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Jun Ogawa

Jun Ogawa, Nirasaki-Shi JP

Patent application numberDescriptionPublished
20090203227Film Formation method and apparatus for forming silicon-containing insulating film - A silicon-containing insulating film is formed on a target substrate by CVD, in a process field to be selectively supplied with a first process gas including di-iso-propylaminosilane gas and a second process gas including an oxidizing gas or nitriding gas. The film is formed by performing a plurality of times a cycle alternately including first and second steps. The first step performs supply of the first process gas, thereby forming an adsorption layer containing silicon on a surface of the target substrate. The second performs supply of the second process gas, thereby oxidizing or nitriding the adsorption layer on the surface of the target substrate. The second step includes an excitation period of supplying the second process gas to the process field while exciting the second process gas by an exciting mechanism.08-13-2009
20100081094MASK PATTERN FORMING METHOD, FINE PATTERN FORMING METHOD, AND FILM DEPOSITION APPARATUS - In a mask pattern forming method, a resist film is formed over a thin film, the resist film is processed into resist patterns having a predetermined pitch by photolithography, slimming of the resist patterns is performed, and an oxide film is formed on the thin film and the resist patterns after an end of the slimming step in a film deposition apparatus by supplying a source gas and an oxygen radical or an oxygen-containing gas. In the mask pattern forming method, the slimming and the oxide film forming are continuously performed in the film deposition apparatus.04-01-2010
20100319619OXIDATION METHOD AND APPARATUS FOR SEMICONDUCTOR PROCESS - In an oxidation method for a semiconductor process, target substrates are placed at intervals in a vertical direction within a process field of a process container. An oxidizing gas and a deoxidizing gas are supplied to the process field from one side of the process field while gas is exhausted from the other side. One or both of the oxidizing gas and the deoxidizing gas are activated. The oxidizing gas and the deoxidizing gas are caused to react with each other, thereby generating oxygen radicals and hydroxyl group radicals within the process field. An oxidation process is performed on the surfaces of the target substrate by use of the oxygen radicals and the hydroxyl group radicals.12-23-2010
20110151679FILM FORMATION METHOD FOR FORMING SILICON-CONTAINING INSULATING FILM - A silicon-containing insulating film is formed on a target substrate by CVD, in a process field to be selectively supplied with a first process gas including di-iso-propylaminosilane gas and a second process gas including an oxidizing gas or nitriding gas. The film is formed by performing a plurality of times a cycle alternately including first and second steps. The first step performs supply of the first process gas, thereby forming an adsorption layer containing silicon on a surface of the target substrate. The second performs supply of the second process gas, thereby oxidizing or nitriding the adsorption layer on the surface of the target substrate. The second step includes an excitation period of supplying the second process gas to the process field while exciting the second process gas by an exciting mechanism.06-23-2011

Patent applications by Jun Ogawa, Nirasaki-Shi JP

Jun Ogawa, Tokyo JP

Patent application numberDescriptionPublished
20100272989ELASTOMER POROUS MATERIAL AND METHOD OF PRODUCING THE SAME - In the elastomer porous material of the invention, when cells in a first observation region of a first cross section are observed at a certain magnification, cells having a shape factor SF1, which indicates the roundness of a circle and is represented by the following formula:10-28-2010
20100305225ELASTOMER POROUS MATERIAL AND METHOD OF PRODUCING THE SAME - In the elastomer porous material of the invention, when cells in a first observation region of a first cross section are observed at a certain magnification, cells having a shape factor SF12-02-2010
20100311851ELASTOMER POROUS MATERIAL AND METHOD OF PRODUCING THE SAME - In the elastomer porous material of the invention, when cells in a first observation region of a first cross section are observed at a certain magnification, cells having an aspect ratio a/b, wherein a represents the maximum diameter of each cell and b represents the length of the minor axis of that cell as measured in a direction orthogonal thereto, of 1.3 or less account for 70% or more of all cells in the first observation region, and, when cells in a second observation region of a second cross section orthogonal to the first cross section are observed at a certain magnification, cells having an aspect ratio a/b, wherein a represents the maximum diameter of each cell and b represents the length of the minor axis of that cell as measured in a direction orthogonal thereto, of 1.3 or less account for 70% or more of all cells in the second observation region.12-09-2010

Patent applications by Jun Ogawa, Tokyo JP

Jun Ogawa, Niigata-Ken JP

Patent application numberDescriptionPublished
20100289200Noncontact Rotating Processor - Provided is a noncontact apparatus for performing rotating process to a subject to be processed, without contaminating environment in an airtight container. A spin head (11-18-2010

Jun Ogawa, Kawasaki JP

Patent application numberDescriptionPublished
20080198766NETWORK RECONFIGURATION METHOD AND ROUTER - Disclosed is a method for reconfiguring a network including a plurality of routers each having a redundant function.08-21-2008
20090201814COMMUNICATION CONTROL APPARATUS, COMMUNICATION CONTROL METHOD, RECORDING MEDIUM STORING COMMUNICATION CONTROL PROGRAM - A communication control apparatus has a setting unit for setting a receiving filter for discarding a broadcast frame received continuously not less than a predetermined threshold during a predetermined N number of time slots.08-13-2009
20100088764RELAY DEVICE AND RELAY METHOD - An apparatus relays packets transferred over a network and discards an attack packet detected among the packets. The apparatus includes: an inspection-packet outputting unit that outputs, when detecting the attack packet, an inspection packet in which a transmission-source address contained in the attack packet is set as a destination address and a destination address contained in the attack packet is set as a transmission-source address; a filter table storing unit that stores, when acquiring a response packet for the inspection packet, a transmission-source address, a destination address, and identification information of an interface, which has received the response packet, that are contained in the response packet, in a filter table in an associated manner; and a transfer control unit that determines whether to transfer a packet as a transfer object based on the filter table.04-08-2010
20100118710NETWORK FAILURE DETECTING METHOD AND DEVICE - A network failure detecting method for detecting a failure of a network including a number of transferring devices by tracing data flow rates of the transferring devices based on physical topologies of the transferring devices for the network, composing a group of the transferring devices adjacent to one another, data flow rates of which have failed to be obtained, as one virtual transferring device; and replacing physical topologies of the group of the transferring devices adjacent to one another, data flow rates of which have failed to be obtained, with a physical topology of the composed virtual transferring device.05-13-2010

Patent applications by Jun Ogawa, Kawasaki JP

Jun Ogawa, Saitama-Shi JP

Patent application numberDescriptionPublished
20100078149HEAT EXCHANGER SUPPORTING STRUCTURE AND VEHICLE FRONT STRUCTURE - A heat exchanger supporting structure supports a heat exchanger (a radiator 04-01-2010

Jun Ogawa, Kyoto-Shi JP

Patent application numberDescriptionPublished
20090275092METHOD FOR PRODUCING 4-HYDROXY-L-ISOLEUCINE - A highly active L-isoleucine dioxygenase from 11-05-2009

Jun Ogawa, Souraku-Gun JP

Patent application numberDescriptionPublished
20090207943Semiconductor Circuit Device - A semiconductor circuit device is provided which can attain more stable operations against noise in a data communication system without increasing the power consumption of an overall system, thereby improving the reliability of data communication. For a demodulation baseband signal (S08-20-2009

Jun Ogawa, Kyoto JP

Patent application numberDescriptionPublished
20080269329Process for Production of Microbial Fat/Oil Containing Discretional Amount of Diacylglycerol and Said Fat/Oil - In a process for the production of diacylglycerol-containing fat/oil where the ratio of diacylglycerol to the total neutral lipid is more than 20% by weight and a polyunsaturated fatty acid is a constituting fatty acid, a process which is characterized in that a microbe being able to produce said fat/oil is incubated and, if desired, said fat/oil is collected.10-30-2008
20080297202SEMICONDUCTOR INTEGRATED CIRCUIT AND INFORMATION PROCESSING SYSTEM - In a semiconductor integrated circuit, a counter counts the number of high-speed clock signals that have been generated in a predetermined number of clock cycles of a low-speed clock signal. In synchronization with the low-speed clock signal, the semiconductor integrated circuit compares the counter value and a predetermined value, and judges whether the frequency of the high-speed clock signal has reaches a predetermined frequency. Since variations in the frequency become smaller as the oscillation of a high-speed oscillator stabilizes, the semiconductor integrated circuit detects that the oscillation is stable when the semiconductor integrated circuit has judged affirmatively a plurality of times.12-04-2008