Patent application number | Description | Published |
20090286187 | MANUFACTURING METHOD OF OPTICAL WAVEGUIDE DEVICE - To provide a manufacturing method of an optical waveguide device which is capable of suppressing the surface roughening of core side surfaces of an optical waveguide when the optical waveguide is formed on a surface of a metal substrate. An under cladding layer | 11-19-2009 |
20100067849 | MANUFACTURING METHOD OF OPTICAL WAVEGUIDE DEVICE AND OPTICAL WAVEGUIDE DEVICE OBTAINED THEREBY - A manufacturing method of an optical waveguide device and an optical waveguide device obtained thereby. An under cladding layer is formed on the front surface of a colored-layer-coated PET substrate including a PET substrate portion and a colored layer of a color that absorbs irradiation light and formed on the back surface of the PET substrate portion, and then a photosensitive resin layer for the formation of cores is formed thereon. In forming the cores, when the irradiation light reaches the bottom surface of the PET substrate portion, most of the irradiation light is absorbed by the colored layer, so that there is little irradiation light reflected from the bottom surface of the PET substrate portion. This significantly reduces the irradiation light reflected diffusely from the PET substrate portion and reaching the photosensitive resin layer to thereby effectively suppress the surface roughening of the side surfaces of the cores. | 03-18-2010 |
20100068653 | MANUFACTURING METHOD OF OPTICAL WAVEGUIDE DEVICE - A manufacturing method of an optical waveguide device which is capable of suppressing the surface roughening of core side surfaces of an optical waveguide when the optical waveguide is formed on a roughened surface of a substrate. An under cladding layer is formed on a roughened surface of a substrate made of a material that absorbs irradiation light, and then a photosensitive resin layer for the formation of cores is formed thereon. Irradiation light is directed toward this photosensitive resin layer to expose the photosensitive resin layer in a predetermined pattern to the irradiation light. When the irradiation light transmitted through the photosensitive resin layer for the formation of the cores and the under cladding layer reaches the surface of the substrate, the irradiation light is absorbed by the substrate, so that there is little irradiation light reflected from the surface of the substrate. | 03-18-2010 |
20100092893 | METHOD OF MANUFACTURING OPTICAL WAVEGUIDE DEVICE - A method of manufacturing an optical waveguide device capable of suppressing the surface roughening of core side surfaces of an optical waveguide. Forming an under cladding layer on the front surface of a substrate; forming a photosensitive resin layer for core formation on a surface of the under cladding layer; wherein, in forming the cores, (A) irradiation light transmitted through the photosensitive resin layer, reaching the front surface of the substrate having an arithmetic mean roughness (Ra) in the range of 1 to 2 nm, or (B) irradiation light transmitted through the photosensitive resin layer and reflected from the bottom surface, where the front surface and back surface both have an arithmetic mean roughness (Ra) in the range of 1 to 2 nm. | 04-15-2010 |
20120077129 | PRODUCTION METHOD OF OPTICAL WAVEGUIDE FOR CONNECTOR - A production method of an optical waveguide for a connector is provided, which reduces an optical coupling loss. Cores are formed in a crossing pattern, a branched pattern or a linear pattern, and then an over-cladding layer formation photosensitive resin layer is formed over the cores. In turn, a heat treatment is performed at a temperature of 70° C. to 130° C. to properly form mixed layers in interfaces between the cores and the photosensitive resin layer. By thus forming the mixed layers, the connector optical waveguide can be produced as having a reduced optical coupling loss. | 03-29-2012 |
20120114294 | RESIN COMPOSITION FOR OPTICAL WAVEGUIDE, AND OPTICAL WAVEGUIDE PRODUCED BY USING THE RESIN COMPOSITION - A resin composition for an optical waveguide is provided, which permits easy formation of a core pattern using an alkali developing liquid and suppresses degradation of the alkali developing liquid. An optical waveguide produced by using the resin composition is provided. The resin composition comprises: (A) an alkali soluble resin, as a major component, having a structural unit represented by formula (1): | 05-10-2012 |
20120155819 | RESIN COMPOSITION FOR OPTICAL WAVEGUIDE, OPTICAL WAVEGUIDE PRODUCED BY USING THE RESIN COMPOSITION, AND PRODUCTION METHOD OF THE OPTICAL WAVEGUIDE - A resin composition for an optical waveguide is provided, which has excellent adhesiveness to a cladding layer of the optical waveguide and excellent patternability for formation of a core portion of the optical waveguide and reduces the optical waveguide loss. An optical waveguide produced by using the resin composition is also provided. The resin composition comprises: (A) a multifunctional partially-acrylated epoxy resin, as a major component, having an epoxy group and a (meth)acrylate group in the same main chain thereof; and (B) a photopolymerization initiator as a curing component. The optical waveguide includes: a substrate; a cladding layer provided on the substrate; and a core portion provided on the cladding layer for transmission of an optical signal; wherein the core portion is formed from the resin composition. | 06-21-2012 |
20140327959 | INFRARED REFLECTIVE FILM - To provide an infrared reflective film including a reflective layer and a protective layer laminated sequentially on one surface of a substrate, wherein the protective layer is a layer including a polymer including at least any two or more repeating units of the repeating units A, B and C in the following chemical formula I, and the indentation hardness of the protective layer is 1.2 MPa or more. | 11-06-2014 |
20150022879 | INFRARED REFLECTIVE FILM - Provided is an infrared reflective film in which a reflective layer and a protective layer are sequentially layered on one surface of a substrate. The protective layer contains a polymer, and the dynamic friction coefficient on the surface of the protective layer is 0.001 to 0.45. | 01-22-2015 |