Patent application number | Description | Published |
20110085126 | METHOD OF AND APPARATUS FOR PRODUCING LIQUID CRYSTAL DISPLAY DEVICE - One aspect of the invention provides a liquid crystal display device producing method for irradiating a liquid crystal display substrate, in which plural pixels are formed in a matrix state and liquid crystal is sealed between a TFT substrate and a counter electrode substrate, with light having a predetermined wavelength to orient liquid crystal molecules toward a predetermined direction in a state in which an electric field is applied to each pixel of the liquid crystal display substrate. The method includes the steps of: dipping the liquid crystal display substrate and a lamp in a transparent liquid having resistivity of a predetermined value or more and sufficiently high transmittance to the light in a state in which the liquid crystal display substrate and the lamp face each other; and lighting the lamp to irradiate the liquid crystal display substrate with the light having a predetermined light quantity in a state in which the electric field is applied to each pixel. | 04-14-2011 |
20110244379 | METHOD FOR FORMING CONVEX PATTERN, EXPOSURE APPARATUS AND PHOTOMASK - The present invention is a photomask | 10-06-2011 |
20120075612 | EXPOSURE METHOD AND EXPOSURE APPARATUS - In the present invention, while conveying a subject to be exposed, when exposure on a first exposure area of the subject to be exposed is completed, the exposure being performed by using a first mask pattern group of a photomask in which a plurality of types of mask pattern groups corresponding to each exposure pattern is arranged and formed in a conveying direction of the exposure to be exposed at a predetermined interval, the photomask is moved in synchronization with a conveying speed of the exposure to be exposed and the mask pattern group is switched from the first mask pattern group to a second mask pattern group. When the switching of the mask pattern group of the photomask 11 is completed, the movement of the photomask is stopped, exposure on a second exposure area of the subject to be exposed 8 is performed by the mask pattern group. | 03-29-2012 |
20120077351 | LASER ANNEALING METHOD AND LASER ANNEALING APPARATUS - In the present invention, At least one row of lens arrays, in which a plurality of lenses are arranged in a direction intersecting with the conveying direction of a substrate to correspond to the plurality of TFT forming areas set in a matrix on the substrate, is shifted in the direction intersecting with the conveying direction of the substrate, to thereby align the lenses in the lens array with the TFT forming areas on the substrate based on the alignment reference position. The laser beams are irradiated onto the lens array when the substrate moves and the TFT forming areas reach the underneath of the corresponding lenses of the lens array, and the laser beams are focused by the plurality of lenses to anneal the amorphous silicon film in each TFT forming area. | 03-29-2012 |
20120113403 | EXPOSURE METHOD AND EXPOSURE APPARATUS - In the present invention, when exposure on a first exposure area of the subject to be exposed by using a first mask pattern group of a photomask, is completed, the shutter is moved in synchronization with a conveying speed of the subject to be exposed to shut off source light, the subject to be exposed is returned by a distance in which the subject to be exposed moves while the shutter moves, and the mask pattern group is switched to a second mask pattern group by moving the photomask. When the switching of the mask pattern group of the photomask is completed, the conveying of the subject to be exposed is restarted. At the same time, the shutter is moved in synchronization with the conveying speed of the subject to be exposed to release the shut off of the source light, and exposure on a second exposure area is performed. | 05-10-2012 |
20120249993 | EXPOSURE METHOD AND EXPOSURE APPARATUS - An exposure method includes a step of moving a photomask by a predetermined distance and switching a first mask pattern group to a second mask pattern group when an exposure to a first exposure area on an object to be exposed by the first mask pattern group of the photomask formed by arranging the first and the second mask pattern groups corresponding to an exposure patterns at predetermined intervals in a conveying direction of the object to be exposed is completed, and a step of performing an exposure on the second exposure area on the object to be exposed by the second mask pattern group, in which a moving speed of the photomask is controlled so that a moving distance of the object to be exposed is longer than a moving distance of the photomask in a period of time when switching the first and the second mask pattern groups. | 10-04-2012 |
20130100431 | Method and apparatus for alignment processing - A method for alignment processing including making a substrate | 04-25-2013 |
20130188161 | SCANNING EXPOSURE APPARATUS USING MICROLENS ARRAY - A scanning exposure apparatus uses a plurality of microlens arrays to project a mask exposure pattern onto a substrate. A CCD line camera detects an image on the substrate at this time, and using a first-layer pattern on the substrate as a reference pattern, detects whether or not the mask exposure pattern matches the reference pattern. In a case in which the patterns do not match, the microlens array is tilted from a direction that is parallel to the substrate, and the mask exposure pattern is made to match the reference pattern by using the microlens array to adjust the exposure area on the substrate. When the exposure pattern deviates from the reference pattern, it is thereby possible to detect the deviation during exposure and to prevent an exposure pattern misregistration, thereby enhancing the precision of the exposure pattern in an overlay exposure. | 07-25-2013 |
20130342820 | LIGHT-EXPOSURE DEVICE - A light-exposure device is provided with a microlens array on which is arranged with a prescribed regularity a plurality of microlenses on which exposure light transmitted through a light source and a mask is introduced to resolve an upright equal-magnification image on a substrate. Upon reaching a prescribed position, the substrate is irradiated with pulsed laser light from the light source, and the substrate is successively exposed, and after the entire area of the exposure region of the substrate is exposed, a relative positional relationship between the microlens array and the mask is successively switched in a vertical direction by an amount of a horizontal pitch of the microlenses, and a subsequent exposure is performed. Exposure with high precision and high resolution can thereby be performed with a short exposure cycle time. | 12-26-2013 |
20140063808 | LASER LIGHTING DEVICE - In a laser lighting device, a fly's eye lens and a condenser lens are disposed in an optical path of pulsed laser light emitted from a light source, and an electro-optical crystal element for continuously changing the deflection direction of the pulsed laser light with respect to the incident light and allowing the deflected light to pass therethrough is disposed in a position between the light source and the fly's eye lens or between the fly's eye lens and the condenser lens. The electro-optical crystal element is formed, for example, of a pair of electrodes and an optical crystal material disposed between the electrodes, and a voltage is applied between the electrodes to produce an electric field that changes the refractive index of the electro-optical crystal element. As a result, non-uniform illumination due to interference fringes produced by light having passed through the fly's eye lens can be reduced. | 03-06-2014 |
20140126591 | PULSED LASER OSCILLATOR AND METHOD FOR CONTROLLING PULSED LASER OSCILLATION - A pulsed laser oscillator includes at least one first electrooptical element that polarizes light according to an applied voltage and a voltage control unit that applies a voltage to the first electrooptical element and controls the voltage. The voltage control unit changes over time a voltage value applied to the first electrooptical element, to control a pulse width of laser light. | 05-08-2014 |
20140199808 | DEPOSITION MASK, PRODUCING METHOD THEREFOR AND FORMING METHOD FOR THIN FILM PATTERN - A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate. | 07-17-2014 |
20150017321 | METHOD FOR FORMING THIN FILM PATTERN - To provide a method for forming a thin film pattern | 01-15-2015 |
20150063410 | NONDESTRUCTIVE INSPECTION APPARATUS AND INSPECTION SYSTEM OF STRUCTURE - A nondestructive inspection apparatus of a structure includes: an inspection apparatus body | 03-05-2015 |