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Knaapen
Raymond Jacobus Knaapen, Helmond NL
| Patent application number | Description | Published |
|---|---|---|
| 20090212462 | IMPRINT LITHOGRAPHY - An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array. | 08-27-2009 |
Raymond Jacobus Wilhelmus Knaapen, Helmond NL
| Patent application number | Description | Published |
|---|---|---|
| 20080271628 | Imprint lithography - An imprint lithography apparatus includes an imprint template operably connected to an imprint actuator. The imprint actuator is actuatable to displace the template along an imprint axis to bring the template into contact with an imprintable medium. The template is connected to the actuator via a bearing configured to permit substantially unrestricted displacement of the actuator relative to the template along an axis substantially perpendicular to the imprint axis during release of the template from the imprintable medium. | 11-06-2008 |
| 20090108484 | Imprint lithography - An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure. | 04-30-2009 |
Raymond Jacobus Wilhelmus Knaapen, Eindhoven NL
| Patent application number | Description | Published |
|---|---|---|
| 20080206385 | High Force Indentation Apparatus With High Accuracy - The invention relates to an indentation apparatus ( | 08-28-2008 |
Thijs Egidius Johannes Knaapen, Eindhoven NL
| Patent application number | Description | Published |
|---|---|---|
| 20100157260 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor. | 06-24-2010 |
Thijs Egidius Johannes Knaapen, Beek En Donk NL
| Patent application number | Description | Published |
|---|---|---|
| 20080292780 | Method of inspecting a substrate and method of preparing a substrate for lithography - A method of inspecting a substrate with first and second layers thereon is disclosed. The method includes directing a beam of electromagnetic radiation at an acute angle towards an edge of the layers, detecting scattered and/or reflected electromagnetic radiation, and establishing, from results of the detecting, whether an edge of the second layer overlaps an edge of the first layer. | 11-27-2008 |