| Patent application number | Description | Published |
| 20090203227 | Film Formation method and apparatus for forming silicon-containing insulating film - A silicon-containing insulating film is formed on a target substrate by CVD, in a process field to be selectively supplied with a first process gas including di-iso-propylaminosilane gas and a second process gas including an oxidizing gas or nitriding gas. The film is formed by performing a plurality of times a cycle alternately including first and second steps. The first step performs supply of the first process gas, thereby forming an adsorption layer containing silicon on a surface of the target substrate. The second performs supply of the second process gas, thereby oxidizing or nitriding the adsorption layer on the surface of the target substrate. The second step includes an excitation period of supplying the second process gas to the process field while exciting the second process gas by an exciting mechanism. | 08-13-2009 |
| 20100081094 | MASK PATTERN FORMING METHOD, FINE PATTERN FORMING METHOD, AND FILM DEPOSITION APPARATUS - In a mask pattern forming method, a resist film is formed over a thin film, the resist film is processed into resist patterns having a predetermined pitch by photolithography, slimming of the resist patterns is performed, and an oxide film is formed on the thin film and the resist patterns after an end of the slimming step in a film deposition apparatus by supplying a source gas and an oxygen radical or an oxygen-containing gas. In the mask pattern forming method, the slimming and the oxide film forming are continuously performed in the film deposition apparatus. | 04-01-2010 |
| 20100319619 | OXIDATION METHOD AND APPARATUS FOR SEMICONDUCTOR PROCESS - In an oxidation method for a semiconductor process, target substrates are placed at intervals in a vertical direction within a process field of a process container. An oxidizing gas and a deoxidizing gas are supplied to the process field from one side of the process field while gas is exhausted from the other side. One or both of the oxidizing gas and the deoxidizing gas are activated. The oxidizing gas and the deoxidizing gas are caused to react with each other, thereby generating oxygen radicals and hydroxyl group radicals within the process field. An oxidation process is performed on the surfaces of the target substrate by use of the oxygen radicals and the hydroxyl group radicals. | 12-23-2010 |
| 20110151679 | FILM FORMATION METHOD FOR FORMING SILICON-CONTAINING INSULATING FILM - A silicon-containing insulating film is formed on a target substrate by CVD, in a process field to be selectively supplied with a first process gas including di-iso-propylaminosilane gas and a second process gas including an oxidizing gas or nitriding gas. The film is formed by performing a plurality of times a cycle alternately including first and second steps. The first step performs supply of the first process gas, thereby forming an adsorption layer containing silicon on a surface of the target substrate. The second performs supply of the second process gas, thereby oxidizing or nitriding the adsorption layer on the surface of the target substrate. The second step includes an excitation period of supplying the second process gas to the process field while exciting the second process gas by an exciting mechanism. | 06-23-2011 |
| Patent application number | Description | Published |
| 20100272989 | ELASTOMER POROUS MATERIAL AND METHOD OF PRODUCING THE SAME - In the elastomer porous material of the invention, when cells in a first observation region of a first cross section are observed at a certain magnification, cells having a shape factor SF1, which indicates the roundness of a circle and is represented by the following formula: | 10-28-2010 |
| 20100305225 | ELASTOMER POROUS MATERIAL AND METHOD OF PRODUCING THE SAME - In the elastomer porous material of the invention, when cells in a first observation region of a first cross section are observed at a certain magnification, cells having a shape factor SF | 12-02-2010 |
| 20100311851 | ELASTOMER POROUS MATERIAL AND METHOD OF PRODUCING THE SAME - In the elastomer porous material of the invention, when cells in a first observation region of a first cross section are observed at a certain magnification, cells having an aspect ratio a/b, wherein a represents the maximum diameter of each cell and b represents the length of the minor axis of that cell as measured in a direction orthogonal thereto, of 1.3 or less account for 70% or more of all cells in the first observation region, and, when cells in a second observation region of a second cross section orthogonal to the first cross section are observed at a certain magnification, cells having an aspect ratio a/b, wherein a represents the maximum diameter of each cell and b represents the length of the minor axis of that cell as measured in a direction orthogonal thereto, of 1.3 or less account for 70% or more of all cells in the second observation region. | 12-09-2010 |
| Patent application number | Description | Published |
| 20080198766 | NETWORK RECONFIGURATION METHOD AND ROUTER - Disclosed is a method for reconfiguring a network including a plurality of routers each having a redundant function. | 08-21-2008 |
| 20090201814 | COMMUNICATION CONTROL APPARATUS, COMMUNICATION CONTROL METHOD, RECORDING MEDIUM STORING COMMUNICATION CONTROL PROGRAM - A communication control apparatus has a setting unit for setting a receiving filter for discarding a broadcast frame received continuously not less than a predetermined threshold during a predetermined N number of time slots. | 08-13-2009 |
| 20100088764 | RELAY DEVICE AND RELAY METHOD - An apparatus relays packets transferred over a network and discards an attack packet detected among the packets. The apparatus includes: an inspection-packet outputting unit that outputs, when detecting the attack packet, an inspection packet in which a transmission-source address contained in the attack packet is set as a destination address and a destination address contained in the attack packet is set as a transmission-source address; a filter table storing unit that stores, when acquiring a response packet for the inspection packet, a transmission-source address, a destination address, and identification information of an interface, which has received the response packet, that are contained in the response packet, in a filter table in an associated manner; and a transfer control unit that determines whether to transfer a packet as a transfer object based on the filter table. | 04-08-2010 |
| 20100118710 | NETWORK FAILURE DETECTING METHOD AND DEVICE - A network failure detecting method for detecting a failure of a network including a number of transferring devices by tracing data flow rates of the transferring devices based on physical topologies of the transferring devices for the network, composing a group of the transferring devices adjacent to one another, data flow rates of which have failed to be obtained, as one virtual transferring device; and replacing physical topologies of the group of the transferring devices adjacent to one another, data flow rates of which have failed to be obtained, with a physical topology of the composed virtual transferring device. | 05-13-2010 |