| Patent application number | Description | Published |
|---|
| 20080246966 | Surface-Inspecting Apparatus and Surface-Inspecting Method - Defect inspection of repeated pattern on a surface is executed by reducing influence of a base layer. Thus, surface-inspecting apparatus and method include unit irradiating repeated pattern on specimen's surface with illuminating light, units setting an angle formed by direction on an incidence plane's surface including irradiating direction of illuminating light and a normal to the surface and repeated direction of repeated pattern to predetermined value except zero, a light detecting unit detecting regular reflected light from repeated pattern when illuminating light is irradiated and outputs information about light intensity of regular reflected light, and a detecting unit detecting the repeated pattern's defect on information, from light detecting unit. Additionally, an angle formed by the direction on incidence plane's surface and repeated direction, an angle formed by irradiating direction of illuminating light and normal to surface, a wavelength of illuminating light, and a pitch of repeated pattern satisfy conditional expression. | 10-09-2008 |
| 20090059231 | Surface inspection apparatus - A surface inspection apparatus includes units illuminating repetitive patterns formed on a surface of a suspected substance and measuring a variation in an intensity of regular reflection light caused by a change in shapes of the repetitive patterns, units illuminating the repetitive patterns with linearly polarized light, setting an angle formed between a repetitive direction of the repetitive patterns and a direction of a plane of vibration of the linearly polarized light at a tilt angle, and measuring a variation in a polarized state of the regular reflection light caused by the change in the shapes of the repetitive patterns, and a unit detecting a defect of the repetitive patterns based on the variation in the intensity and the variation in the polarized state of the regular reflection light. | 03-05-2009 |
| 20090103080 | Surface inspecting apparatus - A surface inspecting apparatus is provided with an illuminating means for illuminating a repeated pattern formed on the surface of an object to be inspected by linear polarization; a setting means for setting an angle formed by a direction on the surface of an incidence plane of the linear polarization and a repeating direction of the repeated pattern at a prescribed value other than 0; an extracting means for extracting polarization components vertical to an oscillation surface of the linear polarization, from light generated in a specular direction from the repeated pattern; a light receiving means for receiving the light extracted by the extracting means, and outputting light intensity of the specular reflection light; and a detecting means for detecting defects of the repeated pattern, based on the light intensity of the specular reflection light outputted from the light receiving means. The setting means sets the angle formed by the direction on the surface of the incidence plane of the linear polarization and the repeating direction of the repeated pattern so that a difference between the intensity of light from a normal portion on the surface and the light intensity of light from a defective portion on the surface is at maximum. | 04-23-2009 |
| 20090315988 | OBSERVATION DEVICE, INSPECTION DEVICE AND INSPECTION METHOD - An inspection device is configured having: an illumination unit that illuminates a wafer with illumination light having a plurality of kinds of wavelengths; a photographing unit that photographs the image of the wafer illuminated with the illumination light; and an image processing unit that generates an inspection image of the wafer photographed by the photographing unit, by performing a predetermined weighting for each of the plurality of kinds of wavelengths, and judges whether any defect is present in the wafer based on the generated inspection image. | 12-24-2009 |
| 20100182593 | Surface state detecting apparatus - A surface inspection apparatus includes units illuminating repetitive patterns formed on a surface of a suspected substance and measuring a variation in an intensity of regular reflection light caused by a change in shapes of the repetitive patterns, units illuminating the repetitive patterns with linearly polarized light, setting an angle formed between a repetitive direction of the repetitive patterns and a direction of a plane of vibration of the linearly polarized light at a tilt angle, and measuring a variation in a polarized state of the regular reflection light caused by the change in the shapes of the repetitive patterns, and a unit detecting a defect of the repetitive patterns based on the variation in the intensity and the variation in the polarized state of the regular reflection light. | 07-22-2010 |
| 20100321677 | SURFACE INSPECTING APPARATUS AND SURFACE INSPECTING METHOD - There is provided a surface inspecting apparatus capable of performing inspection at higher speed and with higher accuracy. A surface inspecting apparatus ( | 12-23-2010 |
