Patent application number | Description | Published |
20090055124 | Method and System for Determining Object Height - An apparatus and method for measuring a height of an object above a surface includes a housing with a first portion having an upper surface and a lower surface and an extension portion extending a first distance from the lower surface of the first portion. The extension portion defines a cavity opposing the lower surface of the first portion. The apparatus further includes one or more actuators passing through the lower surface of the first portion of the housing and extending into the cavity. Additionally, the apparatus includes a plate supported by one or more flexible members coupled to the extension portion. The plate has a top surface and a bottom surface that lies in a plane substantially parallel to the surface. Moreover, the apparatus includes a plurality of sensors disposed at predetermined positions of the plate. Each of the plurality of sensors is responsive to a height measured between each of the plurality of sensors and the surface. | 02-26-2009 |
20090109595 | METHOD AND SYSTEM FOR PERFORMING ELECTROSTATIC CHUCK CLAMPING IN TRACK LITHOGRAPHY TOOLS - A method of clamping/declamping a semiconductor wafer on an electrostatic chuck in ambient air includes disposing the semiconductor wafer at a predetermined distance above a dielectric surface of the electrostatic chuck having one or more electrodes and applying a first voltage greater than a predetermined threshold to the one or more electrodes of the electrostatic chuck for a first time period. The method includes reducing the first voltage to a second voltage substantially equal to a self bias potential of the semiconductor wafer after the first time period. The method includes maintaining the second voltage for a second time period and adjusting the second voltage to a third voltage characterized by a polarity opposite to that of the first voltage and a magnitude smaller than the predetermined threshold. The method includes reducing the third voltage to a fourth voltage substantially equal to the second voltage after a third time period. | 04-30-2009 |
20100071752 | Solar Cell Module Having Buss Adhered With Conductive Adhesive - Solar cell modules and methods for making solar cell modules are disclosed. In one or more embodiments of the invention, a buss is adhered to the solar cell modules using a plurality of conductive adhesive drops. | 03-25-2010 |
20110140726 | Apparatus and Methods for Measuring Solar Cell Module Performance - Methods and apparatus for moving and evaluating the performance of solar cell modules are described. Specifically, embodiments of the invention are directed to apparatus and methods including a transparent plate having a plurality of fluid conduits therethrough, where the fluid conduits are configured to direct a fluid with sufficient force to elevate/support a solar cell module during measurement of the solar cell performance. | 06-16-2011 |
20140256161 | PROCESS SHEET RESISTANCE UNIFORMITY IMPROVEMENT USING MULTIPLE MELT LASER EXPOSURES - Embodiments described herein relate to apparatus and methods of thermal processing. More specifically, apparatus and methods described herein relate to laser thermal treatment of semiconductor substrates by increasing the uniformity of energy distribution in an image at a surface of a substrate. | 09-11-2014 |
20150041453 | VISUAL FEEDBACK FOR PROCESS CONTROL IN RTP CHAMBERS - Embodiments of the present disclosure generally relate to methods and apparatus for visual lamp failure detection in a processing chamber, such as an RTP chamber. Visual feedback is facilitated through the use of a wide-angle lens positioned to view lamps within the process chamber. The wide-angle lens is positioned within a probe and secured using a spring in order to withstand high temperature processing. A camera coupled to the lens is adapted to capture an image of the lamps within the process chamber. The captured image of the lamps is then compared to a reference image to determine if the lamps are functioning as desired. | 02-12-2015 |
20150131698 | LOW TEMPERATURE RTP CONTROL USING IR CAMERA - Embodiments of the present invention generally relate to methods and apparatus for monitoring substrate temperature uniformity in a processing chamber, such as an RTP chamber. Substrate temperature is monitored using an infrared camera coupled to a probe having a wide-angle lens. The wide-angle lens is positioned within the probe and secured using a spring, and is capable of withstanding high temperature processing. The wide angle lens facilities viewing of substantially the entire surface of the substrate in a single image. The image of the substrate can be compared to a reference image to facilitate lamp adjustments, if necessary, to effect uniform heating of the substrate. | 05-14-2015 |