Patent application number | Description | Published |
20080197186 | Settlement server, settlement request server and settlement execution terminal - An object of the present invention is to, in settlement by electronic money, reduce burden on an electronic money server and enhance convenience for users. The function of generating transaction numbers is transferred from the electronic money server to affiliated store servers, so that the transaction numbers are generated by the affiliated store servers. The transaction numbers are each associated with transaction information calculated in accordance with a calculation rule confidential to third parties, such that the electronic money server can detect the presence of alteration of the transaction information based on the transaction number. Furthermore, at the time of generating a transaction number, a seed, which is time-limited secret information confidential to third parties, is inputted to the calculation rule along with the transaction information and used for calculating the transaction number, whereby it is possible to further enhance the level of security. | 08-21-2008 |
20080301014 | INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING METHOD, ELECTRONIC MONEY SERVICE PROVIDING SYSTEM, AND RECORDING MEDIUM - An electronic money system is provided which requires lower management and running cost, and features higher flexibility. An acquirer/brand holder managing an electronic money brand manages all keys used for authentication processing in the system, and issues the keys as necessary. The acquirer/brand holder distributes keys according to a tie-up agreement to IC card issuers, a POS center, an MMK center, and an affiliate merchant terminal unit. The POS center, the MMK center, and the affiliate merchant terminal unit are apparatuses for users to use the IC cards or for managing them. The acquirer/brand holder, however, does not distribute issued keys to cybershops which users can access by using a personal computer and a reader/writer. Instead, in this case the acquirer/brand holder saves the issued key itself, and carries out authentication processing with a predetermined IC card upon a request from the cybershop. | 12-04-2008 |
20120121055 | OPERATIONAL SUPPORT DEVICE AND OPERATIONAL SUPPORT METHOD FOR A NUCLEAR POWER PLANT - Provided are an operation support device and an operation support method for a nuclear power plant which are capable of accurately grasping the condition of a nuclear power plant and capable of offering support for instantly performing a predetermined operation by an operator when an unusual situation occurs. The operation support device for a nuclear power plant is provided with an operation state check display unit ( | 05-17-2012 |
20120202150 | RADIATION-SENSITIVE RESIN COMPOSITION - A radiation-sensitive resin composition includes an acid-labile group-containing polymer and photoacid generator. The radiation-sensitive resin composition is used to form a resist pattern using a developer that includes an organic solvent in an amount of 80 mass % or more. The radiation-sensitive resin composition has a contrast value γ of 5.0 to 30.0. The contrast value γ is calculated from a resist dissolution contrast curve obtained when developing the radiation-sensitive resin composition using the organic solvent. | 08-09-2012 |
20130129030 | OPERATION MONITORING APPARATUS OF NUCLEAR POWER PLANT - In an operation monitoring apparatus of a nuclear power plant, a first operation console ( | 05-23-2013 |
20130141994 | SEMICONDUCTOR DEVICE HAVING SKEW DETECTION CIRCUIT MEASURING SKEW BETWEEN CLOCK SIGNAL AND DATA STROBE SIGNAL - Disclosed herein is a semiconductor device that includes a clock terminal supplied with a first clock signal from outside; a dividing circuit dividing a frequency of the first clock signal to generate a plurality of second clock signals that are different in phase from one another; a multiplier circuit multiplying the second clock signals to generate a third clock signal, the multiplexer having a predetermined operating delay time; a data strobe terminal supplied with a first data strobe signal from outside; a strobe signal generation circuit adding the predetermined operating delay time to the first data strobe signal to generate a second data strobe signal; and a skew detection circuit measuring a skew between the third clock signal and the second data strobe signal. | 06-06-2013 |
20130224661 | PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION - A pattern-forming method includes coating a radiation-sensitive resin composition on a substrate to provide a resist film. The resist film is exposed. The exposed resist film is developed. A developer solution used in developing the exposed resist film includes no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a first polymer and a radiation-sensitive acid generator. The first polymer includes a first structural unit having an acid-labile group and an alicyclic group. The alicyclic group is capable of avoiding dissociation from a molecular chain by an action of an acid. | 08-29-2013 |
20130230803 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION - A resist pattern-forming method includes coating a radiation-sensitive resin composition on a substrate to provide a resist film. The resist film is exposed. The exposed resist film is developed with a developer solution including no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a base polymer, a fluorine-atom-containing polymer, a radiation-sensitive acid generator, a solvent, and a compound. The base polymer has an acid-labile group. The fluorine-atom-containing polymer has a content of fluorine atoms higher than a content of fluorine atoms of the base polymer. The compound has a relative permittivity greater than a relative permittivity of the solvent by at least 15. A content of the compound is no less than 10 parts by mass and no greater than 200 parts by mass with respect to 100 parts by mass of the base polymer. | 09-05-2013 |
20130230804 | PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION - A pattern-forming method includes providing a resist film on a substrate using a radiation-sensitive composition. The resist film is exposed. The exposed resist film is developed using a developer solution. The developer solution includes no less than 80% by mass of an organic solvent. The radiation-sensitive composition includes at least two components including a first polymer and a radiation-sensitive acid generator. The first polymer includes a structural unit having an acid-labile group. One or more components of the radiation-sensitive composition have a group represented by a formula (1). A | 09-05-2013 |
20130245848 | DEVICE FOR MONITORING OPERATION OF NUCLEAR PLANT - There is provided a device for monitoring an operation of a nuclear plant, including: a functional integration VDU having a regular-use-system VDU that monitors the operation of the plant under normal conditions, and a security-system VDU that leads to a safe state when the plant is in an abnormal state; and a security-system VDU that leads to a safe state when the plant is in an abnormal state. The functional integration VDU is mounted to a first operating console, the security-system VDU is mounted to a second operating console, and thereby an increase in the size of the operating consoles in the nuclear plant is suppressed, and increased ease of operation is enabled. | 09-19-2013 |
20130295506 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION - A resist pattern-forming method includes forming a resist coating film using a radiation-sensitive resin composition. The resist coating film is exposed and developed using a developer solution containing no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a polymer component including a polymer having an acid-labile group, and a radiation-sensitive acid generator. The polymer component includes, in an identical polymer or different polymers, a first structural unit having a first hydrocarbon group, and a second structural unit having a second hydrocarbon group. The first hydrocarbon group is an unsubstituted or substituted branched chain group, or the is like. The second hydrocarbon group has an adamantane skeleton. A molar ratio of the second hydrocarbon group to the first hydrocarbon group is less than 1. A proportion of a structural unit having a hydroxyl group in the polymer component is less than 5 mol %. | 11-07-2013 |
20130316287 | PHOTORESIST COMPOSITION - A photoresist composition includes a base polymer, a polymer and an acid generator. The base polymer includes a first structural unit that includes an acid-labile group. The polymer includes a second structural unit that includes an acid-labile group, and has a fluorine atom content higher than a fluorine atom content of the base polymer. The photoresist composition is developed using an organic solvent. The second structural unit is represented by a formula (1) or a formula (2). R | 11-28-2013 |
20130323653 | RESIST PATTERN-FORMING METHOD - A resist pattern-forming method includes applying a radiation-sensitive resin composition on a substrate to form a resist film. The radiation-sensitive resin composition includes an acid-labile group-containing polymer and a photoacid generator. The resist film is exposed. The resist film is developed using a developer including an organic solvent in an amount of no less than 80% by mass to a total amount of the developer. The radiation-sensitive resin composition has a contrast value γ of from 5.0 to 30.0. The contrast value γ is calculated from a resist dissolution contrast curve obtained by changing only a dose of a light used for exposing the resist film. | 12-05-2013 |
20130337385 | NEGATIVE PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION - A negative pattern-forming method includes providing a resist film on a substrate using a photoresist composition. The photoresist composition includes a first polymer and an organic solvent. The first polymer includes a first structural unit having an acid-generating capability. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent. | 12-19-2013 |
20140255854 | PATTERN-FORMING METHOD - A pattern-forming method includes providing a resist film on a substrate using a photoresist composition. The resist film is exposed. The exposed resist film is developed using a developer having an organic solvent content of 80 mass % or more. The photoresist composition includes a first polymer, a second polymer, and an acid generator. The first polymer is a base polymer and includes a first structural unit that includes an acid-labile group. The second polymer includes a second structural unit that includes an acid-labile group, and has a fluorine atom content higher than a fluorine atom content of the first polymer. The second structural unit is represented by a formula (1) or a formula (2). | 09-11-2014 |
20140363766 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION - A resist pattern-forming method includes forming a resist coating film using a radiation-sensitive resin composition. The resist coating film is exposed and developed using a developer solution containing no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a polymer component including a polymer having an acid-labile group, and a radiation-sensitive acid generator. The polymer component includes, in an identical polymer or different polymers, a first structural unit having a first hydrocarbon group, and a second structural unit having a second hydrocarbon group. The first hydrocarbon group is an unsubstituted or substituted branched chain group, or the is like. The second hydrocarbon group has an adamantane skeleton. A molar ratio of the second hydrocarbon group to the first hydrocarbon group is less than 1. A proportion of a structural unit having a hydroxyl group in the polymer component is less than 5 mol %. | 12-11-2014 |