Patent application number | Description | Published |
20110081612 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH - According to one embodiment, an actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin containing the repeating units of formulae (I), (II) and (III) that when acted on by an acid, becomes soluble in an alkali developer, and (B) a compound that when irradiated with actinic rays or radiation, generates a fluorine-containing acid, | 04-07-2011 |
20120244472 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, FILM FORMED USING THE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME - Provided is an actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a specific compound represented by a general formula, (B) a resin which is alkali-insoluble or sparingly alkali-soluble and becomes easily alkali-soluble in the presence of an acid, and (C) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a film formed using the composition; and a pattern forming method using the same. | 09-27-2012 |
20130011785 | PATTERN FORMING METHOD AND RESIST COMPOSITION - Provided is a method of forming a pattern, ensuring excellent exposure latitude (EL) and focus latitude (depth of focus DOF). The method of forming a pattern includes (A) forming a film from a resist composition, the resist composition, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent, thereby forming a negative pattern. The resist composition contains (a) a resin that is configured to decompose when acted on by an acid and ΔSP thereof represented by formula (1) below is 2.5 (MPa) | 01-10-2013 |
Patent application number | Description | Published |
20120003586 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME AND PATTERN FORMING METHOD - Provided are an actinic ray-sensitive or radiation-sensitive resin composition; a resist film using the composition; and a pattern forming method. The actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing a repeating unit represented by formula (I), a repeating unit represented by formula (II) and a repeating unit represented by formula (III), and (B) a compound capable of generating a fluorine atom-containing acid upon irradiation with an actinic ray or radiation: | 01-05-2012 |
20120003591 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD - Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer. | 01-05-2012 |
20120094237 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME - An actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin that contains a repeating unit represented by formula (I) as defined in the specification, a repeating unit represented by formula (II) as defined in the specification and a repeating unit represented by formula (III-a) or (III-b) as defined in the specification; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a solvent, wherein the solvent (C) contains ethyl lactate, and a film and a pattern forming method using the composition are provided. | 04-19-2012 |
20120219758 | RESIST COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING NEGATIVE PATTERN USING THE COMPOSITION - Provided is a resist composition including a resin (A) containing any of repeating units (a) of general formulae (RI-a) and (RI-b) below, any of repeating units (b) of general formula (R2) below, any of repeating units (c) of general formula (R3) below and a repeating unit (d) being different from the repeating units (c) and containing a group that when acted on by an acid, is decomposed, a compound (B) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid, and any of compounds (C) of general formula (PDA-1) below. | 08-30-2012 |
20120219891 | RESIST COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING NEGATIVE PATTERN USING THE COMPOSITION - Provided is a resist composition including a resin (A) containing any of repeating units (a) of general formulae (I-a) and (I-b) below and any of repeating units (b) of general formula (II) below but containing substantially no repeating unit in which an alcoholic hydroxyl group is introduced, and any of compounds (B) of general formulae (III-a) and (III-b) below. | 08-30-2012 |
20120231393 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING A PATTERN USING THE SAME - According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin that is decomposed when acted on by an acid to thereby increase its solubility in an alkali developer, a compound that generates an acid when exposed to actinic rays or radiation, and any of basic compounds of general formula (1) below. | 09-13-2012 |
20120301831 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME - An actinic ray-sensitive or radiation-sensitive resin composition, and a resist film and a pattern forming method using the composition are provided, the composition including (A) a compound capable of decomposing by the action of an acid to increase the solubility of the resin (A) in an alkali developer; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a basic compound; and (D) a specific compound containing at least two specific alicyclic hydrocarbon groups each substituted with a hydroxyl group. | 11-29-2012 |
20120321855 | PATTERN FORMING METHOD AND RESIST COMPOSITION - Provided is a method of forming a pattern, ensuring excellent sensitivity, limiting resolving power, roughness characteristic, exposure latitude (EL), dependence on post-exposure bake (PEB) temperature and focus latitude (depth of focus DOF), and a resist composition for use in the method. The method comprises (A) forming a film from a resist composition comprising a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, which resin thus when acted on by an acid decreases its solubility in a developer containing an organic solvent, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent. | 12-20-2012 |
20130011619 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM - A pattern forming method comprising (i) a step of forming a film from a chemical amplification resist composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the resist composition contains (A) a resin capable of increasing the polarity to decrease the solubility for an organic solvent-containing developer by the action of an acid, (B) at least one kind of a compound capable of generating a sulfonic acid represented by the specific formula upon irradiation with an actinic ray or radiation, and (C) a solvent. | 01-10-2013 |
20130017377 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAMEAANM Kataoka; ShoheiAACI ShizuokaAACO JPAAGP Kataoka; Shohei Shizuoka JPAANM Iwato; KaoruAACI ShizuokaAACO JPAAGP Iwato; Kaoru Shizuoka JPAANM Kamimura; SouAACI ShizuokaAACO JPAAGP Kamimura; Sou Shizuoka JPAANM Tsuchihashi; ToruAACI ShizuokaAACO JPAAGP Tsuchihashi; Toru Shizuoka JPAANM Enomoto; YuichiroAACI ShizuokaAACO JPAAGP Enomoto; Yuichiro Shizuoka JPAANM Fujii; KanaAACI ShizuokaAACO JPAAGP Fujii; Kana Shizuoka JPAANM Mizutani; KazuyoshiAACI ShizuokaAACO JPAAGP Mizutani; Kazuyoshi Shizuoka JPAANM Tarutani; ShinjiAACI ShizuokaAACO JPAAGP Tarutani; Shinji Shizuoka JPAANM Kato; KeitaAACI ShizuokaAACO JPAAGP Kato; Keita Shizuoka JP - Provided is an actinic-ray- or radiation-sensitive resin composition and a method of forming a pattern using the same, ensuring excellent the etching resistivity and the stability during a post-exposure delay (PED) period. The composition contains a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, and a compound that generates an acid of pKa≧1.5 when exposed to actinic rays or radiation. | 01-17-2013 |
20130113082 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD - Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, (c) developing the exposed film with a developer containing an organic solvent, and (d) rinsing the developed film with a rinse liquid containing an organic solvent, which rinse liquid has a specific gravity larger than that of the developer. | 05-09-2013 |
20130122427 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM - A pattern forming, method, includes: (i) forming a film from an actinic ray-sensitive or radiation-sensitive resin composition that contains (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and decomposing by an action of an acid to decrease a solubility of the compound (A) for an organic solvent; (ii) exposing the film; and (iii) performing development by using a developer containing an organic solvent. | 05-16-2013 |
20130266777 | NEGATIVE PATTERN FORMING METHOD AND RESIST PATTERN - A negative pattern forming method, includes: (i) forming a film having a film thickness of 200 nm or more from a chemical amplification resist composition containing (A) a resin capable of increasing a polarity of the resin (A) by an action of an acid to decrease a solubility of the resin (A) for a developer containing one or more organic solvents, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a solvent; (ii) exposing the film, so as to form an exposed film; and (iii) developing the exposed film with a developer containing one or more organic solvents. | 10-10-2013 |
20150293454 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD - Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer. | 10-15-2015 |
Patent application number | Description | Published |
20100248128 | LIQUID DEVELOPER AND IMAGE FORMING METHOD - Provided is a liquid developer containing toner particles and an insulating liquid containing a hydrogen modified silicon compound. | 09-30-2010 |
20110045400 | LIQUID DEVELOPER AND IMAGE-FORMING APPARATUS - A liquid developer contains toner, a carrier liquid in which the toner are dispersed, and a graft copolymer of an acrylic polymer and a polysiloxane. | 02-24-2011 |
20130135382 | INK SET AND IMAGE FORMING METHOD - An ink set includes a white ink jet pigment ink and a non-white ink jet pigment ink containing a diene copolymer. | 05-30-2013 |
20130253106 | INK COMPOSITION FOR INK JET TEXTILE PRINTING - There is provided an ink composition for ink jet textile printing, the ink composition containing a pigment, a urethane resin emulsion, an emulsion-type silicone compound, and water, wherein the urethane resin emulsion content is 3.5 to 14 mass % relative to the total mass of the ink composition, the emulsion-type silicone compound content is in the range of 0.4 to 3.0 mass % relative to the total mass of the ink composition, and the water content is in the range of 20 to 80 mass % relative to the total mass of the ink composition. | 09-26-2013 |
Patent application number | Description | Published |
20120075485 | PROGRAM OF MOBILE DEVICE, MOBILE DEVICE, AND METHOD FOR CONTROLLING MOBILE DEVICE - A computer-readable recording device may store a computer program including instructions for causing a computer of a mobile device to operate as: (1) an image specifying module that specifies a plurality of partial images corresponding to a plurality of candidate devices within a taken image that is displayed by a display unit provided in the mobile device, and (2) a communication controlling module that controls a communication unit configured to communicate using a wireless network such that the communication unit communicates with a candidate device corresponding to the partial image, in a case where an operation unit configured to receive an operation on the mobile device by a user receives a selection of the partial image. | 03-29-2012 |
20120084637 | IMAGE PROCESSING APPARATUS, IMAGE PROCESSING METHOD, AND STORAGE MEDIUM STORING IMAGE PROCESSING PROGRAM - An image processing apparatus including: a display portion which displays a web page based on web page data; a specifying section which specifies, as a specific area, an area in the displayed web page; an object obtaining section which obtains an object included in the specified specific area; a relevant-information obtaining section which obtains relevant information associated with the obtained object; a map-image-data obtaining section which obtains map image data for displaying a map image, on the basis of a specific position which is a position on the map image, which indicates a position of the object specified by the obtained relevant information; and an output section which outputs obtained the object, the obtained relevant information, and the map image to be displayed based on the obtained map image data, to the display screen such that a position mark indicating the object is marked on the specific position on the map image. | 04-05-2012 |
Patent application number | Description | Published |
20150086412 | HEAT-RESISTANT, AUSTENITIC CAST STEEL HAVING EXCELLENT MACHINABILITY AND EXHAUST MEMBER MADE THEREOF - A heat-resistant, austenitic cast steel having excellent machinability comprising by mass 0.4-0.55% of C, 1-2% of Si, 0.5-1.5% of Mn, 18-27% of Cr, 8-22% of Ni, 1.5-2.5% of Nb, 0.01-0.3% of N, 0.1-0.2% of S, and 0.02-0.15% of Al, the balance being Fe and inevitable impurities, a machinability index I represented by the following formula: I=100×S+75×Al+0.75×Mn−10×C−2×Nb−0.25×Cr−0.15×Ni−1.2×N, wherein each element symbol represents % by mass of each element in the cast steel, meeting the condition of −3.0≦I≦+14.0, and an exhaust member made thereof. | 03-26-2015 |
20150275344 | HEAT-RESISTANT, CAST FERRITIC STEEL HAVING EXCELLENT MACHINABILITY AND EXHAUST MEMBER MADE THEREOF - A heat-resistant, cast ferritic steel having excellent machinability comprising by mass 0.32-0.48% of C, 0.85% or less of Si, 0.1-2% of Mn, 1.5% or less of Ni, 16-23% of Cr, 3.2-5% of Nb, Nb/C being 9-11.5, 0.15% or less of N, 0.05-0.2% of S, and 0.01-0.08% of Al, the balance being Fe and inevitable impurities, and an exhaust member made thereof. | 10-01-2015 |
Patent application number | Description | Published |
20150320647 | SOLID POWDERY COSMETIC COMPOSITION - The present invention relates to a cosmetic composition, comprising:—an oil phase in an amount of 20% by weight or more, preferably from 25% to 50% by weight, and more preferably from 28% to 45% by weight, relative to the total weight of the composition, said oil phase including preferably at least one non-volatile oil, more preferably at least one non-volatile hydrocarbon-based oil and/or at least one non-volatile silicone oil, —a pulverulent phase in an amount of 40% by weight or more, preferably from 50% to 75% by weight, and more preferably from 55% to 70% by weight, relative to the total weight of the composition, —at least one hydrophobic film-forming polymer, —the cosmetic composition is obtainable, and preferably obtained, by a process comprising the steps of: —mixing said oil phase, said hydrophobic film-forming polymer(s), said pulverulent phase, and at least one additional solvent to prepare a slurry; and —shaping said slurry in a container by compression and/or aspiration to prepare the cosmetic composition. | 11-12-2015 |
Patent application number | Description | Published |
20110083743 | PHOTOELECTRIC CONVERSION DEVICE, METHOD FOR PRODUCING THE SAME, AND SOLAR BATTERY - A photoelectric conversion device includes a photoelectric conversion layer which mainly composed of a compound semiconductor containing a group Ib element, at least two group IIIb elements including Ga, and a group VIb element and contains an alkaline(-earth) metal. Concentration distributions of the alkaline(-earth) metal and Ga in the photoelectric conversion layer in the thickness direction includes a valley with the lowest concentration and an area with a higher concentration between the substrate and the valley, and satisfy Expressions (1) and (2) below: | 04-14-2011 |
20120180870 | PHOTOELECTRIC CONVERSION DEVICE, METHOD FOR PRODUCING THE SAME, AND SOLAR BATTERY - A photoelectric conversion device includes a layered structure formed on a substrate including a first electrode, a photoelectric conversion semiconductor layer and a second electrode, the photoelectric conversion semiconductor layer being mainly composed of a compound semiconductor containing group Ib, group IIIb and group VIb elements, and containing an alkaline(-earth) metal, wherein the alkaline(-earth) metal concentration distribution in the photoelectric conversion layer in the thickness direction includes a valley with the lowest alkaline(-earth) metal concentration and an area with an alkaline(-earth) metal concentration higher than that at the valley, the area being nearer to the substrate from the valley, and wherein Expressions (1) and (2) below are satisfied: | 07-19-2012 |
Patent application number | Description | Published |
20090263653 | OPTICAL LAMINATES, POLARIZING PLATES AND IMAGE DISPLAY DEVICES - The invention provides an optical laminate comprising an optically transparent base and a silica particle-containing antiglare layer, wherein the silica particles have a dielectric constant of less than 4.0, which optical laminate is provided with excellent optical characteristics and with suitable aggregation of silica particles even when silica particles are present in the antiglare layer. | 10-22-2009 |
20120301609 | OPTICAL LAMINATES, POLARIZING PLATES AND IMAGE DISPLAY DEVICES - The invention provides an optical laminate comprising an optically transparent base and a silica particle-containing antiglare layer, wherein the silica particles have a dielectric constant of less than 4.0, which optical laminate is provided with excellent optical characteristics and with suitable aggregation of silica particles even when silica particles are present in the antiglare layer. | 11-29-2012 |
20130201556 | OPTICAL LAYERED, POLARIZER, AND IMAGE DISPLAY DEVICE - The present invention provides an optical layered body having excellent hardness, abrasion resistance, and flexibility. | 08-08-2013 |
20130222906 | OPTICAL LAYERED BODY, POLARIZER, AND IMAGE DISPLAY DEVICE - Provided is an optical layered body having excellent blocking resistance. The optical layered body includes a triacetyl cellulose substrate and a hard coat layer, the hard coat layer having fine surface roughness that has an average PV roughness Rtm of 2.2 to 11.5 nm, a base roughness depth R3 | 08-29-2013 |
20130295390 | HARD COAT FILM, POLARIZER AND IMAGE DISPLAY DEVICE - Provided is a hard coat film having high hardness and excellent restorability in view of the above circumstances. A hard coat film comprising: a light-transmitting substrate; and a hard coat layer, the hard coat layer comprising a cured product of a composition for a hard coat layer, the composition including an isocyanuric skeleton-containing urethane(meth)acrylate. | 11-07-2013 |
Patent application number | Description | Published |
20100104858 | HARD COAT FILM AND CURABLE RESIN COMPOSITION FOR HARD COAT LAYER - A curable resin composition for a hard coat layer capable of forming a hard coat layer having high hardness even with thin thickness and/or excellent in abrasion resistance and hardness, and a hard coat film using the curable resin composition are provided. A hard coat film in which a hard coat layer is provided on one side of a transparent substrate film, wherein the hard coat layer comprises a matrix in a crosslinked state and an aggregate in which 3 to 100 silica fine particles having an average primary particle diameter of 1 to 100 nm are aggregated, and wherein the aggregate is cross-linked to the matrix, and an irregularly shaped silica fine particle constituted with 3 to 20 silica fine particles having an average primary particle diameter of 1 to 100 nm connected to each other by inorganic chemical bonding is contained as a part of the aggregates. The hard coat layer further contains a silica fine particle preferably. | 04-29-2010 |
20100124631 | OPTICAL SHEET AND METHOD FOR PRODUCING THE SAME - The main object of the present invention is to provide an optical sheet having excellent abrasion resistance and hardness, and a method for producing the same. The present invention provides an optical sheet in which a hard coat layer is provided on one surface of a substrate, wherein the hard coat layer comprises a cured product of a curable resin composition for a hard coat layer, which comprises reactive inorganic fine particles and a binder component, and wherein fine protrusions are provided on an interface on the side opposite to the substrate side of the hard coat layer, in which the minimum angle of each of the fine protrusions making angles with a virtual plane that is parallel to the hard coat layer is an acute angle. The present invention also provides a method for producing the optical sheet, comprising the steps of: forming a coating by applying a curable resin composition for a hard coat layer to one surface of a substrate, which composition comprising reactive, irregularly shaped silica fine particles and a binder component, and forming a hard coat layer and fine protrusions by curing the coating while or after preventing that the long axes of the reactive, irregularly shaped silica fine particles are each oriented in a direction planar to a virtual plane. | 05-20-2010 |
20100124656 | OPTICAL SHEET AND METHOD FOR PRODUCING THE SAME - The present invention is to provide an optical sheet having excellent abrasion resistance and hardness, and a method for producing the same. The object of the present invention was accomplished by an optical sheet in which a hard coat layer is provided on one surface of a substrate, wherein the hard coat layer comprises a cured product of a curable resin composition for a hard coat layer, which composition comprising reactive, irregularly shaped silica fine particles and a binder component, and wherein at least part of the irregularly shaped silica fine particles have a specific three-dimensional configuration and are present on an interface on the side opposite to the substrate side of the hard coat layer. The object of the present invention was also accomplished by a method for producing the optical sheet, comprising the steps of: forming a coating by applying a curable resin composition for a hard coat layer comprising reactive, irregularly shaped silica fine particles and a binder component onto one surface of a substrate, and forming a hard coat layer by curing the coating with or after preventing that the long axes of the reactive, irregularly shaped silica fine particles are each oriented in a direction planar to a virtual plane. | 05-20-2010 |
Patent application number | Description | Published |
20090024531 | IMAGE FORMATION APPARATUS CAPABLE OF PERSONAL AUTHENTICATION, CONTROL METHOD OF IMAGE FORMATION APPARATUS, AND COMPUTER READABLE MEDIUM HAVING SOFTWARE PROGRAM STORED THEREIN - A general user given beforehand a proxy right by an administrator is allowed to register a special user having the right to use an apparatus in a range of the function right equal to that of himself by operating a special user setting window. | 01-22-2009 |
20090316189 | IMAGE FORMING APPARATUS, JOB EXECUTION SYSTEM, AND JOB EXECUTION METHOD - An image forming apparatus includes: a receiving portion that receives an authentication print job sent by a user; a comparison portion that compares identification information received through the user's input with identification information included in image data; a job execution portion that executes the authentication print job in the case where the comparison between the received identification information and the identification information included in the image data has succeeded; and a password storage portion that stores identification information in the case where the authentication print job is in the process of being received in order to enable the comparison made by the comparison portion with respect to the authentication print job that is being received. | 12-24-2009 |
20100241648 | IMAGE PROCESSING APPARATUS - An image processing apparatus which executes a predetermined image processing using a data file stored in a data storage device. The image processing apparatus includes: an external interface unit that detachably connects with the data storage device; an input unit that accepts a setting input for a setup item relating to the predetermined image processing; a setting input detection unit that detects the setting input inputted through the input unit; a search condition generating unit that generates a search condition based on a setting value that is set for the setup item relating to the predetermined image processing, when the setting input detection unit has detected the setting input; an execution instructing unit that instructs a search unit to execute a data file search when the setting input detection unit has detected the setting input; the search unit that, in accordance with the instructions from the execution instructing unit, executes a data file search for a data file stored in the data storage device to output a search result based on the search condition that is generated by the search condition generating unit; and a display unit that displays the search result of the data file search. | 09-23-2010 |
20100241982 | USER INTERFACE DEVICE - A user interface device which displays an operation key in a display unit using a predetermined design. The device includes: a history storing unit that stores a history record in which a content of a setting operation carried out by a user for each of past jobs that have been executed is recorded; a history retrieving unit that retrieves the history record in which the content of the setting that is the same as a current content of the setting is recorded; a calculating unit that calculates a total number of operations for each operation key based on the content of the setting recorded in the history record in which the same content of setting is recorded; and an operation key display type determining unit that estimates relative degrees of likelihood to be used by the user of the operation keys based on the total number of operations for each operation key, and determines, based on the estimation, a design to be used to display the operation key out of a group of designs including at least a first design for normal display and a second design for highlighted display. | 09-23-2010 |
20100321717 | IMAGE FORMING APPARATUS AND METHOD FOR SWITCHING BETWEEN SECURITY MODES - An image forming apparatus is provided with a determination portion that, in response to operation for giving instructions to enhance a security level thereof, determines whether or not a job is kept which is not to satisfy security requirements after the enhancement, an execution portion that, if the determination portion determines that such a job is kept, performs predetermined processing for satisfying the security requirements on the job with execution of the job ensured, and a security mode switching portion that, if the determination portion determines that such a job is kept, enhances the security level after the execution portion finishes the predetermined processing, and, if the determination portion determines that such a job is not kept, enhances the security level promptly. | 12-23-2010 |
20110199632 | FACSIMILE DEVICE AND PROGRAM PRODUCT FOR FACSIMILE PRINTING - It is intended to provide a facsimile device and a program product for facsimile printing capable of surely making a user know receipt of an irregular e-mail such as an error mail or the like, without requiring extra volume of memory, while preventing waste of paper. When an e-mail is received, there is detected whether a printing mode is set or a not-printing mode is set for a body part of an e-mail in # | 08-18-2011 |
20150242170 | IMAGE FORMING APPARATUS, JOB EXECUTION SYSTEM, AND JOB EXECUTION METHOD - An image forming apparatus includes: a receiving portion that receives an authentication print job sent by a user; a comparison portion that compares identification information received through the user's input with identification information included in image data; a job execution portion that executes the authentication print job in the case where the comparison between the received identification information and the identification information included in the image data has succeeded; and a password storage portion that stores identification information in the case where the authentication print job is in the process of being received in order to enable the comparison made by the comparison portion with respect to the authentication print job that is being received. | 08-27-2015 |