Patent application number | Description | Published |
20100112479 | Photopolymerization initiator containing unsaturated double bond and oxime ester group and photosensitive resin composition comprising the same - A photopolymerization initiator is provided. The photopolymerization initiator contains at least one unsaturated double bond and at least one oxime ester group in the molecule. The photopolymerization initiator comprises a compound represented by Formula 1 or 2: | 05-06-2010 |
20100160477 | Composition for simultaneously forming two isolated column spacer patterns - A composition for forming column spacers is provided. The composition comprises a radical polymerization inhibitor. The use of the composition enables simultaneous formation of a saturated pattern and a semi-transmissive pattern as column spacer patterns having different shapes, whose difference in thickness is controllable as desired although the sensitivity is slightly reduced, through a slit or semi-transmissive mask by varying the kind and amount of the radical polymerization inhibitor. Further provided are column spacers formed using composition and a liquid crystal display using the column spacers. | 06-24-2010 |
20100245732 | COLOR FILTER SUBSTRATE - A color filter substrate is provided. In the color filter substrate, transparent protective films are formed on respective sub-pixels of a color filter. The color filter substrate has improved electric field characteristics without the need for additional optical or circuit compensation to achieve an improvement in contrast and a reduction in color difference. | 09-30-2010 |
20100261815 | PHOTOACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME - A novel photoactive compound is provided. The photoactive compound has a structure represented by Formula 1: | 10-14-2010 |
20110269867 | ALKALI-SOLUBLE POLYMER COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME - A novel alkali-soluble polymer compound including a dehydrogenated pimaric acid and/or its isomer as a repeating unit, and a photosensitive resin composition including the alkali-soluble polymer compound as an effective binder matrix are provided. A photosensitive resin composition using the alkali-soluble polymer compound including a dehydrogenated resin acid has excellent photosensitivity and developing characteristics cause a less deformation in a firing process, has excellent elasticity. Thus, the photosensitive resin composition is advantageous for curing various transparent photosensitive materials, in particular, materials of column spacers, an overcoat, a passivation layer, or the like, used for fabricating color filters of an LCD. | 11-03-2011 |
20110287366 | PHOTORESIST COMPOSITION COMPRISING PHOTOINITIATORS, AND TRANSPARENT THIN FILM AND LIQUID CRYSTAL DISPLAY DEVICE USING THE COMPOSITION - A photoresist composition is provided. The photoresist composition comprises two or more kinds of photoinitiators having different activation wavelengths whose difference is at least 20 nm. The photoresist composition has high sensitivity and forms a pattern whose thickness is easy to control depending on the exposure intensity through a slit or transflective mask. Further provided are a transparent thin film formed using the photoresist composition and a liquid crystal display device comprising the thin film. | 11-24-2011 |
20110318692 | PHOTOACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE SAME - The present invention relates to a photoactive compound of a novel structure represented by Chemical Formula 1 below | 12-29-2011 |
20120156619 | ACRYLATE-BASED COMPOUNDS AND PHOTOSENSITIVE COMPOSITION COMPRISING THE SAME - The present invention relates to an acrylate-based compound that includes an organic acid having two or more acrylate groups and one or more phenolic acid structures in one molecule, and a photosensitive composition including the same. It is possible to shorten a developing time in a photolithography process without damaging photosensitivity by using the photosensitive composition according to the present invention. | 06-21-2012 |
20130029271 | PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENESITIVE COMPOSITION - Disclosed are a photosensitive composition and a compound used in the same. If the composition provided through the present application is used, it is possible to form a thin film having improved adhesion strength of a pattern. | 01-31-2013 |
20130244182 | PHOTOSENSITIVE COMPOSITION COMPRISING AN ACRYLATE COMPOUND - The present invention relates to a photosensitive composition including an acrylate-based compound having an adamantyl structure. It is possible to manufacture an organic thin film that is easily stripped without decreasing the strength of the thin film by using the photosensitive composition. | 09-19-2013 |
20140065543 | NEW COMPOUND, PHOTOSENSITIVE COMPOSITION COMPRISING THE SAME AND PHOTOSENSITIVE MATERIAL - The present application relates to a novel compound, a photosensitive composition comprising the same and a photosensitive material. | 03-06-2014 |
20140080043 | SILOXANE-BASED COMPOUND, PHOTOSENSITIVE COMPOSITION COMPRISING THE SAME AND PHOTOSENSITIVE MATERIAL - The present application relates to a siloxane-based compound, a photosensitive composition including the same, and a photosensitive material. | 03-20-2014 |