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Koole
Johannes Lodewijk Koole, Kessel-Lo BE
| Patent application number | Description | Published |
|---|---|---|
| 20080249202 | Method for the Production of Polyisocyanates - Process for preparing polyisocyanates involving the removal of a solvent-stream enriched in volatile, aromatic, non-isocyanate-group-containing contaminants from the polyisocyanate production process. | 10-09-2008 |
| 20100204510 | PROCESS FOR PRODUCTION OF DI- AND POLYAMINES OF THE DIPHENYLMETHANE SERIES - Process for the production of di- and poly(diamino diphenyl methane) comprising the steps of | 08-12-2010 |
Levinus Hendrik Koole, Gulpen NL
| Patent application number | Description | Published |
|---|---|---|
| 20090143747 | COILED WIRE FOR THE CONTROLLED RELEASE OF DRUGS TO THE EYE - This invention is in the area of medical devices, in particular in the area of medical devices for drug delivery, more in particular for controlled release of drugs to the eye. Delivery of drugs to the anterior side of the eye is routinely done with eye drops, but this method results in low bioavailability and low patient compliance. Devices that address these problems have been described for the delivery of drugs to the eye. One of such devices, called the OphthaCoil, consists of a thin metallic wire, which is coiled and carries a drug-loaded adherent hydrogel coating on its surface. Surprisingly it has now been found that the drug loading capacity can be dramatically increased by filling the lumen of the coil with micro-particles such as microspheres that contain the drug of choice. | 06-04-2009 |
| 20090275671 | TWO COMPONENT BONE CEMENT COMPOSITION FOR VERTEBROPLASTY - The invention is directed to an intrinsically radio-opaque two component bone cement, comprising a first component which contains at least one acrylate monomer and a second component which contains at least one initiator for the polymerisation of said acrylate monomer, wherein the at least one iodine containing radio-opacity providing polymer is present in at least one of the two components and wherein the cement, when mixed into a slurry has a viscosity, which is sufficiently low to allow injection of the cement slurry through a needle with a diameter in the range of 10-15 G used in percutaneous vertebroplasty. | 11-05-2009 |
| 20090297612 | HOMOGENEOUS, INTRINSIC RADIOPAQUE EMBOLIC PARTICLES - The invention is directed to embolic material comprising spherical, homogeneous and substantially non-porous radiopaque polymer particles based on at least one hydrophilic monomer and at least one radiopaque monomer according to general formula | 12-03-2009 |
Roelof Koole, Eindhoven NL
| Patent application number | Description | Published |
|---|---|---|
| 20110037201 | IMPRINT LITHOGRAPHY APPARATUS AND METHOD - An imprint lithography method is disclosed for forming a patterned layer from a UV-curable, imprintable liquid medium on a substrate by means of an imprint template with a patterned surface. The method involves bringing together the patterned surface and the UV-curable medium for a filling period, illuminating the UV-curable medium with UV-radiation for an illumination period, holding the patterned surface and the UV-curable imprintable liquid medium together for a holding period such that the UV-curable medium has formed a self-supporting patterned layer, and separating the patterned surface and the patterned layer at the end of the holding period. The start time of the illumination period is earlier than the end time of the filling period by a pre-cure period. Also, a method is disclosed where the end time of the illumination period is earlier than the end time of the holding period. | 02-17-2011 |
| 20110079939 | IMPRINT LITHOGRAPHY APPARATUS AND METHOD - An imprint lithography method is disclosed for forming a patterned layer from an imprintable liquid medium on a substrate by means of an imprint template having a patterned surface. The method involves contacting the patterned surface and imprintable liquid medium together for a filling period. Light emergent (e.g., scattered or reflected) from an interface between the medium and the patterned surface is collected and measured during the filling period to obtain data concerning one or more voids at the interface, and an estimated end time for the filling period is derived from a relationship between the data and time. The method may allow subsequent process steps to be undertaken more rapidly, with reduced risk of defects arising from remnants of unfilled voids. An imprint lithography apparatus and component for putting the method into effect are also disclosed. | 04-07-2011 |
Roelof Koole, Utrecht NL
| Patent application number | Description | Published |
|---|---|---|
| 20110018167 | IMPRINT LITHOGRAPHY APPARATUS AND METHOD - An imprint lithography apparatus is disclosed. The apparatus includes an imprint template arrangement for use in imprinting a pattern into a substrate provided with an amount of imprintable medium, a substrate holder configured to hold the substrate, and a chamber having an inlet to allow gas to flow into the chamber and an outlet to allow gas to flow out of the chamber, wherein the imprint template arrangement and the substrate holder are located within the chamber, the chamber, in use, being arranged to contain a gaseous atmosphere. The chamber may be part of a gas circulation system, the inlet and outlet of the chamber being connected to further components of the gas circulation system, the further components of the gas circulation system including: a gas circulation driver configured to drive gas around the gas circulation system; and/or a gas purification unit configured to purify the gas as it circulates around the gas circulation system. | 01-27-2011 |
| 20110049097 | IMPRINT LITHOGRAPHY METHOD AND APPARATUS - In an embodiment, there is provided an imprint lithography method that includes providing a first amount of imprintable medium on a first area of a substrate, the first amount of imprintable medium, when fixed, having a first etch rate; and providing a second amount of imprintable medium on a second, different area of the substrate, the second amount of imprintable medium, when fixed, having a second, different etch rate. | 03-03-2011 |