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Kazi
Arif Kazi, Aalen DE
| Patent application number | Description | Published |
|---|---|---|
| 20080239503 | PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens. | 10-02-2008 |
| 20090257032 | OPTICAL ELEMENT AND METHOD - The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods. | 10-15-2009 |
| 20100201958 | OPTICAL CORRECTION DEVICE - The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element. | 08-12-2010 |
| 20100231883 | MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A microlithographic projection exposure apparatus includes a primary illumination system producing projection light, a projection objective and a correction optical system. The correction optical system includes a secondary illumination system, which produces an intensity distribution of correction light in a reference surface, and a correction element which includes a heating material and is arranged in a plane that is at least substantially optically conjugate to the reference surface such that the correction light and the projection light pass through at least one lens contained in the projection objective before they impinge on the correction element. All lenses through which both the correction light and the projection light pass are made of a lens material which has a lower coefficient of absorption for the correction light than the heating material contained in the correction element. | 09-16-2010 |
| 20100265478 | PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE INSTALLATION - A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation. | 10-21-2010 |
| 20110019169 | PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens. | 01-27-2011 |
| 20110080569 | OPTICAL ELEMENT AND METHOD - The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods. | 04-07-2011 |
Asimuddin Kazi, Naperville, IL US
| Patent application number | Description | Published |
|---|---|---|
| 20110107026 | CONCURRENT SET STORAGE IN DISTRIBUTED STORAGE NETWORK - For each original data segment, a distributed storage processing unit generates encoded slices designed to prevent the original data segment from being reconstructed using fewer than a threshold number of encoded slices. Multiple encoded slices are generated for each of two different data segments, and the slices associated with the first and second data segment are stored substantially concurrently in different storage sets employing different distributed storage units. Encoded slices for even and odd data segments can be stored in different storage sets, or longer sequences of data segments can be stored in alternating storage sets. Storage sets can also be determined by the vault generation of a particular data segment. | 05-05-2011 |
Iqbal Kazi, Hertfordshire GB
| Patent application number | Description | Published |
|---|---|---|
| 20110061930 | JUNCTION BOX - A junction box, comprising a multi-layer circuit board, wherein the circuit board ( | 03-17-2011 |
M. Shahjahan Kazi, Kendall Park, NJ US
| Patent application number | Description | Published |
|---|---|---|
| 20100186375 | Layered Diesel Oxidation Catalyst Composites - Provided are diesel exhaust components where palladium is segregated from a molecular sieve, specifically a zeolite, in a catalytic material. In the catalytic material, therefore, there are at least two layers: a palladium-containing layer that is substantially free of a molecular sieve and a hydrocarbon trap layer that comprises at least one molecular sieve and is substantially free of palladium. The palladium is provided on a high surface area, porous refractory metal oxide support. The catalytic material can further comprise a platinum component, where a minor amount of the platinum component is in the hydrocarbon trap layer, and a majority amount of the platinum component is in the palladium-containing layer. Systems and methods of using the same are also provided. | 07-29-2010 |
Suhail H. Kazi, Karnataka IN
| Patent application number | Description | Published |
|---|---|---|
| 20080288598 | METHOD TO MANAGE DISK USAGE BASED ON USER SPECIFIED CONDITIONS - A method, system, and computer program product are provided for managing email disk usage based on user specified conditions. An incoming email for a user is scanned for email expressions. A determination is made as to whether one of the email expressions matches one of a number of listed expressions forming a matched expression. Responsive to a presence of a matched expression, a determination is made as to whether a first threshold associated with the matched expression is met or exceeded. Responsive to the first threshold being met or exceeded, a notification is sent to the user of the first threshold being met. | 11-20-2008 |
Tauseef Kazi, San Diego, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100114551 | SYSTEMS AND METHODS FOR IMPROVING DIGITAL SYSTEM SIMULATION SPEED BY CLOCK PHASE GATING - An apparatus for simulating digital systems is described. The apparatus includes a processor and memory in electronic communication with the processor. Instructions that are executable by the processor are stored in the memory. A simulation tool is started. The simulation tool is capable of simulating a plurality of components. A clock phase is adjusted to be turned off for at least one of the components. A digital system is simulated that includes the at least one component. The simulation does not simulate the clock phase for the at least one component. | 05-06-2010 |
| 20100114552 | METHODS AND APPARATUS FOR CLOCK SIMULATION WITH CALIBRATION - A method for clock modeling in a simulation tool is described. An internal time (I) may be defined that governs the simulator tool's clock period. An external time (E) may be defined. The internal time may have a smaller resolution than the external time. A calibration period (C) may be defined for the clock. The calibration period may be smaller than 0.5E and greater than I. The largest inaccuracy of any clock edge may be monitored, and the clock may be calibrated if the largest inaccuracy is greater than (C−1). | 05-06-2010 |