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Kemper
Konrad Kemper, Sao Paulo BR
| Patent application number | Description | Published |
|---|---|---|
| 20100240643 | Use of Active Substance Combinations Having Insecticidal Properties for Controlling Animal Pests from the Stink Bug Family - The present invention relates to the use of active substance combinations which consist firstly of known cyclic ketoenols and secondly of further known insecticidal active substances, for controlling animal pests from the stink bug family (Pentatomidae). | 09-23-2010 |
| 20100249121 | USE OF TETRAMIC ACID DERIVATIVES FOR CONTROLLING VIRUS-TRANSFERRING VECTORS - The present invention relates to the use of tetramic acid derivatives on their own and also of active compound combinations comprising, firstly, known tetramic acid derivatives and, secondly, further known insecticidal active compounds for controlling viroses transferred by insects. | 09-30-2010 |
Nicolaas Rudolf Kemper, Rl Eindhoven NL
| Patent application number | Description | Published |
|---|---|---|
| 20110096307 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased. | 04-28-2011 |
Nicolaas Rudolf Kemper, Veldhoven NL
| Patent application number | Description | Published |
|---|---|---|
| 20100245791 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally. | 09-30-2010 |