Patent application number | Description | Published |
20120080820 | IMPRINTING METHOD - Provided is an imprinting method for transferring a pattern formed on a mold to a substrate, the imprinting method including applying a resin to a predetermined shot area on the substrate; moving the shot area from an application position to an imprinting position; supplying gas to the shot area; and imprinting the mold into the shot area, wherein, in the gas supply step, gas is supplied only from a gas supplying unit located above a moving path extending from the application position to the imprinting position, and the supply of the gas is started before the shot area passes beneath the gas supplying unit to thereby supply the gas to the shot area while moving it. | 04-05-2012 |
20120153537 | LITHOGRAPHY SYSTEM AND LITHOGRAPHY METHOD - A lithography system includes at least two lithography apparatuses disposed on the same fixed base, each of which includes an object, a moving body, and a vibration isolation unit. A control unit configured to control the lithography apparatuses controls a vibration isolation unit included in a first lithography apparatus based on driving instruction information to be given to a moving body included in a second lithography apparatus, and a control indicator regarding vibration directed onto an object to be vibration-isolated included in the first lithography apparatus due to a moving operation of the moving body. | 06-21-2012 |
20120170008 | EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE - A scanning exposure apparatus exposes a plurality of shot regions on a substrate to light while scanning an original and the substrate. The apparatus includes: a stage which holds the substrate and moves; and a controller which controls movement of the stage based on a driving profile that defines the movement of the stage. A portion in the driving profile, which defines the movement of the stage during exposure of at least one shot region, is formed by a sine wave having a frequency lower than a resonance frequency in a stage controller. | 07-05-2012 |
20130037687 | ANTI-VIBRATION APPARATUS - The present invention provides an anti-vibration apparatus including an anti-vibration base, a plurality of supporting mechanisms configured to support the anti-vibration base, a plurality of actuators configured to apply a force to the anti-vibration base, an obtaining unit configured to obtain vibration data which represents vibrations on the anti-vibration base, a first calculation unit configured to calculate, based on the vibration data obtained by the obtaining unit, a force to be applied to the anti-vibration base so as to reduce the vibrations on the anti-vibration base, and a distribution unit configured to distribute the force calculated by the first calculation unit to forces to be applied by the plurality of actuators to the anti-vibration base. | 02-14-2013 |
20130044306 | EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE - An exposure apparatus includes: a substrate stage configured to move upon holding the substrate; a structural member configured to support a substrate stage; a first counter mass stage configured to cancel a driving reaction force that is generated due to driving of the substrate stage and acts on the structural member; a substrate stage driver configured to generate a force between the substrate stage and the first counter mass stage; a first counter mass driver configured to generate a force between the structural member and the first counter mass stage; a controller configured to control the first counter mass driver so as to cancel the force that acts on the structural member by generating a force between the structural member and the first counter mass stage using the first counter mass driver. | 02-21-2013 |
20130101382 | PROCESSING MACHINE SYSTEM AND METHOD OF POSITIONING PROCESSING MACHINES - At least three processing machines are positioned on a supporting structure including a plurality of beams spaced apart from each other. The at least three processing machines include a first processing machine, a second processing machine supported by at least one of beams which support the first processing machine, and a third processing machine supported by beams different from all the beams which support the first processing machine. A distance between the first processing machine and the second processing machine, at which an amount of vibration transferred from the first processing machine to the second processing machine becomes smaller than a predetermined amount, is determined, thereby positioning the first processing machine and the second processing machine with a distance not less than the determined distance. | 04-25-2013 |
20130293889 | POSITION MEASURING APPARATUS, PATTERN TRANSFER APPARATUS, AND METHOD FOR MANUFACTURING A DEVICE - A position measuring apparatus configured to measure a position of an measured object using a plate-like scale including a grating pattern, includes a supporting unit configured to be arranged between a structure and the scale and to support the scale, in which the supporting unit includes a spring element that reduces vibration transferred from the structure to the scale in a plate thickness direction. | 11-07-2013 |
20140125962 | STAGE APPARATUS AND ADJUSTMENT METHOD THEREOF, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE - A stage apparatus includes a stage, an interferometric measurement device which is arranged to be able to measure a position of a surface of a mirror arranged on a side surface of the stage, and a driving unit configured to position the stage based on a measurement result of the interferometric measurement device. The interferometric measurement device includes: a varying unit configured to periodically vary an incident position where measurement light is incident on the mirror; and a detecting unit configured to detect rotation of the mirror based on a variation amount of the measurement result of the interferometric measurement device, which is generated upon a periodic variation of the incident position. | 05-08-2014 |
20150042012 | IMPRINT APPARATUS AND IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD - An imprint apparatus is provided with: an application unit; a substrate holding unit including an auxiliary plate; a gas supply unit including multiple supply outlets, which supplies gas to an interstice between a mold and a substrate, in conjunction with movement of a shot region by driving of the substrate holding unit from an application position of the application unit to a pressing position where pressing is conducted, when pressing the mold against an uncured resin applied to the shot region; and a controller which selects a supply outlet to supply the gas so that the supply outlet that supplies the gas among the multiple supply outlets is opposed by either the substrate or the auxiliary plate, while the shot region to which the uncured resin was applied is moved toward the pressing position, and which controls a direction of movement of the shot region. | 02-12-2015 |