Patent application number | Description | Published |
20090147228 | Exposure apparatus, manufacturing method thereof, and maintenance method of exposure apparatus - A projection optical system PL is used to project an image of a pattern. A manufacturing method of an exposure apparatus includes: a positioning step of positioning the projection optical system at a predetermined position; and a support step of supporting the positioned projection optical system. The positioning step includes a step of moving the projection optical system upward from below at the time of positioning. | 06-11-2009 |
20090190117 | Exposure apparatus, manufacturing method and supporting method thereof - An exposure apparatus includes an illumination optical system that guides illumination light to a mask; a projection optical system that projects the pattern irradiated with the illumination light, onto a substrate; and a supporting device that integrally suspendingly supports at least part of the illumination optical system and the projection optical system, with a supporting member having a flexible structure. | 07-30-2009 |
20090297990 | Liquid holding apparatus, liquid holding method, exposure apparatus, exposing method, and device fabricating method - Liquid is held in a prescribed region between a first object and a second object. An electrostatic holder holds the liquid by electrostatic force. | 12-03-2009 |
20100007865 | Coupling apparatus, exposure apparatus, and device fabricating method - An exposure apparatus fills a space between a projection optical system and a substrate with a liquid and projects a pattern image onto the substrate to expose the substrate. The projection optical system has a first group including an optical member that comes into contact with the liquid, and a second group that differs from the first group. The first group is supported by a first support member via a vibration isolating apparatus. | 01-14-2010 |
20100066992 | Stage apparatus, exposure apparatus, and device fabricating method - The invention provides a stage apparatus that has a fixed part, which has a prescribed movement surface, and a first movable body, which is capable of moving along the movement surface in a plurality of directions that includes a first direction. The stage apparatus comprises: a substage that, in synchrony with the movement of the first movable body, moves in the first direction with respect to the movement surface; a first measuring apparatus, at least part of which is provided to the substage, that detects information related to the relative position between the substage and the movement surface in the first direction; and a second measuring apparatus at least part of which is provided to the substage, that detects information related to the relative position between the substage and the first movable body in a second direction, which are substantially orthogonal to the first direction and follow along the movement surface. | 03-18-2010 |
20100103396 | Exposure apparatus and device fabrication method - An exposure apparatus for forming a predetermined pattern on a substrate by using exposure light, includes a stage apparatus which is movable with respect to an optical axis of the exposure light; a light-transmissive member provided at the stage apparatus, wherein a liquid is supplied on an upper surface of the light-transmissive member; and a measurement device which is settable below the light-transmissive member when measurement using the measurement device is performed. Leakage or entrance of a liquid used for exposure into an optical measurement device such as a wavefront aberration measurement device can be prevented, thereby enabling preferable optical adjustment such as imaging performance or optical characteristics. | 04-29-2010 |
20100134771 | Coupling apparatus, exposure apparatus, and device fabricating method - A lithographic projection apparatus includes an illumination system arranged to condition a radiation beam, a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern, a substrate table configured to hold a substrate, a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, and a liquid supply system configured to at least partly fill a space between the projection system and the substrate, with a liquid. The projection system includes a first part and a second part that are two separate physical parts that are substantially isolated from each other such that vibrations in the second part are substantially prevented from being transferred to the first part. Each part includes an optical element of the projection system and the first and second parts are not attached to and movable with the substrate. | 06-03-2010 |
20110001953 | TRANSPORT APPARATUS AND EXPOSURE APPARATUS - A substrate is transported between a first space and a second space, which are separated by a partition wall, through an opening portion formed in the partition wall. A transport apparatus includes a support device having a support portion which supports the substrate, the support device being provided so as to block the opening portion while a clearance between the partition wall and the support device is formed, the support device moving the support portion from a state where the support portion faces the first space to a state where the support portion faces the second space; and an adjustment device which adjusts an amount of the clearance, thereby suppressing the movement of fluid from the first space to the second space. | 01-06-2011 |
20150077730 | EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD - An exposure apparatus includes a projection system; a liquid supply system configured to supply liquid to a space under the projection system; a liquid recovery system configured to recover the supplied liquid via a recovery opening; a separator fluidically connected to the recovery opening, which separates one of the liquid and gas, which has been collected via the recovery opening, from the other; a flow-meter fluidically connected to the recovery opening; a stage system configured to move a movable member on which a substrate is held; and a measurement system having a light receiving part which receives a measurement light through a light-transmissive member provided at the movable member and through the liquid between the projection system and the light-transmissive member. | 03-19-2015 |