Patent application number | Description | Published |
20080314763 | Method and device for regenerating ion exchanger, and electrolytic processing apparatus - A method and device for regenerating an ion exchanger can regenerate an ion exchanger easily and quickly, and can minimize a load upon cleaning of the regenerated ion exchanger and disposal of waste liquid. A method for regenerating a contaminated ion exchanger includes: providing a pair of a regeneration electrode and a counter electrode, a partition disposed between the electrodes, and an ion exchanger to be regenerated disposed between the counter electrode and the partition; and applying a voltage between the regeneration electrode and the counter electrode while supplying a liquid between the partition and the regeneration electrode and also supplying a liquid between the partition and the counter electrode. | 12-25-2008 |
20090078583 | Electrochemical mechanical polishing method and electrochemical mechanical polishing apparatus - A composite electrolytic processing method makes it possible to remove a conductive film without leaving it in an electrically-insulated state on an underlying barrier film, thereby exposing the barrier film. The electrochemical mechanical polishing method includes: applying a voltage between a first electrode connected to one pole of a power source and a second electrode, connected to the other pole of the power source, for feeding electricity to a conductive film of a polishing object; filling an electrolytic liquid into a space between the first electrode and the conductive film of the polishing object; and pressing and rubbing the conductive film against a polishing surface of a polishing pad to polish the conductive film in such a manner that a barrier film underlying the conductive film becomes gradually exposed from the center toward the periphery of the polishing object. | 03-26-2009 |
20090134036 | Electrolytic Processing Method and Electrolytic Processing Apparatus - An electrolytic processing method makes it possible to preferentially process a diffusion barrier layer while suppressing processing of an interconnect metal, thereby enabling omission of CMP or a lowering of processing pressure in CMP. The electrolytic processing method comprises: bringing a surface of a substrate (W) into contact with an electrolytic solution ( | 05-28-2009 |
20090142990 | METHOD FOR POLISHING A WORKPIECE - A polishing apparatus can supply a polishing liquid uniformly and efficiently to a surface to be polished of a workpiece. The polishing apparatus includes a polishing table having a polishing surface, and a top ring for holding a semiconductor wafer and pressing the semiconductor wafer against the polishing surface. The polishing apparatus also includes a polishing liquid supply port for supplying a polishing liquid to the polishing surface, and a moving mechanism for moving the polishing liquid supply port to distribute the polishing liquid uniformly over an entire surface of the workpiece due to relative movement of the workpiece and the polishing surface. | 06-04-2009 |
20090286332 | POLISHING METHOD - A method for polishing a substrate having a metal film thereon is described. The substrate has metal interconnects formed from part of the metal film. The polishing method includes performing a first polishing process of removing the metal film, after the first polishing process, performing a second polishing process of removing the barrier film, after the second polishing process, performing a third polishing process of polishing the insulating film, during the second polishing process and the third polishing process, monitoring a polishing state of the substrate with an eddy current sensor, and terminating the third polishing process when an output signal of the eddy current sensor reaches a predetermined threshold. | 11-19-2009 |
20120164917 | POLISHING APPARATUS AND POLISHING METHOD - A polishing apparatus for polishing a substrate is provided. The polishing apparatus includes: a polishing table holding a polishing pad; a top ring configured to press the substrate against the polishing pad; first and second optical heads each configured to apply the light to the substrate and to receive reflected light from the substrate; spectroscopes each configured to measure at each wavelength an intensity of the reflected light received; and a processor configured to produce a spectrum indicating a relationship between intensity and wavelength of the reflected light. The first optical head is arranged so as to face a center of the substrate, and the second optical head is arranged so as to face a peripheral portion of the substrate. | 06-28-2012 |
20150140907 | POLISHING METHOD AND POLISHING APPARATUS - A polishing method of polishing a substrate while preventing coarse particles from being discharged onto a polishing pad is disclosed. In this polishing method, a substrate is brought into sliding contact with a polishing pad while a polishing liquid, which has passed through a filter, is supplied onto the polishing pad. The polishing method includes: passing the polishing liquid through the filter while increasing a physical quantity of the polishing liquid until the physical quantity reaches a predetermined set value, the physical quantity being one of flow rate and pressure of the polishing liquid; and polishing the substrate W on the polishing pad while supplying the polishing liquid that has passed through the filter onto the polishing pad. | 05-21-2015 |
20150332943 | POLISHING APPARATUS - A polishing apparatus for polishing a substrate is provided. The polishing apparatus includes: a polishing table holding a polishing pad; a top ring configured to press the substrate against the polishing pad; first and second optical heads each configured to apply the light to the substrate and to receive reflected light from the substrate; spectroscopes each configured to measure at each wavelength an intensity of the reflected light received; and a processor configured to produce a spectrum indicating a relationship between intensity and wavelength of the reflected light. The first optical head is arranged so as to face a center of the substrate, and the second optical head is arranged so as to face a peripheral portion of the substrate. | 11-19-2015 |
20160059376 | BUFFING APPARATUS, AND SUBSTRATE PROCESSING APPARATUS - A buffing module for buffing a substrate is provided. The buffing module comprises a buff table for supporting the substrate, the buff table being rotatable; and a buff head to which a buff pad is attached, being rotatable and movable in a direction of approaching the buff table and a direction of moving away from the buff table. The buff pad includes a first part and a second part arranged so as to surround the first part on an outer side of the first part, the first part and the second part have different characteristics from each other. | 03-03-2016 |
20160059380 | SUBSTRATE PROCESSING APPARATUS - An embodiment of the present invention provides a buff process module. The buff process module includes: a buff table on which a processing target object is mounted; a buff head that holds a buff pad for applying a predetermined process to the processing target object; a buff arm that supports and swings the buff head; a dresser for dressing the buff pad; and a cleaning mechanism that is disposed between the buff table and the dresser and is for cleaning the buff pad. | 03-03-2016 |
20160074988 | PROCESSING MODULE, PROCESSING APPARATUS, AND PROCESSING METHOD | 03-17-2016 |
20160099156 | SUBSTRATE PROCESSING APPARATUS AND PROCESSING METHOD - A polishing apparatus is provided. The polishing apparatus includes: a polishing unit configured to polish a substrate by bringing a polishing tool into contact with the substrate and moving the substrate relatively to the polishing tool; a cleaning unit; and a first transfer robot configured to transfer the substrate before polishing to the polishing unit and/or configured to transfer the substrate after polishing from the polishing unit to the cleaning unit. The cleaning unit includes: at least one cleaning module, a buff processing module configured to perform a buff process to the substrate, and a second transfer robot configured to transfer the substrate between the cleaning module and the buff processing module, the second transfer robot being different from the first robot. | 04-07-2016 |
20160101498 | BUFFING APPARATUS AND SUBSTRATE PROCESSING APPARATUS - A buffing apparatus for buffing a substrate is provided. The apparatus includes: a buff table for holding the substrate, the buff table being rotatable; a buff head to which a buff pad for buffing the substrate is attachable, the buff head being rotatable and movable in a direction approaching the buff table and a direction away from the buff table, and an internal supply line for supplying process liquid for the buffing to the substrate being formed inside the buff head; and an external nozzle provided separately through the internal supply line in order to supply the process liquid to the substrate. | 04-14-2016 |
Patent application number | Description | Published |
20090137777 | Polyepoxy compound, method for producing same, thermosetting resin composition containing same, cured product of such composition, and method for removing such cured product - The present invention provides a specific polyepoxy compound having at least two olefin oxide groups and at least one tertiary ester group per molecule, a method for producing the compound, a thermosetting resin composition containing the compound, a cured product of the composition, and a method for removing the cured product. | 05-28-2009 |
20100230291 | CURABLE AQUEOUS COMPOSITION - The present invention provides an aqueous curable composition comprising (A) a compound comprising all or some primary amino groups and/or secondary amino groups optionally neutralized with a Brønsted acid, and (B) a crosslinking agent, the crosslinking agent being a compound having an (N-alkyl-N-(2-acylacyl)amino)alkyloxycarbonylamino group represented by General Formula (I) | 09-16-2010 |
20110160330 | SILSESQUIOXANE COMPOUND HAVING A POLYMERIZABLE FUNCTIONAL GROUP - An object of the present invention is to provide a silsesquioxane compound that is capable of producing a coating film with excellent heat resistance and scratch resistance, and that has excellent compatibility with general polymerizable unsaturated compounds as well as polymerizable unsaturated compounds with high polarity. | 06-30-2011 |
20110196059 | SILSESQUIOXANE COMPOUND HAVING POLYMERIZABLE FUNCTIONAL GROUP - To provide a composition comprising a silsesquioxane compound that is capable of producing a coating film with excellent heat resistance and scratch resistance, and that has excellent compatibility with general polymerizable unsaturated compounds as well as polymerizable unsaturated compounds with high polarity. | 08-11-2011 |
20140030441 | SILSESQUIOXANE COMPOUND HAVING POLYMERIZABLE FUNCTIONAL GROUP - To provide a composition comprising a silsesquioxane compound that is capable of producing a coating film with excellent heat resistance and scratch resistance, and that has excellent compatibility with general polymerizable unsaturated compounds as well as polymerizable unsaturated compounds with high polarity. | 01-30-2014 |
20150037591 | MULTILAYER FILM-FORMING METHOD AND COATED ARTICLE - A method of forming a multilayer coating film with smoothness, distinct image, adhesion and water resistance when a plurality of uncured coating films are cured at once, and especially when cured at low temperature. The method includes the following steps 1-1 to 1-4: step 1-1: coating an article with a primer coating composition (X) and forming an uncured primer coating film on the article, step 1-2: a coating the article having the uncured primer coating film with an aqueous colored coating composition (Y | 02-05-2015 |
20150175833 | AQUEOUS COATING COMPOSITION AND COATING METHOD USING SAME - The objective of the present invention is to provide: an aqueous coating composition which has excellent adhesiveness to a plastic substrate and which is capable of forming a multilayer coating film, which has excellent finishing property and water resistance and in which mixing of the layers does not occur even when preheating is not conducted after coating and the next process of applying a finishing coat is performed thereafter; and a coating method using the composition. This aqueous coating composition is characterized by comprising an aqueous dispersion of a modified polyolefin (A), an aqueous acrylic resin (B) and a blocked polyisocyanate compound having a specific blocked isocyanate (C). | 06-25-2015 |
20150218405 | METHOD FOR FORMING MULTILAYER COATING FILM - An object of the present invention is to provide a method for forming a multilayer coating film, capable of achieving excellent curability under low-temperature, short-time conditions, and forming a multilayer coating film having excellent chipping resistance and an excellent finished appearance. This method comprises sequentially applying an aqueous first colored coating composition (X), an aqueous second colored coating composition (Y), and a clear coating composition (Z) to a substrate, and simultaneously bake-curing the resulting multilayer coating film. In this method, the aqueous first colored coating composition (X) comprises an aqueous film-forming resin (A) and a specific blocked polyisocyanate compound (B), and the clear coating composition (Z) comprises a hydroxy-containing acrylic resin (K) having a hydroxy value in a specific range, a polyisocyanate compound (L), and an organometallic catalyst (M) containing a metal compound (M1) selected from a specific range and an amidine compound (M2). | 08-06-2015 |
Patent application number | Description | Published |
20080268269 | Production method of pigment-dispersing resin - This invention provides a method for producing a pigment-dispersing resin which contains divalent group(s) represented by a general formula (I): | 10-30-2008 |
20140030528 | MULTILAYER COATING FILM-FORMING METHOD AND COATED - The invention provides a multilayer coating film-forming method that allows formation of a multilayer coating film with excellent smoothness, sharpness and water resistance, and which avoids or minimizes pinhole popping. The multilayer coating film-forming method of the invention has the following construction. A multilayer coating film-forming method comprising the following steps (1) to (4): step (1): coating an article to be coated with an aqueous first pigmented coating composition (X), step (2): coating the article to be coated, with an aqueous second pigmented coating composition (Y), step (3): coating the article to be coated, with a clear coating composition (Z), and step (4): heating an uncured first pigmented coating film, uncured second pigmented coating film and uncured clear coating film to cure them, wherein the aqueous first pigmented coating composition (X) contains a blocked polyisocyanate compound with a specific blocked isocyanate group. | 01-30-2014 |
20140031484 | BLOCK POLYISOCYANATE COMPOUND - It is an object of the invention to provide a block polyisocyanate compound with excellent storage stability. The block polyisocyanate compound of the invention has the following construction. A block polyisocyanate compound having at least one block isocyanate group selected from the group consisting of a block isocyanate group represented by formula (I), block isocyanate group represented by formula (II) and block isocyanate group represented by formula (III), and a hydrophilic group. | 01-30-2014 |
Patent application number | Description | Published |
20090167367 | Frequency Synthesizer - An object of the present invention provides a frequency synthesizer having a broad frequency entraining range which can finely set a frequency over a broad band by a novel principle. | 07-02-2009 |
20110001523 | FREQUENCY SYNTHESIZER - Provided is a frequency synthesizer capable of fine setting over a wide band and having a wide frequency pull-in range. A sine wave signal of an output frequency of a voltage controlled oscillating part is quadrature-detected, and in a PLL utilizing a vector rotating at a frequency (velocity) equal to a difference from a frequency of a frequency signal used for the detection, a frequency pull-in means integrates a first constant for increasing the output frequency as a pull-in voltage when a control voltage from the PLL to the voltage controlled oscillating part is larger than a prescribed set range, and integrates a second constant for decreasing the output frequency as the pull-in voltage when the control voltage is smaller than the set range. Then, an adding means adds the control voltage from the PLL and the pull-in voltage from the frequency pull-in means to output an addition result to the voltage controlled oscillating part. | 01-06-2011 |
20110169533 | FREQUENCY SYNTHESIZER - The provision of a technique capable of determining a state where PLL control does not operate normally instantly or in advance in a frequency synthesizer that frequency-divides, A/D converts, and quadranture-detects a frequency signal from a voltage controlled oscillating unit, and extracts a rotation vector rotating at a frequency difference between the frequency signal used for the detection and the A/D converted frequency signal, and integrates a difference between a frequency of the above rotation vector and a set frequency to set an integration result as a control voltage to the voltage controlled oscillating unit. | 07-14-2011 |
20130033332 | QUARTZ-CRYSTAL CONTROLLED OSCILLATOR - An atmosphere temperature at which a quartz-crystal oscillator and an oscillation circuit are placed is controlled in high accuracy, and an output frequency with high stability is obtained. If oscillation outputs of first and second quartz-crystal oscillators are set to f | 02-07-2013 |
20130106523 | OSCILLATOR | 05-02-2013 |
20140003166 | ELECTRONIC EQUIPMENT | 01-02-2014 |
20140085015 | OSCILLATION DEVICE - An oscillation device is provided. The oscillation device includes: a main circuit portion, a heating unit, first and second crystal units, first and second oscillator circuits, a frequency difference detector, a first addition unit, an integration circuit unit, a circuit unit configured to control an electric power to be supplied to the heating unit, a compensation value obtaining unit, and a second addition unit. The compensation value obtaining unit is configured to obtain a frequency compensation value for compensating an output frequency of the main circuit portion based on an integrated value output from the integration circuit unit, and based on a change in the clock signal due to a difference between the temperature of the atmosphere and the temperature setting value of the heating unit. The second addition unit is configured to add the frequency compensation value to a frequency setting value. | 03-27-2014 |
20140292416 | OSCILLATOR - An oscillator configured to obtain a frequency output corresponding to a frequency setting value includes: an oscillation circuit portion that receives the frequency setting value; a setting value output portion that outputs a digital value for designating the frequency setting value; an interpolation circuit portion that performs interpolation for a digital value of lower-order bits out of the digital value output from the setting value output portion; and an adder that adds an output of the interpolation circuit portion and a digital value of higher-order bits out of the digital value output from the setting value output portion, wherein a signal output from the interpolation circuit portion is sequential data having first and second values different from each other, and output counts of the first and second values are determined based on a ratio corresponding to the digital value of the lower-order bits. | 10-02-2014 |
20140297056 | TEMPERATURE CONTROLLER - A temperature controller for controlling a temperature of a heated body heated by a heater to a target temperature. The temperature controller includes a temperature detection unit, a difference computation unit, a controller, a comparison unit, an abnormal event detection unit, and a power feeding stopping unit. The abnormal event detection unit is configured to output a second signal that is an abnormal event detection signal when the first signal continues to be output for a period of time exceeding a pre-set period of time. The power feeding stopping unit is configured to stop power feeding to the heater when the second signal is output. The power feeding amount to the heater is controlled based on the manipulated variable computed by the controller. | 10-02-2014 |
20150130546 | TEMPERATURE CONTROL DEVICE AND OSCILLATOR - A temperature control device includes a temperature detector, a difference operation unit, a controller, a saturation processing circuit unit, a rewritable storage unit, and a conversion unit. The difference operation unit operates a digital value corresponding to a difference value between a detected temperature value and a target temperature. The controller calculates a manipulated variable using the digital value operated by the difference operation unit. The saturation processing circuit unit includes a digital circuit to limit an output value of the controller to a pre-set upper limit value. The rewritable storage unit stores the upper limit value read from a storage area of the rewritable storage unit and input into the saturation processing circuit unit. The conversion unit converts the output value of the saturation processing circuit unit into an analog signal to output the converted value as a control command value to the heater. | 05-14-2015 |
Patent application number | Description | Published |
20090055112 | Sensing apparatus - An object of the present invention is to provide a sensing instrument capable to detect a substance existing in a very small quantity, such as environmental pollutants, instantly with a high degree of precision. As a specific means for solving the problem, a frequency signal from a crystal oscillator is sampled using a frequency signal from a reference clock generating part, the sampling value is outputted in a digital signal, quadrature detection is conducted with the digital signal for a frequency signal corresponding to the output signal, the rotational vector rotating at a frequency corresponding to the difference between the frequency of the frequency signal and the frequency of a sinusoidal wave used for the quadrature detection is taken out, and the variation of the frequency is detected by detecting the velocity of the rotational vector based on the respective sampling values. In addition to that, the measurement range of the variation of frequency can be widened by multiplying the above-described rotational vector by the reversely rotational vector corresponding to the velocity of the rotational vector. | 02-26-2009 |
20100259425 | Digital signal processing device - There is provided a digital signal processing device capable of suppressing occurrence of an unnecessary frequency component (spurious) in performing a reduction processing of a bit number of a frequency signal made of a digital signal. A signal output section | 10-14-2010 |
20100321068 | Frequency Synthesizer - An object of the present invention provides a frequency synthesizer having a broad frequency entraining range which can finely set a frequency over a broad band by a novel principle. | 12-23-2010 |
20110074475 | Frequency synthesizer - There is provided a frequency synthesizer capable of improving phase noise. A sinusoidal signal with a frequency set by a frequency setting part is output as a digital signal from a set signal output part, and the digital signal is D/A-converted. A difference between a sinusoidal signal with a frequency corresponding to an output frequency of a voltage controlled oscillating part and a sinusoidal signal output from a D/A converting part is amplified by a differential amplifier, and an amplified signal is input via an A/D converting part to a means for extracting a phase difference between the aforesaid sinusoidal signals. A voltage corresponding to a signal being the result of integration of the phase difference is input as a control voltage to the voltage controlled oscillating part. Then, a gain of the differential amplifier is set larger than a maximum value of phase noise degradation of the A/D converting part, whereby the phase noise degradation of the A/D converting part is cancelled. | 03-31-2011 |
20120249196 | SIGNAL GENERATING DEVICE AND FREQUENCY SYNTHESIZER - A frequency synthesizer using a PLL has a simple structure and excellent spurious characteristics. A reference frequency signal inputted into a phase comparison unit is generated based on a clock when a zero cross point of a sawtooth wave composed of a digital signal is detected. However, in this case, since the digital values are skipped values, the digital value does not always become zero when its positive/negative sign is inverted. Hence, where the clock signals reading the digital value immediately before and the to digital value immediately after the zero cross time when the positive/negative sign is inverted in a region where the digital value gradually changes are P | 10-04-2012 |
20120249203 | SIGNAL GENERATOR - There is provided a signal generator outputting an analog frequency signal based on a digital value according to a set frequency, which provides excellent noise characteristics, requires no ROM table corresponding to waveform data, and has a simple configuration. A digital signal having a digital value according to a set frequency is integrated to generate a waveform in a sawtooth shape, a waveform in a triangular wave shape is generated based on the waveform, and this waveform output is differentiated and then DIA converted and integrated. A comparator using, for example, the voltage at a midpoint of the triangular wave as a threshold value is used for the integrated output, and a frequency signal of an objective frequency is obtained from the comparator. | 10-04-2012 |
20120293213 | FREQUENCY SYNTHESIZER - In forming a frequency synthesizer by using PLL using processing of digital signals, an A/D converting unit is not required. By the integration of a digital value that depends on a set frequency, a saw-tooth wave serving as a phase signal is generated. A frequency signal output from a voltage-controlled oscillator is input via a frequency divider to an edge detecting unit, which then detects a rising edge or a falling edge of the frequency signal to generate a rectangular-wave signal that depends on a frequency of the frequency signal. Then, a latched circuit latches a value of the saw-tooth wave in response to the rectangular-wave signal, and this value is integrated in a loop filter and the resultant is used as a control voltage of the voltage-controlled oscillator. | 11-22-2012 |