Patent application number | Description | Published |
20090143747 | COILED WIRE FOR THE CONTROLLED RELEASE OF DRUGS TO THE EYE - This invention is in the area of medical devices, in particular in the area of medical devices for drug delivery, more in particular for controlled release of drugs to the eye. Delivery of drugs to the anterior side of the eye is routinely done with eye drops, but this method results in low bioavailability and low patient compliance. Devices that address these problems have been described for the delivery of drugs to the eye. One of such devices, called the OphthaCoil, consists of a thin metallic wire, which is coiled and carries a drug-loaded adherent hydrogel coating on its surface. Surprisingly it has now been found that the drug loading capacity can be dramatically increased by filling the lumen of the coil with micro-particles such as microspheres that contain the drug of choice. | 06-04-2009 |
20090275671 | TWO COMPONENT BONE CEMENT COMPOSITION FOR VERTEBROPLASTY - The invention is directed to an intrinsically radio-opaque two component bone cement, comprising a first component which contains at least one acrylate monomer and a second component which contains at least one initiator for the polymerisation of said acrylate monomer, wherein the at least one iodine containing radio-opacity providing polymer is present in at least one of the two components and wherein the cement, when mixed into a slurry has a viscosity, which is sufficiently low to allow injection of the cement slurry through a needle with a diameter in the range of 10-15 G used in percutaneous vertebroplasty. | 11-05-2009 |
20090297612 | HOMOGENEOUS, INTRINSIC RADIOPAQUE EMBOLIC PARTICLES - The invention is directed to embolic material comprising spherical, homogeneous and substantially non-porous radiopaque polymer particles based on at least one hydrophilic monomer and at least one radiopaque monomer according to general formula | 12-03-2009 |
20110276136 | IMPLANT FOR PROSTHESES - The invention is directed to an implant comprising an envelope filled with a core filling material, such as breast implants and implants for aesthetic and reconstructive surgery, comprising at least one biocompatible gel material and evenly dispersed through the gel material at least one particulate radiopaque, MRI and/or ultra-sound visible material, wherein the core filling material is viscoelastic at 37° C., having a viscosity in the range of 10 to 10 | 11-10-2011 |
Patent application number | Description | Published |
20110037201 | IMPRINT LITHOGRAPHY APPARATUS AND METHOD - An imprint lithography method is disclosed for forming a patterned layer from a UV-curable, imprintable liquid medium on a substrate by means of an imprint template with a patterned surface. The method involves bringing together the patterned surface and the UV-curable medium for a filling period, illuminating the UV-curable medium with UV-radiation for an illumination period, holding the patterned surface and the UV-curable imprintable liquid medium together for a holding period such that the UV-curable medium has formed a self-supporting patterned layer, and separating the patterned surface and the patterned layer at the end of the holding period. The start time of the illumination period is earlier than the end time of the filling period by a pre-cure period. Also, a method is disclosed where the end time of the illumination period is earlier than the end time of the holding period. | 02-17-2011 |
20110079939 | IMPRINT LITHOGRAPHY APPARATUS AND METHOD - An imprint lithography method is disclosed for forming a patterned layer from an imprintable liquid medium on a substrate by means of an imprint template having a patterned surface. The method involves contacting the patterned surface and imprintable liquid medium together for a filling period. Light emergent (e.g., scattered or reflected) from an interface between the medium and the patterned surface is collected and measured during the filling period to obtain data concerning one or more voids at the interface, and an estimated end time for the filling period is derived from a relationship between the data and time. The method may allow subsequent process steps to be undertaken more rapidly, with reduced risk of defects arising from remnants of unfilled voids. An imprint lithography apparatus and component for putting the method into effect are also disclosed. | 04-07-2011 |
20110200795 | IMPRINT LITHOGRAPHY - An imprint lithography template is disclosed. The imprint lithography template includes a plurality of pattern features extending from a plane of a body of the imprint lithography template, and away from that body, the pattern features to be used to apply a pattern into an imprintable medium. The imprint lithography template further includes a plurality of assist features in the form of recesses extending from the plane of that body of the imprint lithography template, and into that body. A method for forming the assist features in the imprint lithography template, using self-assembled block copolymers as an etch resist, is also disclosed. | 08-18-2011 |
20110226735 | IMPRINT LITHOGRAPHY - An imprint lithography method is disclosed that includes, after imprinting an imprint lithography template into a layer of imprintable medium to form a pattern in that imprintable medium and fixing that pattern to form a patterned layer of imprintable medium, adding etch resistant material (i.e. a hard mask) to a part of the patterned layer of imprintable medium to reduce a difference between an intended topography and an actual topography of that part of the patterned layer of imprintable medium. | 09-22-2011 |
20120021140 | IMPRINT LITHOGRAPHY ALIGNMENT METHOD AND APPARATUS - A method of aligning a template and a substrate for imprint lithography involves using a mask pattern of the template and a luminescent marker pattern of the substrate, the method including aligning the template mask pattern and the substrate marker pattern using a radiation intensity measurement of radiation emitted by the luminescent marker pattern and having passed the template mask pattern. The mask pattern and the luminescent marker pattern may each be shaped to provide a turning point in the intensity of detected radiation emitted from the marker pattern, and passing through the mask pattern to a detector, as a function of relative displacement at the aligned position. The displacement of the template and substrate may be aligned by identifying the turning point in radiation intensity. The marker pattern may be fluorescent with the emitted radiation excited by a radiation source. | 01-26-2012 |
20120182538 | Methods and Apparatus for Inspection Of Articles, EUV Lithography Reticles, Lithography Apparatus and Method of Manufacturing Devices - An article such as an EUV lithography reticle is inspected to detect contaminant particles. The method comprises applying a fluorescent dye material to the article, illuminating the article with radiation at wavelengths suitable for exciting the fluorescent dye, monitoring the article for emission of second radiation by the fluorescent dye at a wavelength different from the first radiation, and generating a signal representing contamination in the event of detecting the second radiation. In one example, measures such as low-affinity coatings may be applied to the reticle to reduce affinity for the dye molecules, while the dye molecules will bind by physical or chemical adsorption to the contaminant particles. Dyes may be selected to have fluorescence behavior enhanced by hydrophobicity or hydrophilicity, and contaminant surfaces treated by buffer coatings accordingly. | 07-19-2012 |
20120312501 | METHOD AND APPARATUS FOR TREATMENT OF SELF-ASSEMBLABLE POLYMER LAYERS FOR USE IN LITHOGRAPHY - Treatment of a layer comprising self-assemblable polymer at a surface of a substrate is disclosed. In an embodiment, the treatment includes arranging a zone of temperature change to sweep across the layer, wherein a temperature of the layer within the zone differs from an initial temperature of the layer prior to passage of the zone. | 12-13-2012 |
20130034811 | METHOD FOR PROVIDING AN ORDERED LAYER OF SELF-ASSEMBLABLE POLYMER FOR USE IN LITHOGRAPHY - A method for providing an ordered polymer layer at a surface of a substrate includes depositing a self-assemblable polymer layer directly onto a primer layer on a substrate to provide an interface between the self-assemblable polymer layer and the primer layer, and treating the self-assemblable polymer layer to provide self-assembly into an ordered polymer layer, such as a block copolymer, having first and second domain types at the interface. The primer layer is adapted to improve its chemical affinity to each domain type at the interface, in response to the presence of the respective domain type in the self-assembled polymer at the interface during the self-assembly of the self-assemblable polymer layer into the ordered polymer layer. This may lead to reduction in defect levels and/or improved persistence length for the ordered polymer layer. The method may be useful for forming resist layers for use in device lithography. | 02-07-2013 |
20130078574 | SELF-ASSEMBLABLE POLYMER AND METHOD FOR USE IN LITHOGRAPHY - A self-assemblable polymer is disclosed, having first and second molecular configurations with the first molecular configuration has a higher Flory Huggins parameter for the self-assemblable polymer than the second molecular configuration, and the self-assemblable polymer is configurable from the first molecular configuration to the second molecular configuration, from the second molecular configuration to the first molecular configuration, or both, by the application of a stimulus. The polymer is of use in a method for providing an ordered, periodically patterned layer of the polymer on a substrate, by ordering and annealing the polymer in its second molecular configuration and setting the polymer when it is in the first molecular configuration. The second molecular configuration provides better ordering kinetics and permits annealing of defects near its order/disorder transition temperature, while the first molecular configuration, with a higher order/disorder transition temperature, provides low line edge/width roughness for the pattern formed on setting. | 03-28-2013 |
20130120725 | IMPRINT LITHOGRAPHY METHOD AND IMPRINTABLE MEDIUM - An imprint lithography method is disclosed for reducing a difference between an intended topography and an actual topography arising from a part of a patterned layer of fixed imprintable medium. The method involves imprinting an imprint lithography template into a layer of flowable imprintable medium to form a patterned layer in the imprintable medium, and fixing the imprintable medium to form a patterned layer of fixed imprintable medium. Local excitation is applied to the part of the patterned layer to adjust a chemical reaction in the part of the patterned layer to reduce the difference between the intended topography and the actual topography arising from the part of the fixed patterned layer of imprintable medium when this is subsequently used as a resist for patterning the substrate. An imprint medium suitable for imprint lithography with the method is also disclosed. | 05-16-2013 |
20130120729 | INSPECTION METHOD FOR IMPRINT LITHOGRAPHY AND APPARATUS THEREFOR - A method is disclosed for inspecting a device imprint lithography template to detect defect particles of imprintable medium remaining on the patterned imprinting surface after an earlier imprint step. The method involves illuminating the patterned surface with radiation of a first wavelength selected to induce fluorescence of the defect particles and not to induce fluorescence of anti-adhesion compound on the patterned surface. The presence of defect particles is indicated by the presence of fluorescence from the patterned surface and can be used to initiate a cleaning step when necessary, speeding processing by eliminating unnecessary cleaning. The elimination of false positives from transferred anti-adhesion compound is reduced or eliminated. Related apparatus is also disclosed. | 05-16-2013 |
20130133736 | PHOTOVOLTAIC CELL DEVICE WITH SWITCHABLE LIGHTING/REFLECTION - The present invention relates to a photovoltaic cell device with combined energy conversion and lighting option and a method a controlling such a device. It comprises a responsive element, a reflector or a light source for changing light absorption and thus appearance of photovoltaic cells (e.g. solar panel). It is also possible to combine the responsive element or the reflector with light source(s) providing extra illumination. When combined with a sensor and control unit, ambient intelligent solar panels and ambient intelligent lighting systems can be obtained. A combination of a luminescent solar concentrator (LSC) and light-emitting device is also possible, where an energy storage device is charged by a photovoltaic cell upon irradiation. The energy storage powers one or more light sources which are coupled to the sides of the luminescent plate. The light emitted by the light sources is coupled into the plate and (partly) converted by the luminescent plate. This results in a plate that homogeneously emits light. | 05-30-2013 |
20130140272 | LITHOGRAPHY USING SELF-ASSEMBLED POLYMERS - A method of lithography on a substrate uses a self-assembled polymer (SAP) layer deposited on the substrate, with first and second domains arranged in a pattern across the layer. A planarization layer is formed over the SAP and a development etch applied to substantially remove a portion of the planarization layer over the second domain leaving a cap of the planarization layer substantially covering the first domain. The uncapped second domain is then removed from the surface by a breakthrough etch leaving the capped first domain as a pattern feature on the surface. A transfer etch may then be used to transfer the pattern feature to the substrate using the capped first domain. The capping allows the second domain to be removed, e.g., without excessive loss of lateral feature width for the remaining first domain, even when the difference in etch resistance between the first and second domains is small. | 06-06-2013 |
20130192664 | LUMINESCENT CONVERTER - The invention relates to a luminescent converter ( | 08-01-2013 |
20130266727 | METHODS FOR PROVIDING PATTERNED ORIENTATION TEMPLATES FOR SELF-ASSEMBLABLE POLYMERS FOR USE IN DEVICE LITHOGRAPHY - A method is disclosed involving depositing a neutral orientation template layer onto a substrate after formation of chemical epitaxy or graphoepitaxy features on the substrate, but before deposition and orientation of a self-assemblable polymer. The orientation layer is arranged to bond with the substrate but not with certain features, so that it may be easily removed by vacuum or rinsing with organic solvent. The neutral orientation layer has a chemical affinity to match that of blocks in the self-assemblable polymer so that blocks of differing types wet the neutral orientation layer so that domains in the self-assembled polymer may lie side by side along the substrate surface, with interfaces normal to the substrate surface. The resulting aligned and oriented self-assembled polymer may itself be used as a resist for device lithography of the substrate. | 10-10-2013 |
20140245948 | METHOD TO PROVIDE A PATTERNED ORIENTATION TEMPLATE FOR A SELF-ASSEMBLABLE POLYMER - A graphoepitaxy template to align a self-assembled block polymer adapted to self-assemble into a 2-D array having parallel rows of discontinuous first domains extending parallel to a first axis, mutually spaced along an orthogonal second axis, and separated by a continuous second domain. The graphoepitaxy template has first and second substantially parallel side walls extending parallel to and defining the first axis and mutually spaced along the second axis to provide a compartment to hold at least one row of discontinuous first domains of the self-assembled block copolymer on the substrate between and parallel to the side walls, and separated therefrom by a continuous second domain. The compartment has a graphoepitaxial nucleation feature arranged to locate at least one of the discontinuous first domains at a specific position within the compartment. Methods for forming the graphoepitaxy template and its use for device lithography are also disclosed. | 09-04-2014 |
20140299575 | SELF-ASSEMBLABLE POLYMER AND METHOD FOR USE IN LITHOGRAPHY - A BCP having first block of first monomer and second block of second monomer, adapted to undergo a transition from disordered state to ordered state at a temperature less than T | 10-09-2014 |
20140340663 | Apparatus for Monitoring a Lithographic Patterning Device - A lithographic patterning device deformation monitoring apparatus ( | 11-20-2014 |
20140346141 | SELF-ASSEMBLABLE POLYMER AND METHODS FOR USE IN LITHOGRAPHY - A method of forming a self-assembled block polymer layer, oriented to form an ordered array of alternating domains, is disclosed. The method involves providing a layer of the self-assemblable block copolymer on the substrate and depositing a first surfactant onto the external surface of the layer prior to inducing self-assembly of the layer to form the ordered array of domains. The first surfactant has a hydrophobic tail and a hydrophilic head group and acts to reduce the interfacial energy at the external surface of the block copolymer layer in order to promote formation of assembly of the block copolymer polymer into an ordered array having the alternating domains. | 11-27-2014 |
20150027980 | MANUFACTURING METHOD OF AN APPARATUS FOR THE PROCESSING OF SINGLE MOLECULES - The invention relates to a method for manufacturing an apparatus for the processing of single molecules. According to this method, a self-assembling resist ( | 01-29-2015 |
20150034594 | METHODS OF PROVIDING PATTERNED TEMPLATES FOR SELF-ASSEMBLABLE BLOCK COPOLYMERS FOR USE IN DEVICE LITHOGRAPHY - A method is disclosed to form a patterned template on a substrate, to direct orientation of a self-assemblable block copolymer. The method involves providing a resist layer of a positive tone resist on the substrate and overexposing the resist with actinic (e.g. UV) radiation by photolithography to expose a continuous region of the resist layer with a sub-resolution unexposed resist portion at the interface between the resist and the substrate. The resist portion remaining at the interface, after removal of the exposed region, provides a basis for a chemical epitaxy template. The method may allow for simple, direct photolithography to form a patterned chemical epitaxy template and optionally include an accurately co-aligned graphoepitaxy feature and/or a substrate alignment feature. | 02-05-2015 |
20150050599 | METHODS OF PROVIDING PATTERNED EPITAXY TEMPLATES FOR SELF-ASSEMBLABLE BLOCK COPOLYMERS FOR USE IN DEVICE LITHOGRAPHY - A method is disclosed to form a patterned epitaxy template, on a substrate, to direct self-assembly of block copolymer for device lithography. A resist layer on a substrate is selectively exposed with actinic (e.g. UV or DUV) radiation by photolithography to provide exposed portions in a regular lattice pattern of touching or overlapping shapes arranged to leave unexposed resist portions between the shapes. Exposed or unexposed resist is removed with remaining resist portions providing the basis for a patterned epitaxy template for the orientation of the self-assemblable block copolymer as a hexagonal or square array. The method allows for simple, direct UV lithography to form patterned epitaxy templates with sub-resolution features. | 02-19-2015 |