Patent application number | Description | Published |
20080214409 | Substrate structure, oligomer probe array and methods for producing the same - Disclosed are substrate structures, an oligomer probe array and methods of producing the same. The substrate structure may include a substrate, and an intermediate film including the chemical structure represented by the following Formula 1, on the substrate. | 09-04-2008 |
20080305638 | Coating compositions for use in forming patterns and methods of forming patterns - A coating composition for forming etch mask patterns may include a polymer and an organic solvent. The polymer may have an aromatic ring substituted by a vinyl ether functional group. The polymer may be, for example, a Novolak resin partially substituted by a vinyl ether functional group or poly(hydroxystyrene) partially substituted by a vinyl ether functional group. | 12-11-2008 |
20090085072 | Biosensor using nanoscale material as transistor channel and method of fabricating the same - Example embodiments relate to a biosensor using a nanoscale material as a channel of a transistor and a method of fabricating the same. A biosensor according to example embodiments may include a plurality of insulating films. A first signal line and a second signal line may be interposed between the plurality of insulating films. A semiconductor nanostructure may be disposed on the plurality of insulating films, the semiconductor nanostructure having a first side electrically connected to the first signal line and a second side electrically connected to the second signal line. A plurality of probes may be coupled to the semiconductor nanostructure. A biosensor according to example embodiments may have a reduced analysis time. | 04-02-2009 |
20090131635 | Method for synthesizing polymer on substrate - For synthesizing a polymer, a substrate is placed within a reaction chamber, and a polymer synthesis sample is fed into the reaction chamber for forming the polymer on the substrate. In addition, the reaction chamber is shaken during formation of the polymer on the substrate within the reaction chamber for increased reaction yield. In addition, forming bubbles of the inactive gas in the polymer synthesis sample during formation of the polymer on the substrate further increases reaction yield. | 05-21-2009 |
20090137426 | MICROARRAY, SUBSTRATE FOR MICROARRAY AND METHODS OF FABRICATING THE SAME - A microarray, a substrate for a microarray and more productive methods of fabricating the microarray and the substrate are provided. The microarray includes a substrate divided into a first region and a second region; a plurality of linkers represented by formula 1 or 2: | 05-28-2009 |
20110059613 | MASK PATTERN FOR SEMICONDUCTOR DEVICE FABRICATION, METHOD OF FORMING THE SAME, AND METHOD OF FABRICATING FINELY PATTERNED SEMICONDUCTOR DEVICE - Provided are a mask pattern including a silicon-containing self-assembled molecular layer, a method of forming the same, and a method of fabricating a semiconductor device. The mask pattern includes a resist pattern formed on a semiconductor substrate and the self-assembled molecular layer formed on the resist pattern. The self-assembled molecular layer has a silica network formed by a sol-gel reaction. To form the mask pattern, first, the resist pattern is formed with openings on an underlayer covering the substrate to expose the underlayer to a first width. Then, the self-assembled molecular layer is selectively formed only on a surface of the resist pattern to expose the underlayer to a second width smaller than the first width. The underlayer is etched by using the resist pattern and the self-assembled molecular layer as an etching mask to obtain a fine pattern. | 03-10-2011 |
20120208723 | OLIGOMER PROBE ARRAY WITH IMPROVED SIGNAL-TO-NOISE RATIO AND DETECTION SENSITIVITY AND METHOD OF MANUFACTURING THE SAME - An oligomer probe array with improved signal-to-noise ratio and desired detection sensitivity even when a reduced design rule is employed includes a substrate, a plurality of probe cell active regions formed on or in the substrate, each of the plurality of probe cell active regions having a three-dimensional surface and being coupled with at least one oligomer probe with its own sequence, and a probe cell isolation region defining the probe cell active regions and having no functional groups for coupling with the oligomer probes on a surface. | 08-16-2012 |
Patent application number | Description | Published |
20090093625 | APPARATUS FOR AND METHOD OF SYNTHESIZING BIOPOLYMER AND METHOD OF RECOVERING REAGENT FOR SYNTHESIZING BIOPOLYMER - An apparatus for synthesizing a biopolymer includes a reaction chamber, an outlet tube connected to the reaction chamber, a plurality of recovery tanks connected to the outlet tube, and a plurality of recovery valves configured to open or block the passageway between the outlet tube and each of the recovery tanks. | 04-09-2009 |
20090111168 | BIOCHIP AND METHOD OF FABRICATION - A biochip and method of fabricating the same are provided. The biochip can include a substrate, a capping layer pattern partially covering a top surface of the substrate, and a plurality of probes coupled to the top surface of the substrate exposed by the capping layer pattern. | 04-30-2009 |
20090111169 | BIOCHIP AND METHOD OF FABRICATION - A biochip and method of fabricating the same are provided. The biochip can include a substrate, a plurality of active pads formed on the substrate, each of the plurality of active pads having a surface roughness and being patterned so as to produce photonic crystals, and a plurality of probes directly or indirectly coupled with at least some of the plurality of active pads. | 04-30-2009 |
20090117645 | Biochips and methods of fabricating the same - Biochips for analyzing components of a biological sample using probes and methods of fabricating the same are provided. In some embodiments, a biochip includes a substrate, a plurality of probes immobilized on a top surface of the substrate, and a capping layer formed on a bottom surface of the substrate. | 05-07-2009 |
20090263732 | MASK PATTERNS INCLUDING GEL LAYERS FOR SEMICONDUCTOR DEVICE FABRICATION - Mask patterns include a resist pattern and a gel layer on a surface of the resist pattern having a junction including hydrogen bonds between a proton donor polymer and a proton acceptor polymer. Methods of forming the mask patterns and methods of fabricating a semiconductor device using the mask patterns as etching masks are also provided. | 10-22-2009 |