Patent application number | Description | Published |
20130299455 | FOCUS RING HEATING METHOD, PLASMA ETCHING APPARATUS, AND PLASMA ETCHING METHOD - There are provided a method of heating a focus ring and a plasma etching apparatus, capable of simplifying a structure of a heating mechanism without a dummy substrate. The plasma etching apparatus includes a vacuum processing chamber; a lower electrode serving as a mounting table for mounting a substrate thereon; an upper electrode provided to face the lower electrode; a gas supply unit for supplying a processing gas; a high frequency power supply for supplying a high frequency power to the lower electrode to generate a plasma of the processing gas; and a focus ring provided on the lower electrode to surround a periphery of the substrate. In the plasma etching apparatus, the focus ring is heated by irradiating a heating light thereto from a light source provided outside the vacuum processing chamber. | 11-14-2013 |
20130337635 | FILM DEPOSITION APPARATUS, SUBSTRATE PROCESSING APPARATUS AND FILM DEPOSITION METHOD - A film deposition apparatus configured to perform a film deposition process on a substrate in a vacuum chamber includes a turntable configured to rotate a substrate loading area to receive the substrate, a film deposition area including at least one process gas supplying part configured to supply a process gas onto the substrate loading area and configured to form a thin film by depositing at least one of an atomic layer and a molecular layer along with a rotation of the turntable, a plasma treatment part provided away from the film deposition area in a rotational direction of the turntable and configured to treat the at least one of the atomic layer and the molecular layer for modification by plasma, and a bias electrode part provided under the turntable without contacting the turntable and configured to generate bias potential to attract ions in the plasma toward the substrate. | 12-19-2013 |
20140056328 | TEMPERATURE MEASUREMENT APPARATUS AND METHOD - A temperature measurement apparatus includes a light source; a first splitter that splits a light beam into a measurement beam and a reference beam; a reference beam reflector that reflects the reference beam; an optical path length adjustor; a second splitter that splits the reflected reference beam into a first reflected reference beam and a second reflected reference beam; a first photodetector that measures an interference between the first reflected reference beam and a reflected measurement beam obtained by the measurement beam reflected from a target object; a second photodetector that measures an intensity of the second reflected reference beam; and a temperature calculation unit. The temperature calculation unit calculates a location of the interference by subtracting an output signal of the second photodetector from an output signal of the first photodetector, and calculates a temperature of the target object from the calculated location of the interference. | 02-27-2014 |
20140062296 | PLASMA PROCESSING APPARATUS, PLASMA GENERATING APPARATUS, ANTENNA STRUCTURE AND PLASMA GENERATING METHOD - A plasma processing apparatus includes: a mounting table, disposed in a processing chamber, configured to mount thereon the substrate; an inductively coupled antenna disposed outside the processing chamber to be opposite to the mounting table, the inductively coupled antenna being connected to a high frequency power supply; and a window member forming a wall of the processing chamber which faces the inductively coupled antenna. The window member includes a plurality of conductive windows made of a conductive material, and dielectric portions disposed between the conductive windows. The inductively coupled antenna is extended in a predetermined direction on the window member and electrically connected to one of the conductive windows, and electrical connection by conductors is sequentially performed from the one of the conductive windows to the other conductive windows in the same direction as an extension direction of the inductively coupled antenna. | 03-06-2014 |
20140170859 | FILM FORMATION DEVICE, SUBSTRATE PROCESSING DEVICE, AND FILM FORMATION METHOD - A film formation device to conduct a film formation process for a substrate includes a rotating table, a film formation area configured to include a process gas supply part, a plasma processing part, a lower bias electrode provided at a lower side of a position of a height of the substrate on the rotating table, an upper bias electrode arranged at the same position of the height or an upper side of a position of the height, a high-frequency power source part connected to at least one of the lower bias electrode and the upper bias electrode and configured to form a bias electric potential on the substrate in such a manner that the lower bias electrode and the upper bias electrode are capacitively coupled, and an exhaust mechanism. | 06-19-2014 |
20140216345 | PLASMA PROCESSING APPARATUS - A plasma processing apparatus includes a processing chamber including a dielectric window; a coil-shaped RF antenna, provided outside the dielectric window; a substrate supporting unit provided in the processing chamber; a processing gas supply unit; an RF power supply unit for supplying an RF power to the RF antenna to generate a plasma of the processing gas by an inductive coupling in the processing chamber, the RF power having an appropriate frequency for RF discharge of the processing gas; a correction coil, provided at a position outside the processing chamber where the correction coil is to be coupled with the RF antenna by an electromagnetic induction, for controlling a plasma density distribution on the substrate in the processing chamber; a switching device provided in a loop of the correction coil; and a switching control unit for on-off controlling the switching device at a desired duty ratio by pulse width modulation. | 08-07-2014 |
20140216346 | PLASMA PROCESSING APPARATUS - A plasma processing apparatus includes a processing chamber including a dielectric window; a coil-shaped RF antenna, provided outside the dielectric window; a substrate supporting unit provided in the processing chamber; a processing gas supply unit; an RF power supply unit for supplying an RF power to the RF antenna to generate a plasma of the processing gas by an inductive coupling in the processing chamber, the RF power having an appropriate frequency for RF discharge of the processing gas; a correction coil, provided at a position outside the processing chamber where the correction coil is to be coupled with the RF antenna by an electromagnetic induction, for controlling a plasma density distribution on the substrate in the processing chamber; a switching device provided in a loop of the correction coil; and a switching control unit for on-off controlling the switching device at a desired duty ratio by pulse width modulation. | 08-07-2014 |
20140220260 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF DEPOSITING A FILM - A substrate processing apparatus for performing a plasma process inside a vacuum chamber includes a turntable including substrate mounting portions for the substrates formed along a peripheral direction of the vacuum chamber to orbitally revolve these; a plasma generating gas supplying portion supplying a plasma generating gas into a plasma generating area; an energy supplying portion supplying energy to the plasma generating gas to change the plasma generating gas to plasma; a bias electrode provided on a lower side of the turntable to face the plasma generating area and leads ions in the plasma onto surfaces of the wafers; and an evacuation port evacuating the vacuum chamber, wherein the bias electrode extends from a rotational center of the turntable to an outer edge side, and a width of the bias electrode in a rotational direction is smaller than a distance between adjacent substrate mounting portions. | 08-07-2014 |
20150132505 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - A plasma processing apparatus is provided. According to the apparatus, a main antenna connected to a high frequency power source and an auxiliary antenna electrically insulated from main antenna is arranged. Moreover, projection areas when the main antenna and the auxiliary antenna are seen in a plan view are arranged so as not to overlap with each other. More specifically, the auxiliary antenna is arranged on a downstream side in a rotational direction of the turntable relative to the main antenna. Then, a first electromagnetic field is generated in the auxiliary antenna by way of an induction current flowing through the main antenna, and a second induction plasma is generated even in an area under the auxiliary antenna in addition to an area under the main antenna by resonating the auxiliary antenna. | 05-14-2015 |
Patent application number | Description | Published |
20100243162 | PLASMA PROCESSING APPARATUS - A uniformity of plasma density in a target object surface and plasma processing characteristics can be improved. A plasma processing apparatus | 09-30-2010 |
20100243608 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - There is provided a plasma processing apparatus capable of varying an AC ratio without installing a largely scaled-up movable unit. An etching apparatus | 09-30-2010 |
20100304572 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - An optimum application voltage for reducing deposits on a peripheral portion of a substrate as well as improving a process result in balance is effectively found without changing a height of a focus ring. A plasma processing apparatus includes a focus ring which includes a dielectric ring provided so as to surround a substrate mounting portion of a mounting table and a conductive ring provided on the dielectric ring; a voltage sensor configured to detect a floating voltage of the conductive ring; a DC power supply configured to apply a DC voltage to the conductive ring. An optimum voltage to be applied to the conductive ring is obtained based on a floating voltage actually detected from the conductive ring, and the optimum application voltage is adjusted based on a variation in the actually detected floating voltage for each plasma process. | 12-02-2010 |
20110211817 | METHOD FOR HEATING PART IN PROCESSING CHAMBER OF SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR MANUFACTURING APPARATUS - There is provided a method for heating a part within a processing chamber of a semiconductor manufacturing apparatus having a substrate in the processing chamber and performing a process on the substrate. The heating method includes generating heating lights which is generated by a heating light source provided outside the processing chamber and has a wavelength band capable of passing through a first part in the processing chamber and being absorbed into a second part in the processing chamber made of a material different from that of the first part, and heating the second part in the processing chamber by passing the heating lights through the first part in the processing chamber and irradiating the heating lights to the second part in the processing chamber. | 09-01-2011 |
20110235056 | METHOD FOR MEASURING WEAR RATE - A wear rate measurement method includes thermally coupling a focus ring having a top surface and a bottom surface with a reference piece having a bottom surface facing a susceptor and a top surface facing the focus ring; measuring a first optical path length of a low-coherence light beam that travels forward and backward within the focus ring by irradiating the low-coherence light beam to the focus ring orthogonally to the top surface and the bottom surface thereof; measuring a second optical path length of a low-coherence light beam that travels forward and backward within the reference piece by irradiating the low-coherence light beam to the reference piece orthogonally to the top surface and the bottom surface thereof; and calculating a wear rate of the focus ring based on a ratio between the first optical path length and the second optical path length. | 09-29-2011 |
20110235675 | SUBSTRATE MOUNTING TABLE - There is provided a substrate mounting table capable of accurately measuring a temperature of a wafer supported on the substrate mounting table without incurring contamination within a chamber and without forming a hole for measuring a temperature in the substrate mounting table. The substrate mounting table includes a mounting surface | 09-29-2011 |
20120031560 | PLASMA PROCESSING APPARATUS - A plasma processing apparatus includes: an evacuable chamber | 02-09-2012 |
20120037597 | PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD - There is provided a plasma processing apparatus capable of performing a uniform plasma process on a substrate by controlling a plasma distribution within a chamber to a desired state and uniformizing a plasma density within the chamber. The plasma processing apparatus includes an evacuable chamber | 02-16-2012 |
20120176692 | FOCUS RING AND SUBSTRATE PROCESSING APPARATUS HAVING SAME - There is provided a focus ring that is capable of preventing deposits from adhering to a member having a lower temperature in a gap between two members having different temperatures. A focus ring | 07-12-2012 |
20120241092 | PLASMA PROCESSING APPARATUS - In the plasma processing apparatus | 09-27-2012 |
Patent application number | Description | Published |
20130255362 | HARDNESS TESTER - A hardness tester capable of facilitating positioning of a sample even when the hardness tester includes a manual XY stage. The hardness tester includes an XY stage displacing a sample stage in a horizontal direction; a CCD camera capturing an image of a sample surface via an objective lens; a monitor displaying the image of the sample surface captured by the CCD camera; an operator specifying a test position at which an indentation is to be formed, the test position being specified on the image displayed on the display; and a CPU calculating, in conjunction with displacement of the XY stage, an amount of offset in the XY direction between the test position and a center position of the indenter when forming the indentation, then displaying the calculated amount of offset on the display. | 10-03-2013 |
20130258094 | HARDNESS TESTER - A hardness tester enabling a user to form an indentation in a desired test position, capable of performing an accurate hardness test even when center positions of an indenter and a field lens are offset. The hardness tester includes an XY stage displacing a sample stage in a horizontal direction; a CCD camera capturing images of a sample surface via a field lens; a monitor displaying the images; a turret capable of selectively positioning the indenter or the field lens in a predetermined position opposite the sample; a memory storing an amount of horizontal direction offset between the center positions of the indenter and the field lens when positioned in the predetermined position; and a CPU displaying, based on the amount of offset stored in the memory, a mark indicating the center position of the indenter on the monitor when the field lens is positioned in the predetermined position. | 10-03-2013 |
20140013834 | HARDNESS TESTER AND PROGRAM - A hardness tester having an image capturer capturing an indentation image, a data memory, an automatic size-scanning program scanning an indentation size, and a hardness calculation program includes: an identification information providing program providing image data with test specimen identification information and indentation identification information; a memory control program having the image data associated with the identification information stored; a specifying program specifying, when a scanning error occurs, identification information of image data in which the scanning error has occurred; an obtaining program obtaining the image data from the data memory based on the specified identification information; and a re-scanner (a display, an operator, and a manual size-calculation program) re-scanning an indentation size from the obtained image data. | 01-16-2014 |
Patent application number | Description | Published |
20080223034 | Master cylinder - Disclosed is a master cylinder comprising a stepped cylinder having a large diameter cylinder portion and a small diameter cylinder portion, a stepped piston inserted into the stepped cylinder, a reverse-flow-checking opening and closing portion for partitioning the inside of the stepped cylinder into a large diameter pressurizing chamber and a small diameter hydraulic chamber, and a control valve device in which a control valve body releases a hydraulic pressure in the large diameter pressurizing chamber to a reservoir side such that the hydraulic pressure in the large diameter pressurizing chamber is gradually reduced in accordance with a rise in a hydraulic pressure in the small hydraulic chamber, the master cylinder characterized in further comprising a check valve device comprising a check valve chamber communicating with an relief passage, which releases a hydraulic pressure in the large diameter pressurizing chamber to the reservoir via the control valve device, and with a small diameter hydraulic chamber, respectively, and a check valve body accommodated in the check valve chamber for permitting flow of a brake fluid from the relief passage to the small hydraulic chamber, and for preventing flow of the brake fluid in a reverse direction. | 09-18-2008 |
20080264248 | Master cylinder and method of manufacturing the same - An object of the present invention is to provide a master cylinder capable of controlling an increase in an intruding amount of a cup seal while relieving a stress concentration therein to thereby prevent the cup seal from being damaged. Provided is a master cylinder in which a piston is moved in slidable contact with an inner circumference of a cup seal held in a cylinder main body so as to pressurize a brake fluid in a pressure chamber formed of the piston and the cylinder main body, wherein an annular wall configured integrally with the cylinder main body is provided behind the cup seal. Further, a chamfered portion having a curved shape in a cross-section taken along a diameter direction of the cylinder main body is provided between the annular wall and a cylinder wall to which the piston is facing. One end of the chamfered portion is formed continuously so that a tangent thereto is in line with the annular wall, and the other end of the chamfered portion is formed to constitute a flexed portion in combination with the cylinder wall. | 10-30-2008 |
20100244549 | Vehicle braking system and master cylinder - Provided are a vehicle braking system and a master cylinder which are capable of providing a good pedal feel. A valve-opening pressure for a pressure-reducing valve of the master cylinder is set higher than a hydraulic pressure which is obtained with a pressing force on a brake pedal being 500 N and lower than a hydraulic pressure obtained at a time when a booster reaches a full-load point in case of failure of the booster so as to be specialized for improving pedal feel. Required performance in case of failure of the booster is realized by a pressure-intensifying unit. | 09-30-2010 |
20110048226 | MASTER CYLINDER - A master cylinder includes a cylinder body which an operating fluid is introduced from a reservoir, a piston which is slidably fitted in the cylinder body and defines a pressure chamber inside the cylinder body, a supply pathway which is formed in the cylinder body and supplies the operating fluid from the reservoir to the pressure chamber, a bypass pathway which bypasses the supply pathway and allows the reservoir to communicate with the pressure chamber, and a check valve which is installed in the bypass pathway and opens a valve when the pressure inside the pressure chamber is lower than the pressure of the reservoir. | 03-03-2011 |
Patent application number | Description | Published |
20140119192 | MOBILE COMMUNICATION METHOD, MOBILE COMMUNICATION SYSTEM AND RADIO BASE STATION - When congestion in an eNB is detected, effective utilization of resources is achieved by adjusting not only a data flow rate in an EPS-RAB but also a band of a core network bearer corresponding with the EPS-RAB. A mobile communication method according to an embodiment includes a step A of causing an eNB to notify an MME of a cause of congestion and identifier information of the EPS-RAB involved in the congestion, when the eNB detects the congestion. | 05-01-2014 |
20140185525 | MOBILE COMMUNICATION METHOD AND APPLICATION SERVER APPARATUS - A mobile communication method according to the present invention includes the steps of: when an S-CSCF in an IMS receives a terminating signal directed to a UE, sending the terminating signal from the S-CSCF to an SCC-AS in the IMS, the terminating signal including call-type information indicating whether the terminating signal is for voice communication or AV communication; sending an inquiry signal including the call-type information from the SCC-AS to an HSS; and determining, by the SCC-AS, a domain to which the terminating signal is to be transferred, based on the call-type information and a response signal received from the HSS as a response to the inquiry signal. | 07-03-2014 |
20140219171 | MOBILE COMMUNICATION METHOD AND MOBILITY MANAGEMENT NODE - A mobile station UE chooses an appropriate domain for originating AV communication without causing connection delay even when roaming. A mobile communication method according to the present invention includes the steps of: causing a mobility management node MME in an LTE network to send a mobile station UE “ATTACH ACCEPT” containing AV communication provision capability information indicating a capability of providing AV communication in the LTE network; and causing the mobile station UE to determine, based on the AV communication provision capability information, whether to perform the AV communication via an IMS or to perform the AV communication by circuit switching communication. | 08-07-2014 |
Patent application number | Description | Published |
20130102315 | MOBILE COMMUNICATION SYSTEM AND MOBILE STATION - A mobile communication system according to the present invention is configured to be capable of switching a mobile station UE from a first communication state performing first AV communication via E-UTRAN to a second communication state performing second AV communication via UTRAN/GERAN, by performing a SRVCC procedure, codec information to be used in the second AV communication is exchanged between the mobile station UE and a MSC server/MGW in the first communication state before the SRVCC procedure is started, and the mobile station UE is configured to, in the SRVCC procedure, send the MSC server/MGW a command to switch to the exchanged codec information “Pseudo 3G H324M negotiation”. | 04-25-2013 |
20130321557 | MOBILE COMMUNICATION METHOD - A mobile communication method according to the present invention includes the step of, if handover of bearers configuring a path for a video communication from E-UTRAN to UTRAN fails, causing a MME or a MSC server to decide whether to hand over only a PS voice bearer of the bearers from E-UTRAN to UTRAN or to cancel the handover of the bearers. | 12-05-2013 |
20130321558 | MOBILE COMMUNICATION METHOD AND MOBILITY MANAGEMENT NODE - To provide a scheme for deciding a switching method for the video call when an UE#1 in video call with an UE#2 is caused to perform handover from an E-UTRAN to a UTRAN/GERAN. A mobile communication method according to the present invention is summarized by including the steps of: deciding the switching method for the video call, when a video bearer and a voice bearer which configure a path for the video call are set, by an IMS; and maintaining information on the decided switching method and association information with which information on the video bearer is in association with information on the voice bearer, by a mobile communcation network and an eNB. | 12-05-2013 |
20140301204 | MOBILE COMMUNICATION METHOD, POLICY AND CHARGING RULE SERVER APPARATUS, AND MOBILE MANAGEMENT NODE - When congestion is detected in an S-GW, communications are allowed to continue as many as possible. A mobile communication method according to the present invention includes: notifying, by the S-GW, a PDF in a PCRF of detection of congestion when the congest is detected; acquiring, by the PDF in the PCRF, charging system information regarding UEs using an S1 bearer and an S5 bearer set in the S-GW from an HSS; acquiring, by the PDF in the PCRF, communication service class information in a flow unit in the S1 bearer and the S5 bearer from the P-GW according to the notification; and performing, by the PDF in the PCRF, bandwidth adjustment on specific flows of the S1 bearer and the S5 bearer based on the charging system information and the communication service class information in the flow unit. | 10-09-2014 |
Patent application number | Description | Published |
20130005796 | METHOD FOR PROLIFERATING CARDIOMYOCYTES USING MICRO-RNA - Disclosed are: a method for proliferating cardiomyocytes, wherein a miRNA that promotes the proliferation of cardiomyocytes is used; a vector for the treatment of heart diseases; and a pharmaceutical composition or the like for the treatment of heart diseases. Specifically disclosed are: a method for proliferating cardiomyocytes, which uses a miRNA that has a cardiomyocyte proliferation promoting action; a vector for the treatment of heart diseases, which comprises the miRNA; and a pharmaceutical composition or the like for the treatment of heart diseases, which contains the vector. The miRNA is preferably one selected from the group consisting of miR-148a, miR-148b, miR-152 and miR-373 that are mature miRNAs, precursors of the aforementioned miRNAs, and mutants and analogues of the miRNAs and the precursors. | 01-03-2013 |
20140213633 | METHOD FOR PROLIFERATION CARDIOMYOCYTES USING MICRO-RNA - The present invention addresses the problems of providing a method for proliferating cardiomyocytes using a miRNA that promotes the proliferation of cardiomyocytes, a vector for use in the treatment of heart disease, a pharmaceutical composition for treating heart disease, and so forth. | 07-31-2014 |
20140213634 | METHOD FOR PROLIFERATION CARDIOMYOCYTES USING MICRO-RNA - The present invention addresses the problems of providing a method for proliferating cardiomyocytes using a miRNA that promotes the proliferation of cardiomyocytes, a vector for use in the treatment of heart disease, a pharmaceutical composition for treating heart disease, and so forth. | 07-31-2014 |
Patent application number | Description | Published |
20120069724 | OPTICAL PICKUP APPARATUS - An optical-pickup apparatus includes: a laser diode; an objective lens; a diffraction grating; a photodetector including main-beam-, first-sub-beam-, and second-sub-beam-light-receiving portions; a quarter-wave plate having either a second area allowing a reflected-laser beam to pass therethrough without polarization or a third area allowing the reflected beam to pass therethrough at a polarization angle different from that of the first area; and a polarizing member having a separate-light-amount ratio set therefor with respect to the reflected beams passing through the second or third area and an area excluding the second or third area from the first area, such that proportions of the reflected beams passing therethrough toward the photodetector are different, thereby decreasing an irradiation level when the first- and second-sub-beam-light-receiving portions are irradiated, as stray light, with the reflected beam reflected from either one, not subjected to a signal-reading operation, of the first- and second-signal-recording layers of an optical disc. | 03-22-2012 |
20120195180 | OPTICAL PICKUP APPARATUS - An optical-pickup apparatus includes: a single-wavelength-laser diode to emit a first-laser beam; a two-wavelength-laser diode to emit second- and third-laser beams; an objective lens; a photodetector to be irradiated with first- to third-reflected-light beams of the first- to third-laser beams reflected from the signal-recording layers of first- to third-optical discs; an aberration-correcting plate to guide the second- and third-laser beams toward the lens, and correct astigmatism of the reflected-light beams, and guide the astigmatism-corrected-reflected-light beams toward the photodetector; a semitransparent mirror to guide, toward the lens, the first-laser beam and the second- and third-laser beams having been guided by the aberration-correcting plate, and guide the reflected-light beams toward the aberration-correcting plate; a quarter-wave plate to convert the first- to third-laser beams from linearly-polarized light into circularly-polarized light, and convert the reflected-light beams from circularly-polarized light into linearly-polarized light; and a divergent lens to correct aberration caused by the mirror. | 08-02-2012 |