Patent application number | Description | Published |
20090258497 | PHOTORESIST RESIN, AND METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING DISPLAY PANEL USING THE SAME - A photoresist resin composition, a method for forming a pattern and a method for manufacturing a display panel using the photoresist resin composition are disclosed. The photoresist resin composition includes an alkali soluble resin, a photoresist compound, and a solvent, wherein the alkali soluble resin includes a first polymer resin represented by the following Chemical Formula 1, wherein, of R | 10-15-2009 |
20100009482 | PHOTORESIST COMPOSITION, METHOD OF FORMING A METAL PATTERN, AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME - A photoresist composition includes 5% to 50% by weight of an alkali-soluble resin, 0.5% to 30% by weight of a quinone diazide compound, 0.1% to 15 % by weight of a curing agent, and a remainder of an organic solvent. A method of forming a metal pattern includes coating a photoresist composition on a base substrate having a metal layer, and forming a first photoresist film. The photoresist composition includes 5% to 50% by weight of an alkali-soluble resin, 0.5% to 30% by weight of a quinone diazide compound, 0.1% to 15% by weight of a curing agent, and a remainder of an organic solvent. The first photoresist film is patterned, and forms a first photo pattern. The base substrate having the first photo pattern is heated, and forms a first baked pattern. The metal layer is patterned using the first baked pattern, and forms a metal pattern. | 01-14-2010 |
20110097835 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME - A photoresist composition includes an alkali-soluble resin, a dissolution inhibitor including a quinone diazide compound, a first additive including a benzenol compound represented by the following Chemical Formula 1, a second additive including an acrylic copolymer represented by the following Chemical Formula 2 and an organic solvent. Accordingly, heat resistance of a photoresist pattern may be improved, and the photoresist pattern may be readily stripped. As a result, crack formation in the photoresist pattern may be reduced and/or prevented. | 04-28-2011 |
20110284853 | DISPLAY SUBSTRATE, AND METHOD OF MANUFACTURING THE SAME - A display substrate, a display device having the same and a method of manufacturing the display substrate are provided. The display substrate includes a base substrate having a pixels-populated area (PA) and a surrounding area (SA) outside the PA, a first contact pad portion formed in the surrounding area, a second contact pad portion formed in the surrounding area formed to be spaced apart from the first contact pad portion with a spacing region provided therebetween, an insulating layer formed in the spacing region between the first and second contact pad portions and having a thickness smaller than or equal to a thickness of each of the first and second contact pad portions, and a first conductive film formed on the first and second pad portions. | 11-24-2011 |
20120171793 | METHOD OF MANUFACTURING A DISPLAY SUBSTRATE - A method of manufacturing a display substrate includes forming a common electrode line, a gate line, a data line and a switching element connected to the gate and data lines on an insulation substrate. A first pixel electrode and an insulation layer are sequentially formed on the insulation substrate. A first photoresist pattern having a first hole and a second hole is formed from a first photoresist layer on the insulation substrate. A first transparent electrode layer is coated on the insulation substrate. A second photoresist layer is coated on the insulation substrate. The second photoresist layer is exposed and developed to form a second photoresist pattern remaining in the first hole and the second hole. The first transparent electrode layer is patterned using the second photoresist pattern, to form a second pixel electrode. | 07-05-2012 |
20120199838 | THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF - A manufacturing method of a thin film transistor array panel includes: simultaneously forming a gate conductor and a first electrode on a substrate, using a non-peroxide-based etchant; forming a gate insulating layer on the gate conductor and the first electrode; forming a semiconductor, a source electrode, and a drain electrode on the gate insulating layer; forming a passivation layer on the semiconductor, the source electrode, and the drain electrode; and forming a second electrode layer on the passivation layer. | 08-09-2012 |
20120242632 | DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME - A display apparatus includes a substrate and a plurality of pixels disposed on the substrate. Each pixel includes a gate electrode on the substrate, a common electrode insulated from the gate electrode on the substrate, a first insulating layer covering the gate electrode and the common electrode, a semiconductor pattern disposed on the first insulating layer to overlap with the gate electrode, source and drain electrodes disposed on the semiconductor pattern and spaced apart from each other, and a pixel electrode disposed on the first insulating layer to cover the drain electrode and form an electric field with the common electrode. The display apparatus may be manufactured by first to fourth photolithography processes using first to fourth masks, and the first mask may be a slit mask or a diffraction mask. | 09-27-2012 |
20130020591 | DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A display substrate includes first, second, and third insulating layers in a display area thereof. The first and third insulating layers are in not only the display area but also a pad area adjacent to the display area and including a pad therein. Thus, defects of the display panel may be reduced. | 01-24-2013 |
20130306974 | MANUFACTURING METHOD OF THIN FILM TRANSISTOR ARRAY PANEL - A manufacturing method of a thin film transistor array panel includes: simultaneously forming a gate conductor and a first electrode on a substrate, using a non-peroxide-based etchant; forming a gate insulating layer on the gate conductor and the first electrode; forming a semiconductor, a source electrode, and a drain electrode on the gate insulating layer; forming a passivation layer on the semiconductor, the source electrode, and the drain electrode; and forming a second electrode layer on the passivation layer. | 11-21-2013 |
20140183536 | THIN FILM TRANSISTOR PANEL AND METHOD FOR MANUFACTURING THE SAME - A thin film transistor array panel according to an exemplary embodiment of the present invention includes: an insulation substrate; a thin film transistor disposed on the insulation substrate, wherein the thin film transistor includes a first electrode; a first contact hole pattern having a first width, wherein the first contact hole pattern exposes a portion of the first electrode, and a first contact hole to expose the portion of the first electrode, wherein an inner sidewall of the first contact hole pattern constitutes a first portion of the first contact hole. | 07-03-2014 |
20140184972 | DISPLAY PANEL AND LIQUID CRYSTAL DISPLAY INCLUDING THE SAME - A display panel includes: a substrate including red, green, blue and white sub-pixel areas; red, green and blue color filter layers respectively in the red, green and blue sub-pixel areas; and a dummy color filter layer in the white sub-pixel area. The dummy color filter layer is adjacent to at least one of the red color filter layer, the green color filter layer, and the blue color filter layer, and the dummy color filter layer forms a step with the adjacent color filter layer. | 07-03-2014 |
20140191256 | THIN FILM TRANNSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF - Instead of forming contact holes the same way in both the non-image forming peripheral area (PA) and the image forming display area of a thin film transistor array panel, contact holes in the DA are formed to be substantially smaller than those in the PA for thereby improving an aperture ratio of the corresponding display device. In an exemplary embodiment, an inorganic gate insulating layer is not etched in the DA and only an inorganic first passivation layer among inorganic insulating layers positioned in the DA is etched to allow communication between the drain electrode and the corresponding field generating electrode. On the other hand, in the peripheral area, plural inorganic insulating layers such as the gate insulating laver, the first passivation laver, and the second passivation layer positioned on the gate wire and the data wire are simultaneously etched to form second contact holes and third contact holes exposing respective gate pads and data pads. | 07-10-2014 |
20140209915 | THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF - A thin film transistor (TFT) array panel and a manufacturing method thereof are disclosed. A contact hole may be formed to expose a pad disposed on a substrate of the TFT array panel. A first layer of a connecting member is formed with the same layer as a first field generating electrode and is disposed in the contact hole. A second passivation layer is disposed in the TFT array panel, but is removed at a region where the contact hole is formed and portions of the second passivation layer that cover the first layer of the connecting member. A second layer of the connecting member is formed on the first layer of the connecting member. | 07-31-2014 |
20140212809 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME - A photosensitive resin composition includes an acryl-based copolymer formed by copolymerizing unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, or a mixture thereof and an olefin-based unsaturated compound or a mixture of olefin-based unsaturated compounds, a photoinitiator represented by the following Chemical Formula 1 or 2, a multifunctional acrylate oligomer, a multifunctional monomer having an ethylenically unsaturated bond, and a melamine crosslinking agent. | 07-31-2014 |
20150061984 | DISPLAY PANEL AND DISPLAY APPARATUS INCLUDING THE SAME - A display apparatus includes a first substrate, a second substrate disposed on the first substrate, and a controllable layer disposed between the first and second substrates. The first substrate includes a pixel. The pixel includes a display region and a non-display region. The first substrate further includes: a transistor disposed in the non-display region; a protection layer disposed on and covering the transistor; a first electrode disposed on the protection layer; and a second electrode disposed on the first electrode, the second electrode being insulated from the first electrode and including a slit disposed in the display region. One of the first electrode and the second electrode is electrically connected to the transistor via a contact hole extending through the protection layer. The other of the first electrode and the second electrode is configured to receive a common voltage. The contact hole and the slit do not overlap one another. | 03-05-2015 |