Patent application number | Description | Published |
20090253881 | POLYMERIZABLE COMPOUND FOR PHOTORESIST, POLYMER THEREOF, AND PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER - The present invention provides a polymerizable compound having an alicyclic structure and a polymerizable group and represented by the general formula (1) or (19). The polymerizable compound exhibits high adhesion to substrates, reduced swelling during development, a reduced amount of water absorption during exposure in water, and high dry-etching resistance. Also provided are a polymer of such a polymerizable compound, a process for producing the same and a photoresist composition containing the polymer. | 10-08-2009 |
20100022730 | POLYMERIZABLE COMPOUND HAVING ADAMANTANE STRUCTURE, PROCESS FOR PRODUCTION OF THE SAME, AND RESIN COMPOSITION - A polymerizable compound having a fluorinated substituent (Z) represented by the general formula (1), an adamantane structure and a polymerizable group (A) having the structure represented by the general formula (1), a production method thereof, and a photoresist composition, a thermocurable resin composition and a photocurable resin composition containing a polymer obtained using the polymerizable compound are provided. Use of the polymerizable compound with the adamantane structure and a resin composition thereof in the present invention provides in the field of photolithography the effect of preventing a liquid immersion medium from penetration and improving dry etching resistance in a liquid immersion exposure method as well as reducing adhesion to a mold and improving dry etching resistance in a nanoimprint method. | 01-28-2010 |
20100048757 | ADAMANTANE DERIVATIVE, PROCESS FOR PRODUCTION THEREOF, RESIN COMPOSITION, AND CURED PRODUCT OF THE RESIN COMPOSITION - Disclosed herein is an adamantane derivative represented by the following general formula (I): | 02-25-2010 |
20100056663 | ADAMANTANE DERIVATIVE, METHOD FOR PRODUCING THE SAME, AND RESIN COMPOSITION CONTAINING ADAMANTANE DERIVATIVE - The present invention is an adamantane derivative which provides optical characteristics such as transparency, (long term) light resistance and the like, long term heat resistance, electric characteristics such as dielectric constant and the like, and good mechanical properties; a production method thereof; and a resin composition containing the above-mentioned adamantane derivative that is an adamantane derivative represented by general formulae (I) to (III); for example, a production method of an adamantane derivative represented by the general formula (III) by reacting an adamantane derivative represented by the general formula (II) with acrylates, a resin composition containing an adamantane derivative represented by the general formula (II) and an epoxy resin curing agent, and a resin composition containing an adamantane derivative represented by the general formula (III) and a thermopolymerization initiator or a photopolymerization initiator. | 03-04-2010 |
20100093947 | ADAMANTANE DERIVATIVE, METHOD FOR PRODUCING THE SAME, RESIN COMPOSITION CONTAINING THE ADAMANTANE DERIVATIVE AND USE THEREOF - Provided are: an adamantane derivative represented by the following general formula (I) giving a cured product excellent in optical characteristics such as transparency and light resistance, durabilities such as heat resistance, and electrical characteristics such as dielectric constant; a method of producing the adamantane derivative; a resin composition containing the adamantane derivative and an epoxy resin curing agent; and a sealing agent for an optical semiconductor using the resin composition: | 04-15-2010 |
20100130712 | ADAMANTANE DERIVATIVE, RESIN COMPOSITION USING THE SAME, AND RESIN CURED PRODUCT - Provided is a cured resin of an adamantane derivative having a specific structure, which has excellent optical properties such as transparency and (long-term) light stability, long-term heat resistance, dielectric constant, and mechanical properties, and which can be utilized suitably in the field of electronic and optical materials. | 05-27-2010 |
20100266954 | ADAMANTANE DERIVATIVE, METHOD FOR PRODUCING THE SAME, AND CURING COMPOSITION CONTAINING ADAMANTANE DERIVATIVE - An adamantane derivative capable of affording a cured product which is excellent in optical characteristics such as transparency and light resistance, durability such as long-term heat resistance, and electrical characteristics such as dielectric constant, a process for producing such an adamantane derivative, and a curable composition containing such an adamantane derivative, the adamantane derivative being represented by the general formula (I) shown below and having a group selected from an acrylate group, a methacrylate group and a trifluoromethacrylate group, | 10-21-2010 |
20110009661 | COMPOUND HAVING ALICYCLIC STRUCTURE, (METH)ACRYLIC ACID ESTER, AND PROCESS FOR PRODUCTION OF THE (METH)ACRYLIC ACID ESTER - Provided are an alicyclic structure-containing compound, a (meth)acrylate, and a method for producing the ester. The compound and the ester are useful as a monomer and the like for a photoresist used in semiconductor manufacturing and excellent in solubility, compatibility, defect reduction, roughness improvement, and the like, realized by using an alicyclic structure-containing compound containing a linking group having an ester bond and/or a linking group having an ether bond, a (meth)acrylate derived from the alicyclic structure-containing compound, and a method for producing the ester. | 01-13-2011 |
20130023693 | COMPOUND HAVING ALICYCLIC STRUCTURE, (METH)ACRYLIC ACID ESTER, AND PROCESS FOR PRODUCTION OF THE (METH)ACRYLIC ACID ESTER - Provided are an alicyclic structure-containing compound, a (meth)acrylate, and a method for producing the ester. The compound and the ester are useful as a monomer and the like for a photoresist used in semiconductor manufacturing and excellent in solubility, compatibility, defect reduction, roughness improvement, and the like, realized by using an alicyclic structure-containing compound containing a linking group having an ester bond and/or a linking group having an ether bond, a (meth)acrylate derived from the alicyclic structure-containing compound, and a method for producing the ester. | 01-24-2013 |
20130030212 | COMPOUND HAVING ALICYCLIC STRUCTURE, (METH)ACRYLIC ACID ESTER, AND PROCESS FOR PRODUCTION OF THE (METH)ACRYLIC ACID ESTER - Provided are an alicyclic structure-containing compound, a (meth)acrylate, and a method for producing the ester. The compound and the ester are useful as a monomer and the like for a photoresist used in semiconductor manufacturing and excellent in solubility, compatibility, defect reduction, roughness improvement, and the like, realized by using an alicyclic structure-containing compound containing a linking group having an ester bond and/or a linking group having an ether bond, a (meth)acrylate derived from the alicyclic structure-containing compound, and a method for producing the ester. | 01-31-2013 |