Patent application number | Description | Published |
20140027918 | CROSS-COUPLING BASED DESIGN USING DIFFUSION CONTACT STRUCTURES - An approach for providing cross-coupling-based designs using diffusion contact structures is disclosed. Embodiments include providing first and second gate structures over a substrate; providing a first gate cut region across the first gate structure, and a second gate cut region across the second gate structure; providing a first gate contact over the first gate structure, and a second gate contact over the second gate structure; and providing a diffusion contact structure between the first and second gate cut regions to couple the first gate contact to the second gate contact. | 01-30-2014 |
20140077380 | BIT CELL WITH DOUBLE PATTERNED METAL LAYER STRUCTURES - An approach for providing SRAM bit cells with double patterned metal layer structures is disclosed. Embodiments include: providing, via a first patterning process, a word line structure, a ground line structure, a power line structure, or a combination thereof; and providing, via a second patterning process, a bit line structure proximate the word line structure, the ground line structure, the power line structure, or a combination thereof. Embodiments include: providing a first landing pad as the word line structure, and a second landing pad as the ground line structure; and providing the first landing pad to have a first tip edge and a first side edge, and the second landing pad to have a second tip edge and a second side edge, wherein the first side edge faces the second side edge. | 03-20-2014 |
20140077384 | BIT CELL WITH TRIPLE PATTERNED METAL LAYER STRUCTURES - An approach for providing bit cells with triple patterned metal layer structures is disclosed. Embodiments include: providing, via a first patterning process of a metal layer, a first structure that is a first one of a word line structure, a ground line structure, a power line structure, and a bit line structure; providing, via a second patterning process of the metal layer, a second structure that is different from the first structure and that is a second one of the word line structure, the ground line structure, the power line structure, and the bit line structure; and providing, via a third patterning process of the metal layer, a third structure that is different from the first structure and the second structure, and that is a third one of the word line structure, the ground line structure line, the power line structure, and the bit line structure. | 03-20-2014 |
20140273474 | INTERCONNECTION DESIGNS USING SIDEWALL IMAGE TRANSFER (SIT) - Methodology enabling a generation of an interconnection design utilizing an SIT process is disclosed. Embodiments include: providing a hardmask on a substrate; forming a mandrel layer on the hardmask including: first and second vertical portions extending along a vertical direction and separated by a horizontal distance; and a plurality of horizontal portions extending in a horizontal direction, wherein each of the horizontal portions is positioned between the first and second vertical portions and at a different position along the vertical direction; and forming a spacer layer on outer edges of the mandrel layer. | 09-18-2014 |
20140327146 | METHODS FOR IMPROVING DOUBLE PATTERNING ROUTE EFFICIENCY - A design methodology for routing for an integrated circuit is disclosed. The method includes placement of cells having double diffusion breaks, which create an extended intercell region. Metal layer prohibit zones are defined to prohibit any M1 structures in the prohibit zones. Metal layer allow zones are placed adjacent to outer metal lines, and jogs are formed in the metal layer allow zones. Vias and viabars may then be applied on the jogs. | 11-06-2014 |
20140332967 | BIT CELL WITH DOUBLE PATTERENED METAL LAYER STRUCTURES - An approach for providing SRAM bit cells with double patterned metal layer structures is disclosed. Embodiments include: providing, via a first patterning process, a word line structure, a ground line structure, a power line structure, or a combination thereof; and providing, via a second patterning process, a bit line structure proximate the word line structure, the ground line structure, the power line structure, or a combination thereof Embodiments include: providing a first landing pad as the word line structure, and a second landing pad as the ground line structure; and providing the first landing pad to have a first tip edge and a first side edge, and the second landing pad to have a second tip edge and a second side edge, wherein the first side edge faces the second side edge. | 11-13-2014 |
20140339610 | FINFET DEVICE AND METHOD OF FABRICATION - Embodiments of the present invention provide a novel method and structure for forming finFET structures that comprise standard cells. An H-shaped cut mask is used to reduce the number of fins that need to be removed, hence increasing the fin efficiency. | 11-20-2014 |
20140339647 | DENSELY PACKED STANDARD CELLS FOR INTEGRATED CIRCUIT PRODUCTS, AND METHODS OF MAKING SAME - One method disclosed herein includes forming first and second transistor devices in and above adjacent active regions that are separated by an isolation region, wherein the transistors comprise a source/drain region and a shared gate structure, forming a continuous conductive line that spans across the isolation region and contacts the source/drain regions of the transistors and etching the continuous conductive line to form separated first and second unitary conductive source/drain contact structures that contact the source/drain regions of the first and second transistors, respectively. A device disclosed herein includes a gate structure, source/drain regions, first and second unitary conductive source/drain contact structures, each of which contacts one of the source/drain regions, and first and second conductive vias that contact the first and second unitary conductive source/drain contact structures, respectively | 11-20-2014 |
20140353842 | WIDE PIN FOR IMPROVED CIRCUIT ROUTING - Embodiments described herein provide approaches for improved circuit routing using a wide-edge pin. Specifically, provided is an integrated circuit (IC) device comprising a standard cell having a first metal layer (M1) pin coupled to a second metal layer (M2) wire at a via. The M1 pin has a width greater than a width of the via sufficient to satisfy an enclosure rule for the via, while the M1 pin extends vertically past the via a distance substantially equal to or greater than zero. This layout increases the number of available pin access points within the standard cell and thus improves routing efficiency and chip size. | 12-04-2014 |
20150311122 | FORMING GATE TIE BETWEEN ABUTTING CELLS AND RESULTING DEVICE - Methods for forming abutting FinFET cells with a single dummy gate and continuous fins, and the resulting devices, are disclosed. Embodiments may include forming one or more continuous fins on a substrate, forming gates perpendicular to and over the one or more continuous fins to form a first FinFET cell and a second FinFET cell, and forming source and drain contact lines parallel to and between the gates, wherein a source contact line of the first FinFET cell is adjacent to a drain contact line of the second FinFET cell, and the source contact line and the drain contact line are on opposite sides of a gate. | 10-29-2015 |
20150331988 | WIDE PIN FOR IMPROVED CIRCUIT ROUTING - Embodiments described herein provide approaches for improved circuit routing using a wide-edge pin. Specifically, provided is an integrated circuit (IC) device comprising a standard cell having a first metal layer (M1) pin coupled to a second metal layer (M2) wire at a via. The M1 pin has a width greater than a width of the via sufficient to satisfy an enclosure rule for the via, while the M1 pin extends vertically past the via a distance substantially equal to or greater than zero. This layout increases the number of available pin access points within the standard cell and thus improves routing efficiency and chip size. | 11-19-2015 |
Patent application number | Description | Published |
20080232503 | VARIABLE CODEBOOK FOR MIMO SYSTEM - A MIMO wireless communication system employing a variable size preceding codebook is provided. The size of the codebook may be determined by the quality of the wireless transmission channel between a transmitter and a receiver associated with the MIMO wireless communication systems or some other codebook selection criteria. A larger codebook can be employed when the channel quality is high, allowing for significant gains in overall system throughput. In contrast, a smaller codebook can be employed when the cannel quality is poor, so that the added channel overhead associated with a larger code book does not reduce the channel efficiency under circumstances in which a larger codebook would not significantly improve system throughput. | 09-25-2008 |
20120250751 | Variable Size Codebook for MIMO System - In a method of selecting a codebook for precoding a wireless transmission signal, a characteristic of a wireless communication channel is measured, and a codebook size is selected using (i) an expected throughput for each of a plurality of different codebook sizes given the measured characteristic of the wireless communication channel, and (ii) channel overhead associated with each of the plurality of different codebook sizes. Based on matrix selection criteria, a best matrix is selected from a codebook of the selected codebook size, and an indicator of the selected matrix is transmitted. | 10-04-2012 |
20140321569 | VARIABLE SIZE CODEBOOK FOR MIMO SYSTEM - In a method of selecting a codebook for precoding a wireless transmission signal, a characteristic of a wireless communication channel is measured, and a codebook size is selected using (i) an expected throughput for each of a plurality of different codebook sizes given the measured characteristic of the wireless communication channel, and (ii) channel overhead associated with each of the plurality of different codebook sizes. Based on matrix selection criteria, a best matrix is selected from a codebook of the selected codebook size, and an indicator of the selected matrix is transmitted. | 10-30-2014 |
Patent application number | Description | Published |
20090232732 | PRO108 Antibody Compositions and Methods of Use and Use of PRO108 to Assess Cancer Risk - This invention relates to a method for assessing risk of prostate cancer. Specifically, it relates to utilizing both Pro108 and Prostate Specific Antigen (PSA) in combination to determine the risk of prostate cancer. In addition, it is directed to a method for assessing risk of ovarian, colon, breast or stomach cancer utilizing Pro108 or specific antibodies to Pro108. The invention provides isolated anti-prostate, ovarian, colon, breast or stomach cancer antigen (Pro108) antibodies that bind to Pro108 on a mammalian cell in vivo. The invention also encompasses compositions comprising an anti-Pro108 antibody and a carrier. These compositions can be provided in an article of manufacture or a kit. Another aspect of the invention is an isolated nucleic acid encoding an anti-Pro108 antibody, as well as an expression vector comprising the isolated nucleic acid. Also provided are cells that produce the anti-Pro108 antibodies. The invention encompasses a method of producing the anti-Pro108 antibodies. Other aspects of the invention are a method of killing an Pro108-expressing cancer cell, comprising contacting Pro108 present in the ECM with an anti-Pro108 antibody and a method of alleviating or treating an Pro108-expressing cancer in a mammal, comprising administering a therapeutically effective amount of the anti-Pro108 antibody to the mammal. | 09-17-2009 |
20090269345 | CLN248 Antibody Compositions and Methods of Use - Isolated anti-Cln248 antibodies that bind to Cln248 and cells that produce the anti-Cln248 antibodies are provided. Also provided are compositions of an anti-Cln248 antibody and a carrier. In addition, isolated nucleic acids encoding an anti-Cln248 antibody, as well as an expression vector for the isolated nucleic acids are provided. Methods for identifying anti-Cln248 antibodies, methods for producing the anti-Cln248 antibodies, as well as methods for their use in killing a Cln248-expressing cancer cells and alleviating or treating a Cln248-expressing cancer in a mammal are also provided. | 10-29-2009 |
20100003705 | Cln101 Antibody Compositions and Methods of Use Alone and in Combination with Prostate Specific Antigen and Other Cancer Markers - This invention relates to a method for assessing risk of prostate and/or ovarian cancer. Specifically, in one embodiment it relates to utilizing both Cln101 and Prostate Specific Antigen (PSA) in combination to determine the risk of prostate cancer. In an alternative embodiment, the invention is relates to utilizing Cln101 alone or in combination with CA125 to determine the risk of ovarian cancer. The invention further provides isolated anti-prostate or ovarian cancer antigen (Cln101) antibodies that bind to Cln101 in vivo. The invention also encompasses compositions comprising an anti-Cln101 antibody and a carrier. These compositions can be provided in an article of manufacture or a kit. Another aspect of the invention is an isolated nucleic acid encoding an anti-Cln101 antibody, as well as an expression vector comprising the isolated nucleic acid. Also provided are cells that produce the anti-Cln101 antibodies. The invention encompasses a method of producing the anti-Cln101 antibodies. Other aspects of the invention are a method of killing an Cln101-expressing cancer cell, comprising contacting the cancer cell with an anti-Cln101 antibody and a method of alleviating or treating an Cln101-expressing cancer in a mammal, comprising administering a therapeutically effective amount of the anti-Cln101 antibody to the mammal. | 01-07-2010 |
20120329079 | Pro108 Antibody Compositions and Methods of Use and Use of Pro108 to Assess Cancer Risk - A method for assessing risk of prostate cancer utilizing both Pro108 and Prostate Specific Antigen (PSA) in combination is provided. Also provided is a method for assessing risk of cancer utilizing Pro108 or specific antibodies to Pro108. Antibodies that bind to Pro108 on a mammalian cell in vivo and compositions comprising an anti-Pro108 antibody and a carrier which can be provided in an article of manufacture or a kit are also provided. An isolated nucleic acid encoding an anti-Pro108 antibody, an expression vector comprising the isolated nucleic acid, cells that produce the anti-Pro108 antibodies and a method of producing the anti-Pro108 antibodies as well as methods for use of the antibodies in killing an Pro108-expressing cancer cell and alleviating or treating an Pro108-expressing cancer in a mammal are also provided. | 12-27-2012 |
Patent application number | Description | Published |
20150275361 | CONDITIONED SEMICONDUCTOR SYSTEM PARTS - A method for conditioning a semiconductor chamber component may include passivating the chamber component with an oxidizer. The method may also include performing a number of chamber process operation cycles in a semiconductor processing chamber housing the chamber component until the process is stabilized. The number of chamber operation cycles to stabilize the process may be less than 10% of the amount otherwise used with conventional techniques. | 10-01-2015 |
20150275375 | GENERATION OF COMPACT ALUMINA PASSIVATION LAYERS ON ALUMINUM PLASMA EQUIPMENT COMPONENTS - A process for generating a compact alumina passivation layer on an aluminum component includes rinsing the component in deionized water for at least one minute, drying it for at least one minute, and exposing it to concentrated nitric acid, at a temperature below 10° C., for one to 30 minutes. The process also includes rinsing the component in deionized water for at least one minute, drying it for at least one minute, and exposing it to NH | 10-01-2015 |
20150311043 | CHAMBER COMPONENT WITH FLUORINATED THIN FILM COATING - A chamber component comprises a body and a fluorinated thin film protective layer over at least one surface of the body. The fluorinated thin film protective layer does not react with process gasses having Fluorine based chemistry. The fluorinated thin film protective layer may be a YF | 10-29-2015 |
20150343554 | Plasma Cutting System with Efficient Components - A plasma cutting system is provided. The system includes a power source configured to generate a plasma arc, and a plasma arc torch connected to the power source for delivering the plasma arc to a workpiece. The plasma arc torch defines a multi-function fluid flow path for sustaining the plasma arc and cooling the plasma arc torch such that the plasma cutting system has a power-to-gas flow ratio of at least 2 kilowatts per cubic feet per minute (KW/cfm). The power-to-gas flow ratio comprises a ratio of power of the generated plasma arc to a total gas flow supplied to the plasma arc torch. | 12-03-2015 |
20150351214 | Cooling Plasma Cutting System Consumables and Related Systems and Methods - In some aspects, electrodes can include a front portion shaped to matingly engage a nozzle of the plasma cutting system, the front portion having a first end comprising a plasma arc emitter disposed therein; and a rear portion thermally connected to a second end of the front portion, the rear portion shaped to slidingly engage with a complementary swirl ring of the plasma cutting system and including: an annular mating feature extending radially from a proximal end of the rear portion of the electrode to define a first annular width to interface with the swirl ring, the annular mating feature comprising a sealing member configured to form a dynamic seal with the swirl ring to inhibit a flow of a gas from a forward side of the annular mating feature to a rearward side of the annular mating feature. | 12-03-2015 |
20160042924 | PLASMA GENERATION CHAMBER WITH SMOOTH PLASMA RESISTANT COATING - A faceplate or a selectivity modulation device (SMD) for a plasma generation chamber has a plasma resistant ceramic coating on a surface of the faceplate or SMD, wherein the plasma resistant ceramic coating comprises a thickness of less than approximately 30 microns, a porosity of less than 1% and a thickness non-uniformity of less than 4%. | 02-11-2016 |
Patent application number | Description | Published |
20130250785 | Adaptive Partial Packet Decoding - A user device receives packets from a base station. The user device may invoke decoding while the packet is still being received, based on the incomplete contents of a given packet. This “partial packet decoding” relies on the fact that the underlying information in the packet is encoded with redundancy (code rate less than one). If link quality is poor, the partial packet decoding is likely to be unsuccessful, i.e., to fail in its attempt to recover the underlying information. To avoid waste of power, the user device may be configured to apply one or more tests of link quality prior to invoking the partial packet decoding on a current packet. | 09-26-2013 |
20130272212 | METHOD FOR IMPLEMENTING AUTONOMOUS MANAGEMENT OF RADIO RESOURCES ACROSS DUAL NETWORKS - Managing radio resources across dual networks includes a wireless mobile device connecting to a first wireless network using a first radio access technology. The wireless device may notify the first network of a capability to be temporarily non-responsive to the first network while maintaining a signaling connection to the first network. The wireless device may communicate with a second network. The wireless device may return to communicating with the first network subsequent to communicating with the second network, and in response to communicating with the second network for less than a predetermined amount of time, the wireless device may send a scheduling request to the first network. In response to receiving a grant acknowledgement from the first network, the wireless device may send a buffer status report that includes a value such as zero to indicate that the wireless device has returned to and can communicate with the first network. | 10-17-2013 |
20140003260 | Modulation and Coding Scheme (MCS) Recovery based on CQI Offset | 01-02-2014 |
20140112172 | Load Estimation in 3GPP Networks - Loading estimation of 3GPP networks. One or more metrics relating to a cell of a 3GPP network may be measured. Loading of the cell may be estimated based on the one or more metrics. The metrics may include metrics measured, estimated, or derived at multiple layers, possibly including one or more of physical layer, radio link control layer, radio resource control layer, or application layer metrics. | 04-24-2014 |
20140369226 | Adaptive Partial Packet Decoding - A user device receives packets from a base station. The user device may invoke decoding while the packet is still being received, based on the incomplete contents of a given packet. This “partial packet decoding” relies on the fact that the underlying information in the packet is encoded with redundancy (code rate less than one). If link quality is poor, the partial packet decoding is likely to be unsuccessful, i.e., to fail in its attempt to recover the underlying information. To avoid waste of power, the user device may be configured to apply one or more tests of link quality prior to invoking the partial packet decoding on a current packet. | 12-18-2014 |
20150098342 | Modulation and Coding Scheme (MCS) Recovery based on CQI Offset - Manipulating modulation and coding scheme (MCS) allocation after a communication interruption. A UE device may resume communications with a BS after a communication interruption. Channel quality information may be generated and transmitted to the BS. The channel quality information may be based on channel quality measurements, and may also be based on an offset configured manipulate an MCS allocation by the BS based on determining that the interruption to communication between the UE and the BS has occurred. | 04-09-2015 |
20160007226 | Wireless Network Load and Throughput Estimation - This disclosure relates to determining load and estimating throughput of wireless networks by a wireless device. According to some embodiments, the numbers of active downlink and uplink nodes in a wireless network may be determined. Channel utilization of the wireless network may also be determined. An uplink data rate and a downlink data rate of the wireless device in the wireless network may be estimated. Based on the numbers of active downlink and uplink nodes, channel utilization, and the uplink data rate and a downlink data rate of the wireless device, the maximum possible uplink throughput and downlink throughput of the wireless device in the wireless network may be estimated. Such throughput estimates may be used to select a wireless network to join from among multiple available wireless networks. | 01-07-2016 |
20160007359 | Wireless Network Throughput Estimation - This disclosure relates to estimating throughput of wireless networks by a wireless device. According to some embodiments, estimated uplink and downlink actual temporal load available to a wireless device in a wireless network may be determined. An uplink data rate and a downlink data rate of the wireless device in the wireless network may be estimated. Based on the estimated uplink and downlink actual temporal load available to the wireless device and the estimated uplink and downlink data rates of the wireless device, the maximum possible uplink throughput and downlink throughput of the wireless device in the wireless network may be estimated. Such throughput estimates may be used to select a wireless network to join from among multiple available wireless networks or to select an initial data rate for an application executing on the wireless device, among possible uses. | 01-07-2016 |
20160100304 | Peer to Peer Mobile User Equipment Communication with On-Demand Discovery Signal Transmission - In some embodiments, a user equipment device (UE) implements a method for discovering the presence of neighboring UEs using an on-demand discovery signal transmission technique. This discovery process may be performed to enable the UEs to perform peer-to-peer communications with each other, wherein peer-to-peer communications is defined as direct communication between the UEs without involving a base station. The UE may be configured to transmit a discovery request signal when it has moved greater than a threshold amount since transmission of a prior discovery request signal. The discovery request signal causes one or more neighboring UEs to each transmit a discovery signal in response, and also causes the UE which generated the discovery request signal to transmit its own discovery signal. The received discovery signal from each of the neighboring UEs is useable to discover, or detect the presence of, these neighboring UEs. | 04-07-2016 |
Patent application number | Description | Published |
20110155986 | DUAL RESISTANCE HEATER FOR PHASE CHANGE DEVICES AND MANUFACTURING METHOD THEREOF - A dual resistance heater for a phase change material region is formed by depositing a resistive material. The heater material is then exposed to an implantation or plasma which increases the resistance of the surface of the heater material relative to the remainder of the heater material. As a result, the portion of the heater material approximate to the phase change material region is a highly effective heater because of its high resistance, but the bulk of the heater material is not as resistive and, thus, does not increase the voltage drop and the current usage of the device. | 06-30-2011 |
20140038379 | DUAL RESISTANCE HEATER FOR PHASE CHANGE DEVICES AND MANUFACTURING METHOD THEREOF - A dual resistance heater for a phase change material region is formed by depositing a resistive material. The heater material is then exposed to an implantation or plasma which increases the resistance of the surface of the heater material relative to the remainder of the heater material. As a result, the portion of the heater material approximate to the phase change material region is a highly effective heater because of its high resistance, but the bulk of the heater material is not as resistive and, thus, does not increase the voltage drop and the current usage of the device. | 02-06-2014 |
20140104939 | Phase Change Memory With Threshold Switch Select Device - An ovonic threshold switch may be formed of a continuous chalcogenide layer. That layer spans multiple cells, forming a phase change memory. In other words, the ovonic threshold switch may be formed of a chalcogenide layer which extends, uninterrupted, over numerous cells of a phase change memory. | 04-17-2014 |
20150188050 | DUAL RESISTANCE HEATER FOR PHASE CHANGE DEVICES AND MANUFACTURING METHOD THEREOF - A dual resistance heater for a phase change material region is formed by depositing a resistive material. The heater material is then exposed to an implantation or plasma which increases the resistance of the surface of the heater material relative to the remainder of the heater material. As a result, the portion of the heater material approximate to the phase change material region is a highly effective heater because of its high resistance, but the bulk of the heater material is not as resistive and, thus, does not increase the voltage drop and the current usage of the device. | 07-02-2015 |