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Kobayashi, Utsunomiya-Shi
Fumitake Kobayashi, Utsunomiya-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090040499 | EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE - This invention provides a positioning apparatus which can safely stop a movable body irrespective of its driving status. This invention relates to a positioning apparatus which positions a movable body ( | 02-12-2009 |
Masatoshi Kobayashi, Utsunomiya-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20110051123 | OPTICAL FIBER SENSOR, PRESSURE SENSOR, END EFFECTOR AND SENSOR SIGNAL PROCESSOR - An FBG (Fiber Bragg Grating) sensor is equipped with a plurality of stress detection sensors made up from optical fibers in which gratings that reflect light of a specified wavelength are arrayed, and a stress direction converter that converts stresses applied from the exterior into stresses of a direction in which the gratings are arrayed, and which transmits the stresses to each of the gratings. Consequently, the stress direction converter can transmit stresses, which are applied from a body, to a plurality of gratings. | 03-03-2011 |
Mikio Kobayashi, Utsunomiya-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090141354 | DIFFRACTIVE OPTICAL ELEMENT AND OPTICAL SYSTEM INCLUDING THE SAME - A diffractive optical element includes at least one element portion including a base, a diffraction grating, a substrate, and an intermediate layer. The base and the diffraction grating are disposed above the substrate through the intermediate layer, and are formed of a same material. An extinction coefficient for the d-line of the material of the diffraction grating and an extinction coefficient for the d-line of a material of the intermediate layer are properly set to satisfied conditional expressions. | 06-04-2009 |
| 20110122305 | DIFFRACTIVE OPTICAL ELEMENT, OPTICAL SYSTEM INCLUDING THE SAME, AND IMAGE PICKUP APPARATUS - A diffractive optical element includes multiple diffraction gratings laminated and made of at least three material types, wherein the multiple diffraction gratings include: a first combination part including two diffraction gratings of materials different from each other in which grating side surfaces of grating parts contact with each other or are disposed close to each other in a grating pitch direction; and a second combination part including two diffraction gratings of materials different from each other in which at least one material is different from the materials of the first combination part; and when N1Aw and N1Bw denote refractive indices of the first combination part at a wavelength (w), ν1A and ν1B denote Abbe numbers, N2Ad and N2Bd denote refractive indices of the second combination part on a d-line, ν2A and ν2B denote Abbe numbers, the wavelength (w) is 370| 05-26-2011 | |
Norihiko Kobayashi, Utsunomiya-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20080291414 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus includes a stage configured to hold a substrate; a projection optical system configured to project light from an original onto the substrate; a measurement device configured to measure a position of a surface of the substrate in an optical axis direction of the projection optical system; and a controller configured to i) cause the measurement device to measure positions of the surface with respect to a plurality of points on the surface over a plurality of shot areas, ii) obtain a shape of the surface based on the positions of the surface measured with respect to the plurality of points, and iii) cause the stage to be moved based on the obtained shape between an exposure of a first shot area and an exposure of a second shot area, and the measurement device to measure a position of a surface in the second shot area. | 11-27-2008 |
Takenobu Kobayashi, Utsunomiya-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090115888 | EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE - An exposure apparatus according to this invention comprises a detector configured to obliquely project detection light to a surface of a substrate and to detect a position of the surface based on the detection by the detector, and exposes the substrate to radiant energy based on the calculated position of the light. The controller is configured to correct, to obtain the calculated position of the surface, a position of the surface calculated based on the detection by the detector, in accordance with a period before the detection, during the period the detector being in a dark state in which the detection light is not incident on the detector. | 05-07-2009 |
| 20090175503 | Surface Position Measuring Method and Apparatus - A measuring apparatus for measuring a position of a surface of an object while the object is scanned in a scanning direction in an X-Y plane. A detecting unit detects the position of the surface of the object in a Z direction perpendicular to the X-Y plane, a stage scans the object relative to the detecting unit in the scanning direction, and a controller causes the stage to pre-scan the object relative to the detecting unit in two scanning directions, in the X-Y plane, opposite to each other, to detect, using the detecting unit, with respect to each of the two scanning directions, a position of the surface in the Z-direction for each of the same detection points on the surface, to determine, with respect to each of the two scanning directions, a reference surface based on the detected positions of the surface, to calculate an offset value, which is a difference between the detected position and a position of the reference surface in the Z-direction for each of the same detection points with respect to each of the two scanning directions, to calculate a correction value for correcting the calculated offset value in accordance with a corresponding one of the two scanning directions based on a difference, in the Z-direction, between positions of the determined reference surfaces obtained with respect to the two scanning directions. | 07-09-2009 |
| 20100261106 | MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD - The present invention provides a measurement apparatus which includes a scale and a sensor one of which is attached on a target object, and measures a position of the target object by reading the scale by the sensor, the apparatus including a detection unit configured to detect a shift amount of the scale from a reference position, and a calculation unit configured to correct, the position of the target object measured by reading the scale by the sensor, based on the shift amount of the scale from the reference position, which is detected by the detection unit. | 10-14-2010 |
Tomoki Kobayashi, Utsunomiya-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100136446 | STOP METHOD FOR FUEL CELL SYSTEM - A stop method for a fuel cell system that includes a fuel cell unit in which hydrogen is supplied to an anode, and air is supplied to a cathode so as to generate electrical power via an electrochemical reaction. The stop method includes the steps of stopping supply of hydrogen to the anode, and supplying air to the anode so as to discharge water remaining at the anode. | 06-03-2010 |