| Patent application number | Description | Published |
|---|
| 20080237182 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - A substrate processing apparatus that can improve the uniformity of plasma processing carried out on a wafer. The wafer is housed in a chamber of the substrate processing apparatus and subjected to plasma processing using plasma produced in the processing chamber. A temperature control mechanism jets a high-temperature gas toward at least part of an annular focus ring facing the plasma. | 10-02-2008 |
| 20080240910 | TURBO-MOLECULAR PUMP, SUBSTRATE PROCESSING APPARATUS, AND METHOD FOR SUPPRESSING ATTACHMENT OF DEPOSITIONS TO TURBO-MOLECULAR PUMP - A turbo-molecular pump that enables reliable suppression of attachment of depositions onto component parts thereof. The turbo-molecular pump discharges a deposition-causing gas from a processing chamber. A rotor has a rotor shaft aligned with an exhaust stream. A cylindrical casing houses the rotor therein. A plurality of blade-form rotor blades projects from the rotor orthogonally with respect to the rotor shaft and are divided into a plurality of rotor blade groups. A plurality of blade-form stator blades projects orthogonally with respect to the rotor shaft from a rotor-facing surface and are divided into a plurality of stator blade groups. Gas supply ports are located on an upstream side of the rotor blade group that is located furthest downstream in the exhaust stream, and supply a deposition-suppressing gas which includes gas molecules having a large molecular weight. | 10-02-2008 |
| 20080273893 | SUBSTRATE TRANSFER MEMBER CLEANING METHOD, SUBSTRATE TRANSFER APPARATUS, AND SUBSTRATE PROCESSING SYSTEM - A substrate transfer member cleaning method that enables foreign matter attached to a substrate transfer member to be completely removed without bringing about a decrease in the throughput. A cleaning agent containing a cleaning substance in two phases of a vapor phase and a liquid phase and a high-temperature gas is jetted toward the substrate transfer member that transfers a substrate. | 11-06-2008 |
| 20080301972 | EVACUATION METHOD AND STORAGE MEDIUM - An evacuation method which can reduce evacuation time without causing moisture-related problems. In a vacuum processing apparatus including a vacuum processing chamber, during the evacuation for the vacuum processing chamber, the pressure in the vacuum processing chamber is maintained at a pressure lower than or equal to the atmospheric pressure but higher than or equal to 6.7×10 | 12-11-2008 |
| 20090028672 | SUBSTRATE TRANSFER MODULE AND SUBSTRATE PROCESSING SYSTEM - A substrate transfer module that can prevent corrosion of components, adhesion of particles to the substrate, and increases in the manufacturing cost and the size of the substrate transfer module. A substrate transfer module is connected to a substrate processing module. The substrate processing module implements desired processing on a substrate. A substrate transfer device transfers a substrate and includes a holding unit and a moving unit. The holding unit holds the substrate, and the moving unit moves the holding unit. A transfer chamber houses the substrate transfer device in an interior thereof that is isolated from an external atmosphere. An isolation device isolates at least the holding unit and the substrate held by the holding unit from an interior atmosphere of the transfer chamber. | 01-29-2009 |
