Kirch
Eckhard Kirch, Bann DE
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20100141009 | VEHICLE SEAT STRUCTURE - A vehicle seat ( | 06-10-2010 |
20150084389 | Longitudinal adjustment mechanism for a seat, mechanism for adjusting the Inclination of a seat portion, vehicle seat - An adjustment unit for a vehicle seat in a vehicle is disclosed. Said adjustment unit comprises a longitudinal adjustment mechanism for adjusting the vehicle seat along a direction of travel of the vehicle, said longitudinal adjustment mechanism comprising a first rocker that is mounted in such a way as to be rotatable about a transverse direction extending perpendicular to the direction of travel of the vehicle. | 03-26-2015 |
Jens Kirch, Burscheid DE
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20140085918 | DEVICE FOR INTERIOR LIGHTING IN A MOTOR VEHICLE - The invention relates to a device for interior lighting in a motor vehicle, wherein the device comprises a lamp, a reflection means and a power distribution means and wherein the lamp, the reflection means and the power distribution means are arranged on a common support structure. | 03-27-2014 |
Marc Kirch, Aalen DE
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20110063598 | ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY AND RELATED SYSTEM AND APPARATUS - An illumination optics for EUV microlithography guides an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1. A field facet mirror has a plurality of field facets that set defined illumination conditions in the object field. A following optics downstream of the field facet mirror transmits the illumination light into the object field. The following optics includes a pupil facet mirror with a plurality of pupil facets. The field facets are in each case individually allocated to the pupil facets so that portions of the illumination light bundle impinging upon in each case one of the field facets are guided on to the object field via the associated pupil facet. The field facet mirror not only includes a plurality of basic illumination field facets which provide a basic illumination of the object field via associated basic illumination pupil facets, but also includes a plurality of correction illumination field facets which provide for a correction of the illumination of the object field via associated correction illumination pupil facets. The result is an illumination optics which allows unwanted variations of illumination parameters, for instance an illumination intensity distribution or an illumination angle distribution, to be corrected across the object field. | 03-17-2011 |
20110141445 | ILLUMINATION OPTICAL UNIT FOR EUV MICROLITHOGRAPHY - An illumination optical unit for EUV microlithography includes a first optical element having a plurality of first reflective facet elements and a second optical element having a plurality of second reflective facet elements. Each first reflective facet element from the plurality of the first reflective facet elements has a respective maximum number of different positions which defines a set—associated with the first facet element—consisting of second reflective facet elements in that the set consists of all second facet elements onto which the first facet element directs radiation in its different positions during the operation of the illumination optical unit. The plurality of second reflective facet element forms a plurality of disjoint groups, wherein each of the groups and each of the sets contain at least two second facet elements, and there are no two second facet elements of a set which belong to the same group. This construction makes it possible to provide an illumination optical unit which can be used to provide a large number of different angle-dependent intensity distributions at the location of the object field. | 06-16-2011 |
Marc Kirch, Wedel DE
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20120293785 | OPTICAL ELEMENT HAVING A PLURALITY OF REFLECTIVE FACET ELEMENTS - An optical element for use in an illumination optical unit of an EUV microlithography projection exposure apparatus includes a plurality of reflective facet elements. Each reflective facet element has at least one reflective surface. In this case, at least one facet element is arranged in a manner rotatable about a rotation axis. The rotation axis intersects the at least one reflective surface of the facet element. With such an optical element, it is possible to alter the direction and/or the intensity of at least part of the illumination radiation within the illumination optical unit in a simple manner. | 11-22-2012 |
Michael Kirch, Sondershausen DE
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20150061818 | TEMPERATURE-DEPENDENT SWITCH COMPRISING A SNAP-ACTION DISC CLAMPED IN AT THE RIM - A temperature-dependent switch arranged with a housing has a temperature-dependent switching mechanism comprising a snap-action disc, on which at least one outer contact region and at least one inner contact region are provided. A movable contact part held on the inner contact region interacts with a first contact surface connected to a first external connection on an upper part of the housing. The at least one outer contact region is connected at least in sections permanently to a second contact surface connected to a second external connection on a lower part of the housing. The snap-action disc lifts off the movable contact part from the first contact surface depending on the temperature of the switching mechanism. The snap-action disc has at least one compensation section between the at least one outer contact region and the at least one inner contact region. | 03-05-2015 |
Oliver Kirch, Erlangen DE
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20090206266 | RADIATION TRANSDUCER AND METHOD TO PRODUCE A RADIATION TRANSDUCER - A radiation transducer has a luminophore layer applied on a substrate, and at least one anti-discoloration substance is applied on the luminophore layer. In a method to produce a radiation transducer a luminophore layer is applied on a substrate, and at least one anti-discoloration substance is applied on the luminophore layer after the application of the luminophore layer on the substrate. | 08-20-2009 |