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Keiichi Tanaka

Keiichi Tanaka, Osaka JP

Patent application numberDescriptionPublished
20090269028REPRODUCTION DEVICE AND PROGRAM - A playback apparatus plays back video data recorded on a recording medium such as a BD-ROM. The playback apparatus includes an interface in which a removable medium such as an SDRAM can be inserted, a detection module that detects that the removable medium is inserted, and a virtual file system. The virtual file system is used if the removable medium is detected to be inserted, if additional content such as subtitles is recorded on the removable medium, and furthermore if the additional content is associated with the video data recorded on the BD-ROM, etc. The virtual file system is used for dynamically combining the video data recorded on the BD-ROM, etc. and the additional content of the removable medium so as to play back a virtual package.10-29-2009
20100034516REPRODUCING APPARATUS, REPRODUCING METHOD, AND PROGRAM - A playback device that creates a virtual package by combining a structural element recorded on a BD-ROM with an additional content recorded on a removable medium. The middleware in the playback device is provided with a file I/O module 02-11-2010
20100061702REPRODUCING APPARATUS - A playback device generates a virtual package in response to a construction request made by an application. After the virtual package is thus generated, a virtual file system 03-11-2010
20110052153REPRODUCTION DEVICE, REPRODUCTION METHOD, AND PROGRAM - A problem with high resource-consuming managed copy is that simultaneous execution of the managed copy, which is controlled by a playback device, and a BD-J application, which is recorded on a recording medium, leads to a shortage in resources. Provided is a playback device that enables simultaneous execution of the managed copy and the BD-J application while preventing resource contention therebetween, by imposing an access limitation on the disc medium by causing the BD-J application to assume that the disc medium has been virtually ejected.03-03-2011
20110299830APPLICATION RUNNING DEVICE - To provide an application life cycle management method for use in switching a movie work that is a playback target within a storage medium on which a plurality of movie works are stored, which is equivalent to one for use in replacement of BD-ROM discs. When a playback target is switched within a local storage on which a plurality of movie works are stored, a playback device, which includes an input unit for issuing a movie work switching request, performs processing with use of a user operation performed on the input unit as a trigger, instead of the medium status change between ejection and insertion. This allows application life cycle management equivalent to one in the case of BD-ROM disc replacement.12-08-2011
20110305435PLAYBACK DEVICE, RECORDING MEDIUM, PLAYBACK METHOD AND PROGRAM - A bytecode processing unit provided in a playback device is platform unit 12-15-2011
20110307448REPRODUCTION DEVICE - In conventional managed copy, files are copied to the copy destination, while maintaining the file structure of the copy source. A problem pertaining to the conventional managed copy is that, when a partial copy, which changes the file structure of the copy source, is performed, the created disc does not conform to the standard and thus cannot be played back by the playback device.12-15-2011
20120002520PLAYBACK DEVICE, RECORDING MEDIUM, PLAYBACK METHOD AND PROGRAM - A playback device reads a BD-J application from a BD-ROM and runs the BD-J application. The BD-J application causes, by using a socket connection API, the digital copy module of the playback device to execute copying of a protected content for portable terminals to a removable recording medium and setting of a resume playback point on the copied content. The resume playback point is specified by the BD-J application according to playback time information read from the PSR set.01-05-2012

Patent applications by Keiichi Tanaka, Osaka JP

Keiichi Tanaka, Tsu-Shi JP

Patent application numberDescriptionPublished
20100212832STAGE DEVICE AND PLASMA TREATMENT APPARATUS - The present invention provides a stage device which does not generate the difference in level between an upper end of a lift pin and a setting surface of a stage in a state where a substrate to be treated is set on the setting surface of the stage, and provides a plasma treatment apparatus which suppresses the occurrence of uneven treatment by using the stage device as an electrode stage. At the center of an electrode stage (08-26-2010

Keiichi Tanaka, Saitama-Shi JP

Patent application numberDescriptionPublished
20090059190MOVABLE BODY APPARATUS, EXPOSURE APPARATUS AND OPTICAL SYSTEM UNIT, AND DEVICE MANUFACTURING METHOD - The upper end of a static gas bearing member of a wafer side seal unit is connected to an edge section on the outgoing side of an exposure beam of a chamber in an air tight state via bellows, and the lower end surface is in a state forming a predetermined clearance with a wafer and a wafer holder. By this arrangement, the inside of the chamber is isolated from the outside. Accordingly, it becomes possible to maintain a vacuum environment in the periphery of the optical path of the exposure beam without arranging a vacuum chamber to house a wafer, a wafer holder, and a wafer stage, which allows the size of the entire exposure apparatus to be reduced, and also makes it easy to have access to the vicinity of the wafer stage.03-05-2009
20090218511Stage apparatus and exposure apparatus - The present invention provides a stage apparatus wherein an object is disposed in an atmosphere with a gas pressure lower than atmospheric pressure, and the object can be driven with high accuracy. The stage apparatus that drives a reticle comprises: a vacuum chamber, which forms a space and has an opening; an integrated coarse and fine motion table, which has an electrostatic chuck that holds the object, that, when driven, moves the electrostatic chuck inside the space; a counter mass, which is disposed so that it covers the opening, that is capable of moving because of the reaction force produced when the integrated coarse and fine motion table is driven; and a vacuum cover, which forms a space that houses the counter mass; wherein the space and the space are set to prescribed gas pressures.09-03-2009
20100002220LIGHT SHIELDING UNIT, VARIABLE SLIT APPARATUS, AND EXPOSURE APPARATUS - A light shielding unit, which shields a part of an exposure light with a light shielding member, includes a sensor which detects displacement of the light shielding member, a driving device which drives the light shielding member based on a detection result obtained by the sensor, a case which accommodates the sensor and the driving device, and a bellows mechanism which gas-seals the case with respect to the light shielding member. When the illumination area of the illumination light is defined, it is possible to mitigate the influence of the foreign matters and/or the heat generated from the driving mechanism.01-07-2010
20100141923STAGE APPARATUS AND ALIGNER - There is provided a stage apparatus at low cost by constituting a counter mass constituting a movable portion of the stage apparatus at low cost.06-10-2010

Patent applications by Keiichi Tanaka, Saitama-Shi JP

Keiichi Tanaka, Chiba-Shi JP

Patent application numberDescriptionPublished
20090184252X-RAY ANALYZER - Provided is an X-ray analyzer capable of significantly suppressing an influence of an external magnetic field on a transition edge sensor (TES). The X-ray analyzer includes: a TES (07-23-2009
20100019152Superconducting radiometry apparatus - There is provided a superconducting radiometry apparatus capable of performing, while sample-measuring, an energy correction in regard to a fluctuation of a peak value of an output signal, which is due to a radiation heat and a magnetic field from an outside. The superconducting radiometry apparatus is constituted by comprising a micro-calorie meter detecting an energy of a radiant ray as a temperature change, a signal detection mechanism for detecting a displacement of an electric current flowing to the micro-calorie meter, a shunt resistance which is connected in parallel to the micro-calorie meter and whose resistance value is smaller than the micro-calorie meter, a bias electric source connected to the micro-calorie meter and the shunt resistance and applying a constant voltage, a heat addition device adding a constant and already-known heat quantity to the micro-calorie meter, a peak value monitor measuring a peak value corresponding to an added heat quantity within an output signal from the signal detection mechanism while synchronizing with a heat quantity addition from the heat addition device, and an energy correction device correcting, on the basis of an output from the peak value monitor, so as to become a peak value corresponding to the heat quantity from the heat addition device.01-28-2010
20110226948Sample processing and observing method - There is provided a sample processing and observing method including irradiating a focused ion beam to a sample to form an observed surface, irradiating an electron beam to the observed surface to form an observed image, removing the surface opposite to the observed surface of the sample, forming a lamella including the observed surface and obtaining a transmission observed image for the lamella.09-22-2011

Patent applications by Keiichi Tanaka, Chiba-Shi JP

Keiichi Tanaka, Tokyo JP

Patent application numberDescriptionPublished
20090114619WET ETCHING METHOD AND WET ETCHING APPARATUS - A fine pattern is formed on a surface of a processing object without using photoresist. A wet etching for the processing object in an area to which ultraviolet light is applied is performed by bringing a solution in which nitrous oxide (N05-07-2009
20090317752Rinse liquid for lithography and method for forming resist pattern using same - The present invention provide with a rinse solution for lithography and a resist pattern forming method using the same, which can prevent an inclination and peeling-off of a resist pattern and form a resist pattern having a high aspect ratio with high reproducibility. The rinse solution for lithography of the present invention comprises water and a nonionic surfactant having an ethyleneoxy group but not having a fluorine atom. The resist forming method of the present invention comprises the step of rinsing the pattern after development treatment with the rinse solution for lithography.12-24-2009
20110146726PROCESS FOR CLEANING SEMICONDUCTOR ELEMENT - In a wiring formation process for a semiconductor device, the resist residue forming in dry etching with a reactive gas and aching with a plasma gas is removed, not corroding the members of the semiconductor device such as the interlayer insulating material and the wiring material thereof, and the device is protected from after-corrosion to occur after left for a given period of time after the treatment.06-23-2011
20110256483RESIDUE REMOVING LIQUID COMPOSITION AND METHOD FOR CLEANING SEMICONDUCTOR ELEMENT USING SAME - Provided are a residue removing liquid composition capable of completely removing a resist residue and a titanium (Ti)-derived residue that remains after dry etching and ashing in via hole formation in a production process for a semiconductor substrate having metal wiring of aluminium (Al) or an Al alloy, at a low temperature in a short time, not corroding parts of an interlayer insulating material, a wiring material and others, and a cleaning method for semiconductor devices using it.10-20-2011

Patent applications by Keiichi Tanaka, Tokyo JP

Keiichi Tanaka, Saitama-City JP

Patent application numberDescriptionPublished
20090015810METHOD OF MEASURING THE POSITION OF A MASK SURFACE ALONG THE HEIGHT DIRECTION, EXPOSURE DEVICE, AND EXPOSURE METHOD - A method to measure the height-direction position of a mask M in an exposure device having a function to irradiate the mask M with light emitted from a light source and transfer a pattern formed on the mask M onto a photosensitive substrate such as a wafer by a projection optical system, a mask surface height-direction position measurement method characterized by moving, before measuring the height-direction position of the mask M, an exposure area defining member 01-15-2009

Patent applications by Keiichi Tanaka, Saitama-City JP

Keiichi Tanaka, Mie JP

Patent application numberDescriptionPublished
20080286528Color Filter Substrate, Liquid Crystal Display Device, Production Method of Color Filter Substrate, Production Method of Liquid Crystal Display Device - To provide: a color filter substrate with high display quality in which defective portions of a bank member (black matrix), such as a pin hole, a portion having an insufficient film thickness, a portion having an insufficient width, and a disconnection portion, or color mixing defects of a colored layer are corrected by the simple and inexpensive method; a liquid crystal display device including such a color filter; and production methods thereof. The color filter substrate of the present invention is a color filter substrate comprising a bank member and a colored layer on a substrate, wherein the color filter substrate has a structure in which a color mixing member formed of colored layer materials of two or more colors is formed in a defective portion of the bank member or along the bank member.11-20-2008

Keiichi Tanaka, Kumamoto JP

Patent application numberDescriptionPublished
20080274433Rinse Treatment Method and Development Process Method - A rinsing method for performing a rinsing process on a substrate, after a developing process is performed on a light-exposed pattern disposed thereon, includes a step (STEP 11-06-2008

Keiichi Tanaka, Aichi-Ken JP

Patent application numberDescriptionPublished
20110131666VEHICLE DATA STORAGE SYSTEM, VEHICLE DATA STORAGE APPARATUS, VEHICLE DATA STORAGE SERVER, AND VEHICLE DATA STORAGE METHOD - A vehicle data storage system, in which vehicle data obtained from a vehicle-mounted device is stored, includes a vehicle data storage portion in which the vehicle data is stored; a country determination portion that determines a country in which a vehicle exists, based on position data of the vehicle; a selection table storage portion in which a type of the vehicle data that should be stored in the vehicle data storage portion is stored in association with country data; a data determination portion that determines the type of the vehicle data that should be stored in the vehicle data storage portion, based on the country determined by the country determination portion, by referring to the selection table storage portion; and a data processing portion that stores, in the vehicle data storage portion, the vehicle data determined by the data determination portion.06-02-2011

Keiichi Tanaka, Koshi City JP

Patent application numberDescriptionPublished
20110143289SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM AND SUBSTRATE PROCESSING SYSTEM - A PEB unit has a first heat plate and a second heat plate. After an exposure process for a resist film for EUV on a wafer and before a development process, the PEB unit heats the wafer through the first heat plate at a first heating temperature. A heating time through the first heat plate is not less than 10 seconds and not more than 30 seconds. Thereafter, the PEB unit heats the wafer through the second heat plate at a second heating temperature lower than the first heating temperature. A temperature difference between the first heating temperature and the second heating temperature is not less than 20° C. and not more than 60° C.06-16-2011
20110143290DEVELOPING TREATMENT METHOD AND COMPUTER-READABLE STORAGE MEDIUM - An extreme ultra violet (EUV) resist film is formed on a wafer W, and then a EUV light is radiated onto the EUV resist film formed on the wafer W so that a predetermined pattern is selectively exposed on the EUV resist film. Thereafter, a developing solution with a concentration of less than 2.38% by weight, whose temperature is adjusted to be 5° C. or higher and less than 23° C. in a supplying equipment group 06-16-2011

Keiichi Tanaka, Chuo-Ku JP

Patent application numberDescriptionPublished
20110188022SUBSTRATE CARRYING DEVICE, SUBSTRATE CARRYING METHOD, AND EXPOSURE DEVICE - The present invention relates to a substrate carrying device that carries a substrate such as a reticle, a substrate carrying method thereof, and an exposure device thereof. An object of the present invention is to securely suck a substrate onto a lower surface of a chuck.08-04-2011

Keiichi Tanaka, Koshi-Shi JP

Patent application numberDescriptionPublished
20110229120RINSING METHOD AND DEVELOPING METHOD - A rinsing method for performing a rinsing process on a substrate, after a developing process is performed on a light-exposed pattern disposed thereon, includes a step (STEP 09-22-2011

Keiichi Tanaka, Okazaki-Shi JP

Patent application numberDescriptionPublished
20120113773INFORMATION RECORDING DEVICE - A CAN driver receives vehicle information sent onto CAN. A diagnosis information acquiring module monitors whether an operation of a diagnosis record ECU itself is normal or not and thus generates diagnosis information. A timestamp information generating module generates timestamp information A per sec and generates timestamp information B in which a time difference from the generation timing of the timestamp information A is expressed on the unit of 1/100 sec. A diagnosis record module, each time the timestamp information generating module generates the timestamp information A, transfers a first type record containing the timestamp information A and the diagnosis information generated at this point of time to a memory manager, and transfers a second type record containing the vehicle information and the timestamp information B generated at this point of time to the memory manager.05-10-2012