Patent application number | Description | Published |
20090092469 | SUBSTRATE PROCESSING UNIT, SUBSTRATE TRANSFER METHOD, SUBSTRATE CLEANSING PROCESS UNIT, AND SUBSTRATE PLATING APPARATUS - To provide a substrate processing unit, a substrate transfer method, a substrate cleansing process unit, and a substrate plating apparatus that make it possible for a substrate carry-in mechanism such as a robot arm to quickly release hold on the substrate after carrying in the substrate so as to shorten the time for holding the substrate and improve throughput. The substrate processing unit | 04-09-2009 |
20090158539 | ENDOSCOPE WASHING AND DISINFECTING APPARATUS AND LEAK DETECTION METHOD PERFORMED BY THE APPARATUS - An endoscope washing and disinfecting apparatus includes: a connecting portion connected to a bending transmitting portion of an endoscope to transmit driving force; a distal end driving portion for transmitting the driving force to the bending transmitting portion through the connecting portion; a fluid supplying unit for supplying gas into an inner space of the endoscope; and a control unit for controlling a pressure detecting portion for detecting pressure in the inner space and the distal end driving portion to provide the bending portion with bending motion, and for determining occurrence or nonoccurrence of water leak in the endoscope by comparing the pressure detected by the pressure detecting portion and a preset threshold. | 06-25-2009 |
20090220377 | ENDOSCOPE WASHING AND DISINFECTING APPARATUS AND ENDOSCOPE WASHING AND DISINFECTING METHOD - An endoscope washing and disinfecting apparatus includes: a fluid supply unit that supplies fluid for washing and disinfecting; an electromagnetic valve provided in each of a plurality of connecting channels which are connected to a plurality of channels of an endoscope; a single flow rate meter provided between the fluid supply unit and the electromagnetic valve; and a flow rate limiting section for limiting flow rate so that the flow rate falls within a flow rate measurement range in which flow rate measurement by the flow rate meter is possible; or a flow rate padding section for padding a flow rate with a flow rate that can be detected by the flow rate meter; or a flow rate diverting section for diverting part of flow rate that flows to the flow rate meter through a bypass channel. | 09-03-2009 |
20090241554 | PELTIER DEVICE AND TEMPERATURE REGULATING CONTAINER EQUIPPED WITH THE PELTIER DEVICE - An object of the present invention is to provide a Peltier device capable of retaining a certain temperature at a high accuracy by using a conductive glass consisting primarily of vanadate as an electrode, excellent in handleability, easy in temperature regulation, excellent in stability of cooling performance, capable of securely preventing an electrode from corrosion resulting from chemicals or dew condensation etc., and excellent in reliability and durability of the electrode. | 10-01-2009 |
20090291624 | SUBSTRATE POLISHING APPARATUS AND METHOD - A substrate polishing apparatus includes a substrate holding mechanism having a head for holding a substrate to be polished, and a polishing mechanism including a polishing table with a polishing pad mounted thereon. The substrate held by the head is pressed against the polishing pad on the polishing table to polish the substrate by relative movement of the substrate and the polishing pad. The substrate polishing apparatus also includes a substrate transfer mechanism for delivering the substrate to be polished to the head and receiving the polished substrate. The substrate transfer mechanism includes a substrate to-be-polished receiver for receiving the substrate to be polished, and a polished substrate receiver for receiving the substrate which has been polished. | 11-26-2009 |
20090305612 | Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method - An apparatus for processing a substrate is disclosed. The apparatus includes a polishing section configured to polish a substrate, a transfer mechanism configured to transfer the substrate, and a cleaning section configured to clean and dry the polished substrate. The cleaning section has plural cleaning lines for cleaning plural substrates. The plural cleaning lines have plural cleaning modules and plural transfer robots for transferring the substrates. | 12-10-2009 |
20100027178 | ELECTRIC/ELECTRONIC CIRCUIT SYSTEM WITH CONDUCTIVE GLASS MEMBER - [Problems] To provide a means for preventing electric/electronic materials from losing or degrading functionality when electrically conductive glasses are used as such electric/electronic materials. | 02-04-2010 |
20100076450 | INSERTION DEVICE FOR INTRAOCULAR LENS AND INTRAOCULAR LENS PRELOADED INSERTION DEVICE - The insertion device ( | 03-25-2010 |
20100082037 | INSERTION DEVICE FOR INTRAOCULAR LENS AND INTRAOCULAR LENS PRELOADED INSERTION DEVICE - The insertion device ( | 04-01-2010 |
20100221432 | SUBSTRATE PROCESSING METHOD AND APPARATUS - A substrate processing method and apparatus can securely carry out a pre-plating treatment that enables uniform plating in the necessary area of the surface of a substrate. The substrate processing method carries out a cleaning treatment and a catalyst-imparting treatment of a surface of a substrate as pre-plating treatments and then electroless plates a metal film on the catalyst-imparted surface of the substrate. The cleaning treatment is carried out in a wider area of the surface of the substrate than that area to which a catalyst is imparted by the catalyst-imparting treatment. | 09-02-2010 |
20110013729 | SIGNAL PROCESSING APPARATUS, SIGNAL PROCESSING METHOD, AND RECEPTION SYSTEM - Disclosed herein is a signal processing apparatus including a processing block configured to perform a carrier shift amount detection process for detecting a carrier shift amount constituting a carrier error used for demodulating an orthogonal frequency division multiplexing signal known as the OFDM signal; and a correction block configured to correct the OFDM signal in accordance with the carrier shift amount. The OFDM signal includes a first preamble signal including subcarriers, and a second preamble signal including subcarriers of which the spacing is narrower than the spacing of the subcarriers included in the first preamble signal. The second preamble signal includes pilot signals which are known signals located at intervals of a predetermined number of subcarriers. The processing block detects the carrier shift amount using a correlation of the subcarriers included in one such second preamble signal. | 01-20-2011 |
20110019101 | RECEIVING APPARATUS AND METHOD AND PROGRAM - Disclosed herein is a receiving apparatus including a preamble analyzer configured to receive a frame of DVB-T2 made up of an OFDM signal and analyze a preamble contained in the received frame; an offset detector configured to detect a fine offset and a coarse offset on the basis of the analyzed preamble; a carrier frequency corrector configured to execute carrier frequency correction on an OFDM time domain signal obtained by quadrature demodulation on the basis of the detected fine offset and the detected coarse offset; a determiner configured to determine whether the detection of the coarse offset has been completed; and a control signal outputter configured, if the detection of the coarse offset is determined to be completed, to output a control signal for feeding back the fine offset detected on the basis of an OFDM frequency domain signal obtained by FFT computation to the carrier frequency corrector. | 01-27-2011 |
20110019782 | SIGNAL PROCESSING APPARATUS AND METHOD - Disclosed herein is a signal processing apparatus, including: a computation device operable to perform transform computation adapted to Fourier-transform a time domain OFDM i.e., Orthogonal Frequency Division Multiplexing signal into a frequency domain OFDM signal; a processing device operable to perform carrier frequency offset detection adapted to detect an estimated carrier frequency offset that is an error of a carrier used for demodulation of the OFDM signal; and a carrier frequency offset correction device operable to perform carrier frequency offset correction adapted to correct the carrier frequency offset of the frequency domain OFDM signal in accordance with the estimated carrier frequency offset. | 01-27-2011 |
20110019784 | RECEPTION APPARATUS, RECEPTION METHOD, PROGRAM, AND RECEPTION SYSTEM - Disclosed herein is a reception apparatus including: an acquisition section configured to acquire an orthogonal frequency division multiplexing signal composed resultingly of signals transmitted by the orthogonal frequency division multiplexing method from a plurality of transmission apparatuses; a correction value calculation block configured to calculate a correction value for correcting a drift amount of the orthogonal frequency division multiplexing signal using the phase of either a first pilot signal or a second pilot signal extracted from the acquired orthogonal frequency division multiplexing signal, the first pilot signal being obtained from pilot signals which are in phase with one another coming from the plurality of transmission apparatuses, the second pilot signal being acquired from pilot signals which are out of phase with one another coming from the plurality of transmission apparatuses; and a correction block configured to correct the drift amount of the orthogonal frequency division multiplexing signal in accordance with the calculated correction value. | 01-27-2011 |
20110094442 | SUBSTRATE HOLDING APPARATUS, SUBSTRATE HOLDING METHOD, AND SUBSTRATE PROCESSING APPARATUS - A substrate holding apparatus can meet the request for a smaller-sized compact apparatus while ensuring a sufficient immersion depth of a substrate in a processing liquid. The substrate holding apparatus includes: a substrate holder for supporting a substrate (W) by bringing a peripheral portion of a surface of the substrate (W) into contact with a first sealing member; and a substrate pressing section for lowering relative to the substrate holder so as to press the substrate (W) held by the substrate holder downward, thereby bringing a first sealing member into pressure contact with the substrate (W). The substrate pressing section is provided with a second ring-shaped sealing member which makes pressure contact with an upper surface of a ring-shaped holding section of the substrate holder, thereby sealing the peripheral region of the substrate pressing section. | 04-28-2011 |
20110099445 | RECEPTION APPARATUS, RECEPTION METHOD AND RECEPTION SYSTEM - Disclosed herein is a reception apparatus, including an acquisition section adapted to receive a signal which includes at least one of a first signal and a second signal which have different structures from each other except that the first and second signals have a preamble signal and acquire the preamble signal from the received signal; a detection section adapted to detect a value for correcting the signal using the signal; and a correction section adapted to correct, if it is decided based on the preamble signal acquired by the acquisition section that the signal is the first signal, the signal using the value detected by the detection section. | 04-28-2011 |
20110203518 | SUBSTRATE PROCESSING METHOD AND APPARATUS - A substrate processing method and apparatus can securely carry out a pre-plating treatment that enables uniform plating in the necessary area of the surface of a substrate. The substrate processing method carries out a cleaning treatment and a catalyst-imparting treatment of a surface of a substrate as pre-plating treatments and then electroless plates a metal film on the catalyst-imparted surface of the substrate. The cleaning treatment is carried out in a wider area of the surface of the substrate than that area to which a catalyst is imparted by the catalyst-imparting treatment. | 08-25-2011 |
20110237163 | SUBSTRATE POLISHING APPARATUS AND METHOD - A substrate polishing apparatus includes a substrate holding mechanism having a head for holding a substrate to be polished, and a polishing mechanism including a polishing table with a polishing pad mounted thereon. The substrate held by the head is pressed against the polishing pad on the polishing table to polish the substrate by relative movement of the substrate and the polishing pad. The substrate polishing apparatus also includes a substrate transfer mechanism for delivering the substrate to be polished to the head and receiving the polished substrate. The substrate transfer mechanism includes a substrate to-be-polished receiver for receiving the substrate to be polished, and a polished substrate receiver for receiving the substrate which has been polished. | 09-29-2011 |
20120141246 | SUBSTRATE HOLDING APPARATUS, SUBSTRATE HOLDING METHOD, AND SUBSTRATE PROCESSING APPARATUS - A substrate holding apparatus can meet the request for a smaller-sized compact apparatus while ensuring a sufficient immersion depth of a substrate in a processing liquid. The substrate holding apparatus includes: a substrate holder for supporting a substrate (W) by bringing a peripheral portion of a surface of the substrate (W) into contact with a first sealing member; and a substrate pressing section for lowering relative to the substrate holder so as to press the substrate (W) held by the substrate holder downward, thereby bringing a first sealing member into pressure contact with the substrate (W). The substrate pressing section is provided with a second ring-shaped sealing member which makes pressure contact with an upper surface of a ring-shaped holding section of the substrate holder, thereby sealing the peripheral region of the substrate pressing section. | 06-07-2012 |
20130329775 | RECEIVING DEVICE, RECEIVING METHOD, AND PROGRAM - The present technique relates to a receiving device, a receiving method, and a program for realizing a prompt start of data demodulation. A receiving device of one aspect of the present technique includes: a detecting unit that detects a first preamble signal from a frame signal having a frame structure that contains the first preamble signal indicating a frame partition, a second preamble signal containing control information to be used in processing a data signal, and the data signal, the second preamble signal being transmitted after the first preamble signal; an accumulating unit that accumulates the second preamble signal when the first preamble signal is detected; and a processing unit that processes the data signal based on the control information contained in the second preamble signal accumulated in the accumulating unit, the data signal being contained in the same frame as the second preamble signal accumulated in the accumulating unit. The present technique can be applied to a receiving device that receives data transmitted by an OFDM method such as DVB-T2. | 12-12-2013 |
20130329839 | RECEIVING DEVICE, RECEIVING METHOD, AND PROGRAM - The present technique relates to a receiving device, a receiving method, and a program that are designed to improve reception performance. A receiving device according to one aspect of the present technique includes: a gain control unit that adjusts the power of a signal including a first pilot signal transmitted as signals having a high correlation in terms of polar direction via different transmission channels, and a second pilot signal transmitted as signals having a low correlation in terms of polar direction via the different transmission channels; and a control unit that controls the followability of the gain at the gain control unit in accordance with a data transmission method. The present technique can be applied to a receiver that receives data transmitted by MISO (Multi Input, Single Output) compliant with the DVB-T2 standards. | 12-12-2013 |
20130332980 | RECEIVING DEVICE, RECEIVING METHOD, AND PROGRAM - This technique relates to a receiving device, a receiving method, and a program that can demodulate transmitted signals with high accuracy. A receiving device of this disclosure includes: an amplifying unit that amplifies a received signal; an adjusting unit that adjusts gain of the amplifying unit in accordance with power of the signal; a demodulating unit that demodulates the amplified signal; and a detecting unit that detects an interval from the signal, information having the same content continuously appearing in the interval. The adjusting unit restricts the process of adjusting the gain of the amplifying unit in accordance with a result of the detection of the interval. This disclosure can be applied to receiving devices that receive broadcast signals compliant with DVB-C2 via a CATV network. | 12-12-2013 |
20130342764 | SIGNAL PROCESSING DEVICE, SIGNAL PROCESSING METHOD, AND PROGRAM - The present technology relates to a signal processing device, a signal processing method, and a program capable of appropriately demodulating a desired signal from a multiplexed signal obtained by multiplexing a plurality of signals. A preamble signal is detected from a multiplexed signal obtained by multiplexing a plurality of signals. When information for discriminating each of the signals that is contained in the preamble signal indicates a first signal, demodulation by a demodulator is continued and the first signal is demodulated. When information for discriminating each of the signals that is contained in the preamble signal indicates a second signal, demodulation is not performed by stopping the demodulation by the demodulator. The present technology can be applied to a signal processing device that processes signals for digital broadcasting. | 12-26-2013 |
20140083468 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus has a cleaning section for cleaning a substrate such as a semiconductor wafer and can be used as a polishing apparatus. The substrate processing apparatus includes a first cleaning chamber which houses at least one first cleaning module and two second cleaning modules arranged in a vertical array, a second cleaning chamber which houses two third cleaning modules arranged in a vertical array, and a first transport robot housed in a first transport chamber disposed between the first cleaning chamber and the second cleaning chamber. The first transport robot is configured to transfer substrates between the first cleaning module, the second cleaning modules, and the third cleaning modules. | 03-27-2014 |
20140120725 | POLISHING APPARATUS AND POLISHING METHOD - A polishing apparatus is used for polishing a surface of a substrate such as a semiconductor wafer to planarize the surface of the substrate. The polishing apparatus includes a polishing table having a polishing surface, and a top ring configured to hold a substrate with an outer circumferential edge of the substrate surrounded by a retainer ring and to press the substrate against the polishing surface. The top ring is movable between a polishing position above the polishing table, a position laterally of the polishing table, and a cleaning position. The polishing apparatus includes a cleaning unit disposed in the cleaning position and configured to eject a cleaning liquid toward the lower surface of the top ring, which is being rotated, thereby cleaning the substrate held by the top ring together with the lower surface of the top ring. | 05-01-2014 |
20140302676 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, SUBSTRATE HOLDING MECHANISM, AND SUBSTRATE HOLDING METHOD - An apparatus for processing a substrate is disclosed. The apparatus includes a polishing section configured to polish a substrate, a transfer mechanism configured to transfer the substrate, and a cleaning section configured to clean and dry the polished substrate. The cleaning section has plural cleaning lines for cleaning plural substrates. The plural cleaning lines have plural cleaning modules and plural transfer robots for transferring the substrates. | 10-09-2014 |
20150050863 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, SUBSTRATE HOLDING MECHANISM, AND SUBSTRATE HOLDING METHOD - An apparatus for processing a substrate is disclosed. The apparatus includes a polishing section configured to polish a substrate, a transfer mechanism configured to transfer the substrate, and a cleaning section configured to clean and dry the polished substrate. The cleaning section has plural cleaning lines for cleaning plural substrates. The plural cleaning lines have plural cleaning modules and plural transfer robots for transferring the substrates. | 02-19-2015 |
20150085910 | RECEPTION DEVICE, RECEPTION METHOD, AND PROGRAM - There is provided a reception device including a reception unit configured to receive an OFDM (Orthogonal Frequency Division Multiplexing) signal, an acquisition unit configured to acquire a transmission parameter concerning the OFDM signal contained in the OFDM signal, and a selection unit configured to select a demodulation mode of the OFDM signal in accordance with the acquired transmission parameter. | 03-26-2015 |