Patent application number | Description | Published |
20090317662 | MAGNETIC RECORDING MEDIUM AND METHOD OF MANUFACTURING THE SAME - A magnetic recording medium has magnetic patterns formed of a patterned ferromagnetic layer, and a non-magnetic layer including a component of the ferromagnetic layer and separating the magnetic patterns, in which a thickness “a” of the non-magnetic layer and a thickness “b” of the magnetic patterns satisfy a relationship of: a12-24-2009 | |
20100000965 | METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM - According to one embodiment, a method of manufacturing a magnetic recording medium includes depositing a magnetic recording layer on a substrate, forming masks on areas corresponding to recording regions of the magnetic recording layer, partially etching the magnetic recording layer in areas not covered with the masks with an etching gas to form protrusions and recesses on the magnetic recording layer, modifying the magnetic recording layer remaining in the recesses with a modifying gas to form non-recording regions, and forming a protecting film on an entire surface. | 01-07-2010 |
20100000966 | METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM - According to one embodiment, a method of manufacturing a magnetic recording medium includes depositing a magnetic recording layer on a substrate, forming masks on areas corresponding to recording regions of the magnetic recording layer, partially etching the magnetic recording layer in areas not covered with the masks with an etching gas to form protrusions and recesses on the magnetic recording layer, modifying the magnetic recording layer remaining in the recesses with Ne gas to form non-recording regions, and forming a protecting film on an entire surface. | 01-07-2010 |
20100006537 | METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM - According to one embodiment, a method of manufacturing a magnetic recording medium includes depositing a magnetic recording layer on a substrate, the magnetic recording layer having a multi-layered structure of two or more layers at least one layer of which has a granular structure including CoCrPt alloy and SiO | 01-14-2010 |
20100018946 | METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM - According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a hard mask and a resist on a magnetic recording layer, imprinting a stamper on the resist to transfer patterns of protrusions and recesses, removing resist residues left in the recesses of the patterned resist, etching the hard mask using the patterned resist as a mask to transfer the patterns of protrusions and recesses, stripping the resist, and performing ion beam etching to remove the remaining hard mask and to modify a surface of the magnetic recording layer uncovered with the remaining hard mask. | 01-28-2010 |
20100018947 | METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM - According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a magnetic recording layer, an oxidation inhibiting layer, a hard mask layer includes carbon on a substrate, coating the hard mask layer with a resist, transferring patterns of protrusions and recesses to the resist by imprinting to form resist patterns, sequentially performing etching of the hard mask layer using the resist patterns as masks, etching of the oxidation inhibiting layer, and etching and/or magnetism deactivation of the magnetic recording layer to form patterns of the magnetic recording layer, and sequentially performing stripping of the resist patterns, stripping of the hard mask layer and stripping of the oxidation inhibiting layer, in which ion beam etching is used for stripping the oxidation inhibiting layer. | 01-28-2010 |
20100047625 | METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM AND MAGNETIC RECORDING MEDIUM - According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses, and partially etching the magnetic recording layer in areas not covered with patterns of the resist used as masks by ion beam etching using a mixed gas of He and N | 02-25-2010 |
20100147791 | METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM - According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist film on a magnetic recording layer, imprinting a stamper on the resist film to transfer patterns of recesses and protrusions, removing residues remained in recess of the patterned resist film, etching the second hard mask using the patterned resist film as a mask to transfer patterns of recesses and protrusions, etching the first hard mask using the patterned second hard mask as a mask to transfer patterns of recesses and protrusions, and deactivating magnetism of the magnetic recording layer exposed in the recesses together with removing the second hard mask by ion-beam etching. | 06-17-2010 |
20100214694 | METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM - According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist, etching the second hard mask by using the patterned resist as a mask to transfer the patterns of protrusions and recesses to the second hard mask, etching the first hard mask by using the second hard mask as a mask to transfer the patterns of protrusions and recesses to the first hard mask, removing the second hard mask remaining on the protrusions of the first hard mask, and deactivating the magnetic recording layer exposed in the recesses by means of ion beam irradiation. | 08-26-2010 |
20100214695 | METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM - According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist by means of a first etching gas, etching the second hard mask by means of the first etching gas using the patterned resist as a mask to transfer the patterns to the second hard mask, etching the first hard mask by means of a second etching gas different from the first etching gas using the second hard mask as a mask to transfer the patterns to the first hard mask, and performing ion beam etching in order to deactivate the magnetic recording layer exposed in the recesses and to remove the second hard mask. | 08-26-2010 |
20100215989 | METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM - According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist, etching the second hard mask by using the patterned resist as a mask to transfer the patterns of protrusions and recesses to the second hard mask, etching the first hard mask by using the second hard mask as a mask to transfer the patterns of protrusions and recesses to the first hard mask, subjecting the magnetic recording layer exposed in the recesses to modifying treatment to change an etching rate, and deactivating the magnetic recording layer exposed in the recesses. | 08-26-2010 |
20110014496 | METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM - According to one embodiment, there is provided a method of manufacturing a magnetic recording medium, including forming a first hard mask including carbon as a main component, a second hard mask including a main component other than carbon and a resist on a magnetic recording layer, contacting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues in the recesses of the patterned resist, etching the second hard mask, etching the first hard mask, patterning the magnetic recording layer, and removing the first hard mask, the method further including, between etching the first hard mask and removing the first hard mask, removing the second hard mask remaining on the protrusions of the first hard mask, and removing a contaminating layer on a surface of the first hard mask by a mixed gas of oxygen-based gas and a fluorine compound. | 01-20-2011 |