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Koehle
Christian Koehle, Wolkersdorf Im Weinviertel AT
| Patent application number | Description | Published |
|---|---|---|
| 20120017908 | DEVICE FOR SUPPLYING GAS TO A PATIENT - The invention relates to a device for supplying gas to a patient, in particular a patient breathing spontaneously. Said device comprises a) a metering device (A) which is used to meter the gas to be inhaled by the patient (P) into the gas tank (B), b) a gas tank (B) which is used to store the gas to be inhaled by the patient (P), c) a demand valve (D) which regulates the volume flow of the gas inhaled by the patient (P), d) a reservoir (F) which is used to hold the gas exhaled by the patient (P), e) a carbon dioxide separating unit (G) which is used to separate carbon dioxide from the exhaled gas, f) a pump (H) which is used to return the exhaled gas purified of carbon dioxide into the gas tank (B), and g) an analysis/control unit (J) which analyzes the gas returned to the gas tank (B) and controls the metering device (A) according to the composition of said gas. | 01-26-2012 |
Hans-Juergen Koehle, Mainhausen DE
| Patent application number | Description | Published |
|---|---|---|
| 20090170734 | NOVEL IMIDAZOLINIUM SALTS WITH LOW MELTING POINT, PROCESSES FOR PREPARATION THEREOF AND USE THEREOF AS A LUBRICANT - The invention relates to novel imidazolinium salts, to processes for preparation thereof and to the use of the imidazolinium salts or of a mixture of imidazolinium salts with further (lubricating) substances as lubricants. | 07-02-2009 |
| 20100084597 | DEFOAMING OF IONIC LIQUIDS - The invention relates to the defoaming of ionic liquids and also to compositions comprising at least one ionic liquid and at least one antifoam and, if appropriate, a solvent and/or further auxiliaries or additives. | 04-08-2010 |
Harald Koehle, Bobenheim DE
| Patent application number | Description | Published |
|---|---|---|
| 20100173900 | Strobilurins for Increasing the Resistance of Plants to Abiotic Stress - The present invention relates to a method for increasing the resistance of a plant or of a plant's seed to abiotic stress which method comprises treating the seed from which the plant is to grow with at least one | 07-08-2010 |
| 20100204045 | Systemicity Enhancers - A copolymer obtainable by polymerization of | 08-12-2010 |
| 20110160594 | Method for Testing Substances or Substance Mixtures and the Use Thereof - The present invention relates to a method for testing a substance or a substance mixture and the use thereof for identifying and/or characterizing the mode of action of the substance or the substance mixture or for determining the biochemical and/or metabolic state of an organism or group of organisms or part(s) thereof after exposure to the substance or the substance mixture. | 06-30-2011 |
Michael Koehle, San Leandro, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100152741 | UNICOMPARTMENTAL CUSTOMIZED ARTHROPLASTY CUTTING JIGS AND METHODS OF MAKING THE SAME - Disclosed herein are unicompartmental femoral and tibial arthroplasty jigs for respectively assisting in the performance of unicompartmental femoral and tibial arthroplasty procedures on femoral and tibial arthroplasty target regions. The femoral and tibial unicompartmental arthroplasty jigs each include a first side, a second side and a mating surface. Each second side is generally opposite its respective first side. For the femoral jig, the mating surface is in the first side of the femoral jig and configured to matingly receive and contact a generally planar area of an anterior side of a femoral shaft generally proximal of the patellar facet boarder and generally distal an articularis genu. The first side of the femoral jig is configured to be oriented towards the femoral arthroplasty target region surface when the mating surface of the femoral jig matingly receives and contacts the planar area. For the tibial jig, the mating surface of the tibial jig is in the first side and configured to matingly receive and contact a generally planar area of an anterior side of a tibial shaft distal of the tibial plateau edge and generally proximal of the tibial tuberosity. The first side of the tibial jig is configured to be oriented towards the tibial arthroplasty target region surface when the mating surface of the tibial jig matingly receives and contacts the planar area. | 06-17-2010 |
Michael Koehle, Santa Rosa, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090222015 | HIP RESURFACING SURGICAL GUIDE TOOL - Disclosed herein is a tool for guiding a drill hole along a central axis of a femur head and neck for preparation of a femur head that is the subject of a hip resurfacing surgery. In one embodiment, the tool includes a mating region and a guide hole. The mating region is configured to matingly receive a predetermined surface of the femur. The mating region and guide hole are positionally correlated or referenced with each other such that when the mating region matingly receives the predetermined surface of the femur, the guide hole will be generally coaxial with a central axis extending through the femur head and the femur neck. | 09-03-2009 |
| 20090222016 | TOTAL HIP REPLACEMENT SURGICAL GUIDE TOOL - Disclosed herein is a surgical guide tool for use in total hip replacement surgery. The surgical guide tool may include a customized mating region and a resection guide. The customized mating region and the resection guide are referenced to each other such that, when the customized mating region matingly engages a surface area of a proximal femur, the resection guide will be aligned to guide a resectioning of the proximal femur along a preoperatively planned resection plane. | 09-03-2009 |
Roderick Koehle, Ottobrunn DE
| Patent application number | Description | Published |
|---|---|---|
| 20090091729 | Lithography Systems and Methods of Manufacturing Using Thereof - Lithography systems and methods of manufacturing semiconductor devices are disclosed. For example, a lithography system includes at least two reticle stages and a common projection lens system disposed between the reticle stages and a wafer stage, and at least one alignment system for aligning the reticle stages. | 04-09-2009 |
| 20090092926 | Lithography Systems and Methods of Manufacturing Using Thereof - Multi-beam lithography systems and methods of manufacturing semiconductor devices using the same are disclosed. For example, the method utilizes non-coincidence of boundaries of electrical fields emanating from chrome on glass or phase shifted mask features distributed over two masks for the optimization of lithographic process windows, side lobe suppression, or pattern orientation dependent process window optimization employing one mask with polarization rotating film on the backside. | 04-09-2009 |
| 20100266939 | Lithographic Mask and Method of Forming a Lithographic Mask - A lithographic mask comprises a first layer including grooves, a second layer including regions, sections and a groove-like structure that encloses the sections. The first and second layers are formed so as to reduce electrical potential differences within the second layer. A method of forming a lithographic mask includes forming first and second layers to dispose the second layer over the first layer, patterning the second layer to comprise sections, a region, and a groove-like structure enclosing the sections, and forming grooves in the first layer at portions not covered by the second layer. The first and second layers are formed to reduce potential differences within the second layers during the step of forming the grooves in the first layer. | 10-21-2010 |