently, an adequate mirror polishing rate can be maintained and there can be obtained a glass substrate having a good end shape. | 06-25-2009 |
Toshimasa Koshimizu, Hagagun JP
| Patent application number | Description | Published |
|---|---|---|
| 20110010940 | SPINNING METHOD - A workpiece having a first constant diameter portion, a tapered reduced-diameter portion, a concave portion, a tapered increased-diameter portion, and a second constant diameter portion is formed by machining the tapered reduced-diameter portion, and then machining the tapered increased-diameter portion and the concave portion. | 01-20-2011 |
Toshimasa Koshimizu, Tochigi-Ken JP
| Patent application number | Description | Published |
|---|---|---|
| 20090001131 | Method of manufacturing cylindrical body, friction stir welding method, and friction stir welding device - A friction stir welding apparatus ( | 01-01-2009 |
Uichi Koshimizu, Osaka JP
| Patent application number | Description | Published |
|---|---|---|
| 20090325288 | METHOD FOR INDUCING DIFFERENTIATION OF PLURIPOTENT STEM CELLS INTO CARDIOMYOCYTES - The present invention provides a method for inducing differentiation of cardiomyocytes efficiently and selectively from stem cells. | 12-31-2009 |
Wataru Koshimizu, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20090202839 | ADHESIVE AND LAMINATE FOR PACKAGING USING THE SAME - Provided is an adhesive giving a laminate for packaging that favorably withstands retort processing even when the period for curing reaction (aging period) is shortened. The adhesive conysind: a partially acid-modified polyester alcohol composition (A), prepared by esterifying a part of the hydroxyl groups in a polyester alcohol composition produced by condensation of a polyvalent alcohol and a polyvalent alcohol containing at least one of a monocarboxylic acid and a monovalent alcohol, with anhydrotrimellitic acid and a anhydrotrimellitate ester at an anhydrotrimellitic acid/anhydrotrimellitate ester ratio of 10/90 to 70/30 (by mass); and a polyisocyanate (B). Also provided is a laminate for packaging of a plurality of sheet-shaped base materials bonded to each other with the adhesive. | 08-13-2009 |
Yuki Koshimizu, Kashiwa-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20120069724 | OPTICAL PICKUP APPARATUS - An optical-pickup apparatus includes: a laser diode; an objective lens; a diffraction grating; a photodetector including main-beam-, first-sub-beam-, and second-sub-beam-light-receiving portions; a quarter-wave plate having either a second area allowing a reflected-laser beam to pass therethrough without polarization or a third area allowing the reflected beam to pass therethrough at a polarization angle different from that of the first area; and a polarizing member having a separate-light-amount ratio set therefor with respect to the reflected beams passing through the second or third area and an area excluding the second or third area from the first area, such that proportions of the reflected beams passing therethrough toward the photodetector are different, thereby decreasing an irradiation level when the first- and second-sub-beam-light-receiving portions are irradiated, as stray light, with the reflected beam reflected from either one, not subjected to a signal-reading operation, of the first- and second-signal-recording layers of an optical disc. | 03-22-2012 |