Kadavanich
Andreas Kadavanich, Fremont, CA US
Patent application number | Description | Published |
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20120152901 | INDUCTIVELY COUPLED PLASMA SOURCE FOR PLASMA PROCESSING - Plasma processing apparatus and methods are disclosed. Embodiments of the present disclosure include a processing chamber having an interior space operable to receive a process gas, a substrate holder in the interior of the processing chamber operable to hold a substrate, and at least one dielectric window. A metal shield is disposed adjacent the dielectric window. The metal shield can have a peripheral portion and a central portion. The processing apparatus includes a primary inductive element disposed external to the processing chamber adjacent the peripheral portion of the metal shield. The processing apparatus can further include a secondary inductive element disposed between the central portion of the metal shield and the dielectric window. The primary and secondary inductive elements can perform different functions, can have different structural configurations, and can be operated at different frequencies. | 06-21-2012 |
20130196510 | SLOTTED ELECTROSTATIC SHIELD MODIFICATION FOR IMPROVED ETCH AND CVD PROCESS UNIFORMITY - A more uniform plasma process is implemented for treating a treatment object using an inductively coupled plasma source which produces an asymmetric plasma density pattern at the treatment surface using a slotted electrostatic shield having uniformly spaced-apart slots. The slotted electrostatic shield is modified in a way which compensates for the asymmetric plasma density pattern to provide a modified plasma density pattern at the treatment surface. A more uniform radial plasma process is described in which an electrostatic shield arrangement is configured to replace a given electrostatic shield in a way which provides for producing a modified radial variation characteristic across the treatment surface. The inductively coupled plasma source defines an axis of symmetry and the electrostatic shield arrangement is configured to include a shape that extends through a range of radii relative to the axis of symmetry. | 08-01-2013 |
Vikorn Kadavanich, Bayerisch Gmain DE
Patent application number | Description | Published |
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20090007768 | SYSTEM FOR PROTECTION IN PARTICULAR OF LARGE FLYING PLATFORMS AGAINST INFRARED AND/OR RADAR-GUIDED THREATS - A protection system ( | 01-08-2009 |
Vikorn Martin Kadavanich, Bayerisch Gmain DE
Patent application number | Description | Published |
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20120152141 | COMBUSTIBLE ACTIVE MASS CONTAINER - An active body ( | 06-21-2012 |
20120174812 | ACTIVE BODY - An active body ( | 07-12-2012 |