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Koji Ichikawa, Osaka JP
Koji Ichikawa, Osaka JP
| Patent application number | Description | Published |
|---|---|---|
| 20100203446 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING PATTERN - A chemically amplified photoresist composition, comprises: an acid generator (A) represented by the formula (I), and a resin which comprises a structural unit (b1) derived from a monomer that becomes soluble in an alkali by an action of an acid, a structural unit (b2) derived from a monomer that has an adamantyl group having at least two hydroxyl groups, and a structural unit (b3) derived from a monomer that has a lactone ring; | 08-12-2010 |
| 20100230136 | METHOD FOR PRODUCING RESIST PATTERN - The present invention provides a method for producing a resist pattern sufficiently miniaturized having an excellent shape including: repeating a process of forming a patterned resist film comprising the following step (1): | 09-16-2010 |
| 20100304292 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (I-BB): | 12-02-2010 |
| 20100304293 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (a): | 12-02-2010 |
| 20100304294 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (I-AA): | 12-02-2010 |
| 20100304296 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (I-CC): | 12-02-2010 |
| 20100316951 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt having a group represented by the formula (I): | 12-16-2010 |
| 20100316952 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (a1): | 12-16-2010 |
| 20100323296 | RESIN AND RESIST COMPOSITION - A resin comprises a structural unit derived from a compound represented by the formula (aa) | 12-23-2010 |
| 20110014566 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (I-Pa): | 01-20-2011 |
| 20110014567 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (I—Pb): | 01-20-2011 |
| 20110014568 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt having a divalent group represented by the formula (aa): | 01-20-2011 |
| 20110033804 | PHOTORESIST COMPOSITION - The present invention provides a photoresist composition comprising a resin which comprises a structural unit derived from a compound having an acid-labile group and a structural unit derived from a compound represented by the formula (a): | 02-10-2011 |
| 20110053082 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A resin comprises a structural unit derived from a compound represented by the formula (I); | 03-03-2011 |
| 20110053086 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A compound of the present invention is represented by the formula (A); | 03-03-2011 |
| 20110065041 | PHOTORESIST COMPOSITION - The present invention provides a photoresist composition comprising an acid generator and a resin comprising a structural unit derived from a monomer represented by the formula (I): | 03-17-2011 |
| 20110076617 | PHOTORESIST COMPOSITION - The present invention provides a photoresist composition comprising a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, an acid generator and a compound represented by the formula (I): | 03-31-2011 |
| 20110111342 | PHOTORESIST COMPOSITION - The present invention provides a photoresist composition comprising a resin comprising a structural unit derived from a compound represented by the formula (I): | 05-12-2011 |
| 20110117493 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (X): | 05-19-2011 |
| 20110117494 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (X): | 05-19-2011 |
| 20110117495 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (X): | 05-19-2011 |
| 20110123926 | PHOTORESIST COMPOSITION - The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (C1): | 05-26-2011 |