| Patent application number | Description | Published |
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| 20090258626 | FILTER CIRCUIT AND RECEIVING APPARATUS - A filter circuit includes first capacitors, second capacitors capable of altering a cutoff frequency by being connected in parallel with the first capacitors, first switches for connecting the second capacitors in parallel with the first capacitors, and charging circuits for the second capacitors. The charging circuits include second switches, and resistances for attenuating the amplitudes of input voltages to be fed to the second capacitors, by being connected in series with the second capacitors. The second capacitors are charged through the resistances in a state where the first switches are turned OFF and where the second switches are turned ON. Thus, a DC offset which is ascribable to the cutoff frequency switching of a filter is reduced. | 10-15-2009 |
| 20090310524 | RECEIVER AND RECEIVING METHOD OF THE RECEIVER - The receiver includes a low noise amplifier, a local signal generator, a first mixer, a second mixer, a first amplifier, a second amplifier, a first A/D converter, a second A/D converter, and a signal level detection unit. A detection signal from at least one terminal of the first A/D converter is supplied to an input terminal of the signal level detection unit, thereby generating a reception start signal from the output terminal. Before an RF reception signal is received, a first signal processing unit containing the first mixer, the first amplifier, and the first A/D converter is controlled to an active state, and a second signal processing unit containing the second mixer, the second amplifier, and the second A/D converter is controlled to a low power consumption state. After the RF reception signal is received, the second signal processing unit is controlled to the active state. | 12-17-2009 |
| 20110026507 | FILTER CIRCUIT AND RECEIVER USING THE SAME - Gain setting can be performed at high speed while reducing DC offset due to a filter cutoff frequency changeover without the need for input signal muting. A filter circuit having first and second filters is capable of allowing settings of first and second cutoff frequencies. First and second filter switch circuits and a charging circuit including a charging resistor and a charging switch are provided. For a first time period, the first switch circuit is controllably turned on while the second switch circuit is controllably turned off, thereby providing the first filter function. For a second time period, the first switch circuit is controllably turned off while the second switch circuit is controllably turned on, thereby providing the second filter function. For the first time period, the charging switch is controllably turned on so that the second capacitor is charged via the charging resistor. | 02-03-2011 |
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| 20080226053 | Voice communication terminal - When an outgoing call is to be requested on a terminal, the terminal transmits a first outgoing call request containing the priority of outgoing call operation. When the terminal transmits the first outgoing call request, and then receives a second outgoing call request addressed to the terminal before it receives an incoming call response with respect to the first outgoing call request from a destination terminal, the terminal compares the priority contained in the second outgoing call request with the priority contained in the first outgoing call request. The terminal executes an incoming call response procedure corresponding to the second outgoing call request when the priority in the second outgoing call request is higher as the result of comparison between the priorities of outgoing call operation, and executes a outgoing call control following the first outgoing call request when the priority in the first outgoing call request is higher. | 09-18-2008 |
| 20080232303 | IP mobile communication system and base station - When mobile communication exchange detects that SIP client has moved out of communication area of base station, the mobile communication exchange generates a BYE message, sends the generated BYE message to SIP client and ends a session. | 09-25-2008 |
| 20080232351 | IP communication system and IP telephone apparatus - During an incoming call, when a client apparatus of an incoming side notifies a client apparatus of an outgoing side of hold of the incoming call, the client apparatus notifies the client apparatus of the hold of the incoming call with OK message which is a response to an INVITE message. | 09-25-2008 |
| 20100329505 | IMAGE PROCESSING APPARATUS AND METHOD FOR PROCESSING IMAGE - An image processing apparatus includes: a storage module configured to store a plurality of pieces of comment data; an analyzing module configured to analyze an expression of a person contained in image data; a generating module configured to select a target comment data from among the comment data stored in the storage module based on the expression of the person analyzed by the analyzing module, and to generate voice data using the target comment data; and an output module configured to output reproduction data to be used for displaying the image data together with the voice data generated by the generating module. | 12-30-2010 |
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| 20090050020 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME - A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen ashing during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A), | 02-26-2009 |
| 20090098486 | COMPOSITION FOR FORMING LOWER LAYER FILM AND PATTERN FORMING METHOD - A composition for forming a lower layer film comprises a polymer (A) having a naphthalene derivative structural unit shown by the following formula (1), | 04-16-2009 |
| 20090174762 | MOBILE COMMUNICATION APPARATUS - While executing a videophone communication between two mobile communication apparatuses, one of the two mobile communication apparatuses requests the other mobile communication apparatus to change a transmission destination of video or audio data to a further communication apparatus. Responding to the request, the other mobile communication apparatus switches the transmission destination and source, which the video or audio data is to be transmitted to and received from, to the further communication apparatus designated in the request. | 07-09-2009 |
| 20100112475 | RESIN FOR FORMATION OF UPPER ANTIREFLECTIVE FILM, COMPOSITION FOR FORMATION OF UPPER ANTIREFLECTIVE FILM, AND RESIST PATTERN FORMATION METHOD - The objective of the present invention is to provide a resin for forming an upper antireflective film and a composition for forming an upper antireflective film that can reduce a standing wave effect satisfactorily and lead excellent solubility in an alkaline developer in lithography and a method for forming a resist pattern. Specifically, the resin for forming an upper antireflective film has at least one unit selected from a repeating unit represented by the formula (1) and a repeating unit represented by the formula (2), has a weight average molecular weight of 1,000 to 100,000 as measured by GPC method, and is soluble in an alkaline developer. (In the formulae (1) and (2), R | 05-06-2010 |
| 20100151384 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME - A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen asking during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A), | 06-17-2010 |
| 20100190104 | METHOD FOR PATTERN FORMATION AND RESIN COMPOSITION FOR USE IN THE METHOD - A pattern forming method includes (1) selectively exposing a first resist layer, and developing the exposed first resist layer to form a first pattern, (2) applying a resin composition containing a hydroxyl group-containing resin and a solvent to the first pattern, baking the applied resin composition, and developing the baked resin composition to form a second pattern, the hydroxyl group-containing resin becoming insoluble or scarcely soluble in a developer when baked, and (3) totally or selectively exposing the second pattern to make the second pattern partly soluble in the developer, and developing the exposed second pattern to form a third pattern in which at least a hole or a groove is formed in the second pattern. | 07-29-2010 |
