Patent application number | Description | Published |
20090277386 | CATALYTIC CHEMICAL VAPOR DEPOSITION APPARATUS - A catalytic chemical vapor deposition apparatus is provided for producing a thin film of desired film quality, by making a particle countermeasure against the release gas such as H | 11-12-2009 |
20100310828 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSED BY THIS METHOD - [Object]To provide a substrate processing method capable of forming a concavo-convex structure on a substrate surface while reducing the number of processes. | 12-09-2010 |
20110180402 | Vacuum Processing Apparatus - To provide a vacuum processing apparatus capable of supporting and conveying a substrate by a method suitable for a processing content in each processing step and capable of suppressing various mechanisms provided within a processing chamber from being adversely affected. More particularly, the CVD chamber of the apparatus is configured to be horizontal, and hence the above-mentioned problem can be solved. Further, by configuring a sputtering apparatus as the vertical type processing apparatus, problems with abnormal electrical discharge can be solved. | 07-28-2011 |
20110195562 | Sputtering Apparatus, Thin-Film Forming Method, and Manufacturing Method for a Field Effect Transistor - [Object] To provide a sputtering apparatus, a thin-film forming method, and a manufacturing method for a field effect transistor, which are capable of reducing damage of a base layer. | 08-11-2011 |
20110198213 | Sputtering Apparatus, Thin-Film Forming Method, and Manufacturing Method for a Field Effect Transistor - [Object] To provide a sputtering apparatus, a thin-film forming method, and a manufacturing method for a field effect transistor, which are capable of reducing damage of a base layer. | 08-18-2011 |
20110201150 | Sputtering Apparatus, Thin-Film Forming Method, and Manufacturing Method for a Field Effect Transistor - [Object] To provide a sputtering apparatus, a thin-film forming method, and a manufacturing method for a field effect transistor, which are capable of reducing damage of a base layer. | 08-18-2011 |
20110294256 | FILM-FORMING METHOD FOR FORMING PASSIVATION FILM AND MANUFACTURING METHOD FOR SOLAR CELL ELEMENT - The challenge for the present invention is to provide a film-forming method and for forming a passivation film which can sufficiently inhibit the loss of carriers due to their recombination; and a method for manufacturing a solar cell element with the use of the method or the device. The film-forming device comprises a mounting portion | 12-01-2011 |
20120145184 | SELF-CLEANING CATALYTIC CHEMICAL VAPOR DEPOSITION APPARATUS AND CLEANING METHOD THEREOF - A self-cleaning catalytic chemical vapor deposition apparatus which suppresses the corrosion-induced degradation of a catalytic body by a cleaning gas without heating a catalytic body to not less than 2000° C. and permits practical cleaning rates and good cleaning at low cost. Conductors supply a constant current to a catalytic body within a reaction chamber from a heating power supply. Terminals of the heating power supply are electrically insulated from the reaction chamber. A cleaning gas containing halogen elements is introduced into the evacuated reaction chamber. The catalytic body is heated by the heating power supply. An active species generated by this heating reacts with an adhering film adhered to the interior of the reaction chamber, which is removed. During this removal, a DC bias voltage with appropriate polarity and appropriate value is applied from a constant-voltage power supply to the conductor of the heating power supply. | 06-14-2012 |