Patent application number | Description | Published |
20110177459 | RESIST UNDERLAYER FILM-FORMING COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCESS - There is disclosed a resist underlayer film-forming composition comprising, at least: a resin (A) obtained by condensing a compound represented by the following general formula (1) with a compound represented by the following general formula (2) by the aid of an acid catalyst; a compound (B) represented by the general formula (1); a fullerene compound (C); and an organic solvent. There can be a resist underlayer film composition in a multi-layer resist film to be used in lithography, which underlayer film is excellent in property for filling up a height difference of a substrate, possesses a solvent resistance, and is not only capable of preventing occurrence of twisting during etching of a substrate, but also capable of providing an excellently decreased pattern roughness; a process for forming a resist underlayer film by using the composition; and a patterning process. | 07-21-2011 |
20110195362 | RESIST UNDERLAYER FILM COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS AND FULLERENE DERIVATIVE - There is disclosed a resist underlayer film composition of a multilayer resist film used in lithography including (A) a fullerene derivative having a carboxyl group protected by a thermally labile group and (B) an organic solvent. There can be a resist underlayer film composition of a multilayer resist film used in lithography for forming a resist underlayer in which generation of wiggling in substrate etching can be highly suppressed and the poisoning problem in forming an upper layer pattern using a chemically amplified resist can be avoided, a process for forming the resist underlayer film, a patterning process and a fullerene derivative. | 08-11-2011 |
20120108071 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME - There is disclosed a resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formula (1-1) and/or (1-2), and one or more kinds of compounds and/or equivalent bodies thereof represented by the following general formula (2). There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, namely, an underlayer film having optimum n-value and k-value, excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same. | 05-03-2012 |
20120142193 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME - There is disclosed a resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formula (1-1) and/or general formula (1-2), and one or more kinds of compounds and/or equivalent bodies thereof represented by the following general formula (2). There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, (namely, an underlayer film having optimum n-value and k-value), excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same. | 06-07-2012 |
20120171868 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME - There is disclosed A resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formulae (1-1) and/or (1-2), one or more kinds of a compound represented by the following general formula (2), and one or more kinds of a compound, represented by the following general formula (3), and/or an equivalent body thereof. There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, (namely, an underlayer film having optimum n-value and k-value as an antireflective film), excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same. | 07-05-2012 |
20120184103 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME - There is disclosed a resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formulae (1-1) and/or (1-2), and one or more kinds of compounds, represented by the following general formulae (2-1) and/or (2-2), and/or equivalent bodies thereof. There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, (namely, an underlayer film having optimum n-value and k-value as an antireflective film), excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same. | 07-19-2012 |
20130056653 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS - The invention provides a positive resist composition comprising, as base resins contained therein, (A) a polymer having a weight-average molecular weight of 1000 to 500000 and containing a repeating unit which contains a structure having a hydrogen atom of a carboxyl group thereof substituted with an acid-labile group having a cyclic structure and (B) a novolak resin of a substituted or an unsubstituted naphtholphthalein, and in addition, a photo acid generator. There can be provided a positive resist composition having an appropriate absorption to form a pattern on a highly reflective substrate, excellent characteristics in adhesion and implantation onto a non-planar substrate, a good pattern profile after light exposure, and an ion implantation resistance at the time of ion implantation; and a patterning process. | 03-07-2013 |
20130056654 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS - The invention provides a positive resist composition comprising, as base resins contained therein, (A) a polymer having a weight-average molecular weight of 1000 to 500000 and containing a repeating unit which contains a structure having a hydrogen atom of a carboxyl group thereof substituted with an acid-labile group having a cyclic structure and (B) a novolak resin of a substituted or an unsubstituted fluorescein, and in addition, a photo acid generator. There can be provided a positive resist composition having an appropriate absorption to form a pattern on a highly reflective substrate with excellent pattern profile after light exposure, adhesion, implantation characteristics onto a non-planar substrate, and in addition, ion implantation resistance at the time of ion implantation; and to provide a patterning process. | 03-07-2013 |
20130087529 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME - There is disclosed A resist underlayer film composition, the resist underlayer film composition contains a truxene compound having a substituted or an unsubstituted naphthol group as shown by the following general formula (1). There can be provided a resist underlayer film composition to form a resist underlayer film being capable of reducing reflectance and having high etching resistance, heat resistance. | 04-11-2013 |
20130089820 | RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS - There is disclosed a resist top coat composition, used in a patterning process onto a photoresist film, wherein a resist top coat is formed by using the resist top coat composition onto a photoresist film formed on a wafer, and then, after exposure, removal of the resist top coat and development of the photoresist film are performed to effect the patterning on the photoresist film, wherein the resist top coat composition contains a truxene compound having phenol groups shown by the following general formula (1). As a result, there is provided a resist top coat composition not only having an effect from an environment to a resist film reduced and effectively shielding an OOB light, but also reducing film loss of a resist pattern and bridging between patterns and having an effect to enhance sensitivity of the resist; and a patterning process using this. | 04-11-2013 |
20130171569 | RESIST UNDERLAYER FILM COMPOSITION, METHOD FOR PRODUCING POLYMER FOR RESIST UNDERLAYER FILM, AND PATTERNING PROCESS USING THE RESIST UNDERLAYER FILM COMPOSITION - A resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of a condensed body, the body being obtained by condensation of one or more kinds of a compound shown by the following general formula (1-1) with one or more kinds of a compound shown by the following general formula (2-3) and an equivalent body thereof, with one or more kinds of a compound shown by the following general formula (2-1), a compound shown by the following general formula (2-2), and an equivalent body thereof; a method for producing a polymer for a resist underlayer film; and a patterning process using the same. | 07-04-2013 |
20130337649 | COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS - The invention provides a compound for forming an organic film having a partial structure represented by the following formula (i) or (ii), | 12-19-2013 |
20140335692 | METHOD FOR FORMING A RESIST UNDER LAYER FILM AND PATTERNING PROCESS - The present invention provides a method for forming a resist under layer film used in a lithography process, comprising: a process for applying a composition for forming a resist under layer film containing an organic compound having an aromatic unit on a substrate; and a process for heat-treating the resist under layer film applied in an atmosphere whose oxygen concentration is 10% or more at 150° C. to 600° C. for 10 to 600 seconds after heat-treating the same in an atmosphere whose oxygen concentration is less than 10% at 50 to 350° C. There can be provided a method for forming a resist under layer film having excellent filling/flattening properties so that unevenness on a substrate can be flattened even in complex processes such as multi-layer resist method and double patterning. | 11-13-2014 |
20150221500 | METHOD FOR CLEANING AND DRYING SEMICONDUCTOR SUBSTRATE - The present invention provides a method for cleaning and drying a semiconductor substrate in which a semiconductor substrate onto which a pattern has been formed is cleaned and dried, which comprises steps of (1) cleaning the semiconductor substrate onto which a pattern has been formed with a cleaning solution, (2) substituting the cleaning solution with a composition solution containing a resin (A) which is decomposed by either or both of an acid and heat, and (3) decomposing and removing the resin (A) by either or both of an acid and heat. There can be provided a method for cleaning and drying a semiconductor substrate in which pattern falling or collapse occurring at the time of drying the cleaning solution after cleaning the substrate can be suppressed, and the cleaning solution can be efficiently removed, without using a specific apparatus which handles a supercritical state cleaning solution. | 08-06-2015 |
Patent application number | Description | Published |
20090015090 | PERMANENT MAGNET ROTATING ELECTRICAL MACHINE AND PERMANENT MAGNET ROTATING ELECTRICAL MACHINE SYSTEM - Movement of magnets due to centrifugal force is restricted. In a permanent magnet rotating electrical machine | 01-15-2009 |
20090322175 | PERMANENT-MAGNET TYPE ELECTRIC ROTATING MACHINE AND PERMANENT-MAGNET TYPE ELECTRIC ROTATING MACHINE SYSTEM FOR AUTOMOBILE OR TRAIN - A rotor is deployed such that the rotor becomes coaxially rotatable with a stator. A shaft is fixed onto the axis of a rotor iron-core. 1-pole constituting magnet slots are deployed into V-character pattern along an outer circumference portion of the rotor iron-core. Permanent magnets are embedded into the magnet slots. For the 1 pole, the 2 pieces of same-polarity permanent magnets are embedded into the V-character pattern. The configuration of each embedded permanent magnet is designed as follows: From the thickness of the permanent-magnet edge portion on the inner-diameter side of the rotor iron-core, which becomes the center of the V-character pattern, the thickness of the permanent magnet gradually increases toward the outer-diameter side of the rotor iron-core, which become the right and left edge portions of the V-character pattern. Simultaneously, curved lines are provided on both edge portions of the permanent magnet. | 12-31-2009 |
20100026145 | SEALED TYPE ELECTRIC ROTATING MACHINE - In a sealed type electric rotating machine, in which a cooling medium inflows from both end sides of a rotating shaft of a claw-pole type rotor, a cooling medium having passed through a heat exchanging part divides into one on an exhaust side and one on an intake air side to be used again for cooling of the claw-pole type rotor and a stator. On the exhaust side, a cooling medium being high in temperature as compared with that on the intake air side performs cooling, and the rotor and the stator are made higher in temperature on the exhaust side than on the intake air side. In order to level temperature profiles of the claw-pole type rotor and the stator in an axial direction, a partition, which cuts off an axial duct, is provided toward the exhaust side relative to a center in the axial direction. | 02-04-2010 |
20100176682 | PERMANENT MAGNET TYPE ROTARY ELECTRIC MACHINE - A permanent magnet type rotary electric machine has a rotor having a rotor core and permanent magnets buried into the rotor core by being incorporated into respective permanent magnet slots. The permanent magnet slot per one pole is divided at least into four slots along an outer circumferential direction in the rotor core, and in respective rest core-portions between adjacent divided permanent magnet slots in the rotor core, a width of a first rest core-portion at the middle of each pole and a width of a second rest core-portion between adjacent poles of different polarities are formed larger than that of the others. | 07-15-2010 |
20100194221 | PERMANENT MAGNET ELECTRICAL ROTATING MACHINE, WIND POWER GENERATING SYSTEM, AND A METHOD OF MAGNETIZING A PERMANENT MAGNET - A permanent magnet electrical rotating machine having a permanent magnet rotor and a stator, wherein: | 08-05-2010 |
20110156521 | Permanent Magnet Type Rotating Electric Machine - A permanent magnet type rotating electric machine is comprised of a rotor and a stator opposed to each other keeping a predetermined clearance therebetween. The rotor having a rotor core formed by silicon steel plates being laminated in an axial direction of the rotor core, slots being formed near an outer periphery of the rotor core in the rotor core so as to be open at the outer periphery of the rotor core, permanent magnets being inserted into the slots respectively, and a non-magnetic sleeve covering the outer periphery of the rotor core. Each of the slots has inclined side faces outwardly broadening the slot in a radial direction of the rotor core. Each of the permanent magnets is fixed into the slot with a force applied from the sleeve so as to directing toward a center of the rotor core and an pressure applied from the inclined side faces of the slot. | 06-30-2011 |
20110163624 | PERMANENT MAGNET TYPE ROTARY ELECTRIC MACHINE - A rotary electric machine, wherein the rotation direction of a rotor is a defined direction, a groove is provided in a rotor core on the radial outside with respect to permanent magnets, and the groove is provided in a position inclined from the centerline between the permanent magnets within a magnetic pole head and at the same time in a position excluding an end portion of a permanent magnet insertion hole on the radial outside, in order to enable a reduction in a no-load induced electromotive force and prevention of a decrease in output. | 07-07-2011 |
20110181137 | PERMANENT MAGNET TYPE ELECTRIC POWER GENERATOR - For providing a permanent magnet type generator that has a limited inside temperature rise gradient even if the capacity thereof is increased and permits to reduce the size thereof, the present invention provides a ventilation means that increases the inner gas (air or cooling wind) quantity that is caused circulated via the heat exchanger causing to flow outer air is increased more at a region facing the outer air exhaust side in the heat exchanger than at the outer air inlet side. | 07-28-2011 |
20110241350 | PERMANENT MAGNETIC ROTATING ELECTRIC MACHINE AND WIND POWER GENERATING SYSTEM - The permanent magnet rotating electric machine comprising a stator with a stator coil wound on a stator iron core, a rotor with a plurality of permanent magnets disposed in the circumferential direction in a rotor iron core, which is disposed opposite to the stator iron core of the stator with a predetermined spacing therebetween and is fixed to a shaft, a water-cooling unit disposed around the outer circumference of the stator iron core, and a fan fixed to the shaft on the same side as at least one axial end of the rotor iron core to circulate cooling air in the permanent magnet rotating electric machine; | 10-06-2011 |
20110260466 | PERMANENT MAGNET TYPE ROTARY ELECTRIC MACHINE - For providing a permanent magnet type rotary electric machine that can reduce magnetic fluxes concentrated to one side in rotating direction on a magnetic pole circumferential face that causes torque ripple as well as ensure the mechanical strength, in the present invention, an outer circumference of respective magnetic poles is formed in a circular arc having a same curvature as well as the magnetic pole center axes of the respective magnetic poles are displaced with respect to the rotation center of a rotor so that an air gap between a stator and the respective magnetic pole outer circumferences at one side in the rotating direction is widened in comparison with the air gap at the other side. | 10-27-2011 |
20120032539 | Permanent Magnet Rotating Machine - A permanent magnet rotating machine has a stator, in which armature windings are formed in a plurality of slots formed in a stator iron core, and also has a rotor, in which two magnet insertion slots are formed for each pole in a rotor iron core in a V shape when viewed from the outer circumference of the rotor and one permanent magnet is embedded in each magnet insertion slot with polarity alternating for each pole; a wall at one end of the magnet insertion slot on the external diameter side of the rotor is formed with three arcs having different curvatures, one of the three arcs being parallel to the outer circumference of the rotor, and a wall at the other end of the magnet insertion slot on the internal diameter side of the rotor is formed in an arc shape. | 02-09-2012 |
20120146567 | Rotator Control Device, Rotator System, Vehicle, Electric Car and Electric Generation System - To prevent demagnetization of a permanent magnet synchronous rotating machine, a rotating machine control device according to the present invention is a rotating machine control device comprising: a power converter having a switch part on each of a positive side and a negative side for each phase; and short circuit detection unit for detecting a short circuit of the switch part, wherein a command to turn on positive-side switches and negative-side switches of a plurality of phases of the switch part is issued in the case where the short circuit detection unit detects the short circuit. | 06-14-2012 |
20120228990 | Permanent Magnet Type Electrical Rotating Machine and Permanent Magnet Type Electrical Rotating Machine System for Vehicle - Provided is a permanent magnet type electrical rotating machine which realizes a rotor retaining structure for securely preventing the rotor before being coupled to a prime mover from moving in any of not only the axial and radial but also rotational (circumferential) directions, even in a case where it is a large capacity (with a large magnetic attractive force) permanent magnet type electrical rotating machine having an overhung rotor support structure. | 09-13-2012 |
20130127172 | Electrical Rotating Machine System or Wind Turbine System - An electrical rotating machine system that can be easily maintained and can provide improved power generation efficiency. The electrical rotating machine system includes:a first electrical rotating machine having a first stator that has first stator windings, and a first rotor that has first rotor windings and is disposed on the internal diameter side of the first stator so as to have a gap between the internal diameter side of the first stator and the first rotor itself; a second electrical rotating machine having a second stator that has second stator windings, and a second rotor that has second rotor windings and is disposed on the internal diameter side of the second stator so as to have a gap between the internal diameter side of the second stator and the second rotor itself; and at least one power converter that is electrically connected to the first rotor windings and the second rotor windings, and configured to rotate when the first rotor rotates. | 05-23-2013 |
20130221780 | Permanent Magnet Pump Motor - In a permanent magnet pump motor comprising a stator and a rotor, a permanent magnet is used for the rotor; and the rotor has a shaft end portion to be mounted with a joint shaft for rotor insertion and bearing brackets for housing therein bearings for supporting the both ends of the rotor. The bearing brackets have cavities through which a rotor shaft and the joint shaft can pass. | 08-29-2013 |
20130221784 | Permanent Magnet Rotating Electric Machine - A permanent magnet rotating electric machine includes a rotor and a stator. The rotor includes: a permanent magnet forming a single pole within a rotor core of the rotor, the permanent magnet being divided into two across a magnetic pole center and arranged such that the magnetic pole center and a magnetization direction of the permanent magnet extend in parallel with each other; a connecting portion assuming an electrical steel sheet disposed between the two divided permanent magnets; and magnet insertion holes in which the permanent magnets are inserted. In the rotor, the magnet insertion hole is shaped to include: air gaps at both end portions in a width direction of the permanent magnet, each air gap being formed between a surface of the permanent magnet extending perpendicularly to the magnetization direction and a surface of the electrical steel sheet facing the surface of the permanent magnet; a shoulder portion disposed on the facing surface, the shoulder portion having a length shorter than a thickness in the magnetization direction of the permanent magnet; and another air gap extending toward a rotor outside diameter side and the magnetic pole center side in a direction perpendicular to the shoulder portion on an outside of the shoulder portion. | 08-29-2013 |
20140001912 | ELECTRICAL ROTATING MACHINE | 01-02-2014 |
Patent application number | Description | Published |
20110311920 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, RESIST BOTTOM LAYER FORMING METHOD, AND PATTERNING PROCESS - A naphthalene derivative having formula (1) is provided wherein cyclic structures Ar1 and Ar2 denote a benzene or naphthalene ring, X is a single bond or C | 12-22-2011 |
20120064725 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS - A naphthalene derivative having formula (1) is provided wherein An and Art denote a benzene or naphthalene ring, and n is such a natural number as to provide a weight average molecular weight of up to 100,000. A material comprising the naphthalene derivative or a polymer comprising the naphthalene derivative is spin coated to form a resist bottom layer having improved properties. A pattern forming process in which a resist bottom layer formed by spin coating is combined with an inorganic hard mask formed by CVD is available. | 03-15-2012 |
20120252218 | BIPHENYL DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, BOTTOM LAYER FORMING METHOD, AND PATTERNING PROCESS - A biphenyl derivative having formula (1) is provided wherein Ar1 and Ar2 denote a benzene or naphthalene ring, and x and z each are 0 or 1. A material comprising the biphenyl derivative or a polymer comprising recurring units of the biphenyl derivative is spin coated and heat treated to form a resist bottom layer having improved properties, optimum values of n and k, step coverage, etch resistance, heat resistance, solvent resistance, and minimized outgassing. | 10-04-2012 |
20130143162 | RESIST-PROTECTIVE FILM-FORMING COMPOSITION AND PATTERNING PROCESS - A pattern is printed by forming a photoresist layer on a wafer, forming a protective film thereon, exposure, and development. The protective film is formed from a protective film-forming composition comprising a novolak resin of a bisphenol compound and a mixture of an alcohol solvent and an ether or aromatic solvent. | 06-06-2013 |
20140363768 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS - A naphthalene derivative having formula (1) is provided wherein Ar1 and Ar2 denote a benzene or naphthalene ring, and n is such a natural number as to provide a weight average molecular weight of up to 100,000. A material comprising the naphthalene derivative or a polymer comprising the naphthalene derivative is spin coated to form a resist bottom layer having improved properties. A pattern forming process in which a resist bottom layer formed by spin coating is combined with an inorganic hard mask formed by CVD is available. | 12-11-2014 |
20140363956 | UNDERLAYER FILM-FORMING COMPOSITION AND PATTERN FORMING PROCESS - In lithography, a composition comprising a novolak resin comprising recurring units of hydroxycoumarin is used to form a photoresist underlayer film. The underlayer film is strippable in alkaline water, without causing damage to ion-implanted Si substrates or SiO | 12-11-2014 |
20140363957 | UNDERLAYER FILM-FORMING COMPOSITION AND PATTERN FORMING PROCESS - In lithography, a composition comprising a novolak resin comprising recurring units of fluorescein is used to form a photoresist underlayer film. The underlayer film is strippable in alkaline water, without causing damage to ion-implanted Si substrates or SiO | 12-11-2014 |
20140363958 | UNDERLAYER FILM-FORMING COMPOSITION AND PATTERN FORMING PROCESS - In lithography, a composition comprising a novolak resin comprising recurring units derived from a naphtholphthalein is used to form a photoresist underlayer film. The underlayer film is strippable in alkaline water, without causing damage to ion-implanted Si substrates or SiO | 12-11-2014 |
Patent application number | Description | Published |
20090163508 | AMIDE COMPOUND - An object of the present invention is to provide a novel fused-ring compound which has a FAAH inhibitory effect and is useful as an analgesic. | 06-25-2009 |
20100041891 | AMIDE COMPOUND - A compound having GPR52 agonist activity or a salt thereof is provided. | 02-18-2010 |
20100234389 | AMIDE COMPOUND - An object of the present invention is to provide a novel fused-ring compound which has a FAAH inhibitory effect and is useful as an analgesic. | 09-16-2010 |
20110039893 | GSK-3BETA INHIBITOR - For the purpose of providing a GSK-3β inhibitor containing a 2-aminopyridine compound or a salt thereof or a prodrug thereof useful as an agent for the prophylaxis or treatment of a GSK-3β-related pathology or disease, the present invention provides a GSK-3β inhibitor containing a compound represented by the formula (IA): | 02-17-2011 |
20120077799 | HETEROCYCLIC COMPOUND AND USE THEREOF - Provided is a compound represented by the formula (I): | 03-29-2012 |
20130184266 | HETEROCYCLIC COMPOUND AND USE THEREOF - Provided is a compound represented by the formula (I): | 07-18-2013 |
20130190291 | HETEROCYCLIC COMPOUND AND USE THEREOF - Provided is a compound represented by the formula (I): | 07-25-2013 |
20140024650 | SULFONAMIDE DERIVATIVE AND USE THEREOF - Provided is a compound having an AMPA receptor function enhancing action, and useful as a prophylactic or therapeutic drug for depression, Alzheimer's disease, schizophrenia, attention deficit hyperactivity disorder (ADHD) and the like. A compound represented by the formula (I): | 01-23-2014 |
20140080817 | HETEROCYCLIC COMPOUND AND USE THEREOF - Provided is a compound represented by the formula (I): | 03-20-2014 |
20150073137 | HETEROCYCLIC COMPOUND AND USE THEREOF - Provided is a compound represented by the formula (I): | 03-12-2015 |
Patent application number | Description | Published |
20100280981 | INFORMATION FILTERING SYSTEM, INFORMATION FILTERING METHOD AND INFORMATION FILTERING PROGRAM - A string matching unit | 11-04-2010 |
20110078218 | EVENT HISTORY STORAGE DEVICE, EVENT HISTORY TRACKING DEVICE, EVENT HISTORY STORAGE METHOD, EVENT HISTORY STORAGE PROGRAM, AND DATA STRUCTURE - When an instance targeted for tracking is divided or replicated to generate a new instance, ready and continuous tracking of a history of an event related to the original instance and the new instance is allowed. A behavior ID is assigned to an event for each instance, and an occurrence order of the event is managed for each instance. When a new instance has been generated from an instance due to a certain event, a new behavior ID is assigned to the new instance, with respect to that event. Then, the new identifier and an identifier assigned to the instance that is a generation source for the event are associated. | 03-31-2011 |
20110307488 | INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, AND PROGRAM - A behavior index indicates a development of occurrence of events included in log data by a connection of a plurality of nodes, and includes a branching node connecting to two or more subsequent nodes and an integrating node connected to two or more preceding nodes. When a regular expression converting part inputs a search condition indicating an event appearance order from a client, a search automaton retaining part generates a state transition table in accordance with the search condition. While a node type determining part determines the node types of the respective nodes of the behavior index, a state evaluating part analyzes the respective nodes to determine the states of the respective nodes, and determines whether or not a state transition pattern matches the state transition table. Regarding a branching node, the respective nodes of each of branching routes branching from the branching node are analyzed. Regarding an integrating node, the respective nodes of each of upstream routes merging into the integrating node are analyzed. | 12-15-2011 |
20120280838 | DATA COMPRESSION DEVICE, DATA COMPRESSION METHOD, AND PROGRAM - A prediction error calculation part calculates a prediction error for each input data. A prediction error encoding part generates a prediction error code by encoding the value of the prediction error. A run-length counting part counts the run-length of the prediction error. When the value of the prediction error changes, a run-length encoding part generates a run-length code by encoding the run-length counted. A code connecting part generates a connected code by connecting the run-length code to the prediction error code of a corresponding prediction error. When the value of the prediction error is a particular value, a prediction error checking part selects a connected code for the prediction error, as an output code. When the value of the prediction error is a different value, the prediction error checking part selects a prediction error code for the prediction error, as an output code. A code output part outputs the output code selected. | 11-08-2012 |
20130103643 | DATA PROCESSING APPARATUS, DATA PROCESSING METHOD, AND PROGRAM - A data receiving part receives data transmitted from a plurality of measuring devices. A time determining part distinguishes management time from date and time of the data. The record generating part stores data of the same management time which are received during a predetermined acceptance time, in the same record. When un-arrived data belonging to the same management time exists at the end of the acceptance time, arrival of the un-arrived data is waited for during a predetermined wait time. Even if the data is arrived with some delay, arrival-delayed data can be stored in the same record. Thus, the missing data occurrence frequency can be suppressed. | 04-25-2013 |
20130275433 | CLASSIFICATION RULE GENERATION DEVICE, CLASSIFICATION RULE GENERATION METHOD, CLASSIFICATION RULE GENERATION PROGRAM, AND RECORDING MEDIUM - In a document classification device | 10-17-2013 |
Patent application number | Description | Published |
20080263240 | Transfer apparatus, transfer system, program, and transfer method - Disclosed herein is a transfer apparatus including, a connection status detection block, a storage status detection block, a no-operation status detection block, and a transfer block. | 10-23-2008 |
20080291221 | IMAGE PROCESSING SYSTEM, INFORMATION PROCESSING APPARATUS, IMAGE PROCESSING METHOD AND PROGRAM - An information processing apparatus according to the present invention includes an acquisition unit that obtains from a terminal device equipped with a display screen attribute information including information indicating the directionality of the display screen, a detection unit that detects the size of a input image, an adjustment unit that adjusts the size of the input image so as to align the direction along which the longer side of the input image extends with the direction along which the longer side of the display screen extends based upon the information indicating the directionality of the display screen included in the attribute information, and a transfer unit that transfers the input image with the adjusted size to the terminal device. | 11-27-2008 |
20090113560 | CONTENT PROCESSING DEVICE, SERVER DEVICE, COMMUNICATION METHOD, AND STORAGE MEDIUM CONTAINING COMPUTER PROGRAM | 04-30-2009 |
20140040740 | INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, AND PROGRAM - Disclosed are an information processing apparatus, an information processing method, and a program capable of easily classifying contents as a processing target in reproduction and the like. For example, a screen is displayed by arranging a (thumbnail of a) cover art as a symbol image serving as a symbol representing a content such as a song on a 2-dimensional plane, and a carpet area which is a band-shaped area having a width extending, for example, in an x-direction as a direction perpendicular to a predetermined axis of the 2-dimensional plane is displayed. The content whose symbol image is included in the carpet area is regarded as a processing target in a predetermined process. The present technology may be applied to, for example, a case where a song to be registered in a playlist is classified from contents such as songs. | 02-06-2014 |