Patent application number | Description | Published |
20080265159 | Sample surface inspection apparatus and method - The present invention provides a surface inspection method and apparatus for inspecting a surface of a sample, in which a resistive film is coated on the surface, and a beam is irradiated to the surface having the resistive film coated thereon, to thereby conduct inspection of the surface of the sample. In the surface inspection method of the present invention, a resistive film having an arbitrarily determined thickness t | 10-30-2008 |
20080308729 | Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former - A substrate inspection apparatus | 12-18-2008 |
20090032708 | Inspection system by charged particle beam and method of manufacturing devices using the system - An inspection apparatus by an electron beam comprises: an electron-optical device | 02-05-2009 |
20090039262 | ELECTRON BEAM APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE APPARATUS - The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals. | 02-12-2009 |
20090050822 | Electron beam apparatus and method of manufacturing semiconductor device using the apparatus - The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a detecting system, and a secondary electro-optical system for directing secondary electron beams emitted from the sample surface by the irradiation of the primary electron beam to the detecting system. | 02-26-2009 |
20100322633 | TRANSMISSION SYSTEM AND METHOD OF CORRECTING TILT OF THE TRANSMISSION SYSTEM - A transmission system is provided with a transmission apparatus that outputs an ASE light from a transmission light amplifier and with a reception apparatus provided with: a tilt detection unit that detects the optical strength levels of at least two probe lights having different wavelengths from a received ASE light; and a reception light amplifier that performs a first-order tilt correction on light to be output in a linear manner so as to reduce the difference in the optical strength level of the two probe lights detected by the tilt detection unit. | 12-23-2010 |
20110008049 | TRANSMISSION APPARATUS, TRANSMISSION CONTROLLING METHOD, AND OPTICAL SUPERVISORY CHANNEL (OSC) PROCESSING APPARATUS - An integrated transmission apparatus includes a plurality of optical supervisory channel (OSC) processing units for processing OSC signals contained in a wavelength division multiplexing (WDM) signal received from a WDM network and a switching unit for performing the path control of synchronous digital hierarchy (SDH) frames. An OSC processing unit transmits the SDH frame, containing wavelength information indicated by, to the switching unit. Another OSC processing unit acquires the SDH frame, containing wavelength information, from the switching unit and sets an OSC signal which is to be appended to the WDM signal to be transmitted, based on the wavelength information. | 01-13-2011 |
20110104830 | APPARATUS FOR INSPECTION WITH ELECTRON BEAM, METHOD FOR OPERATING SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING FORMER - A substrate inspection apparatus | 05-05-2011 |
20120032079 | INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTURING DEVICES USING THE SYSTEM - An inspection apparatus by an electron beam comprises: an electron-optical device | 02-09-2012 |
20140034831 | INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTURING DEVICES USING THE SYSTEM - An inspection apparatus by an electron beam comprises: an electron-optical device | 02-06-2014 |
20140218272 | DISPLAY UNIT, METHOD OF DRIVING THE SAME, AND CONTROL PULSE GENERATION DEVICE - A display unit includes a pixel group having pixels. Each of the pixels includes a light emitting section and a drive circuit. The pixel group is divided into P pieces of pixel blocks. The display unit is configured to allow the light emitting sections from the light emitting sections configuring the respective pixels in a first pixel block of the P pieces of pixel blocks to the light emitting sections configuring the respective pixels in a P-th pixel block of the P pieces of pixel blocks to sequentially emit light together on a pixel block basis, and when the light emitting sections configuring the respective pixels in pixel blocks of the P pieces of pixel blocks emit light, configured to allow the light emitting sections configuring the respective pixels in remaining pixel blocks of the P pieces of pixel blocks not to emit light. | 08-07-2014 |