| Patent application number | Description | Published |
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| 20110091289 | Implement for Processing, Particularly Sealing, Ground Surfaces Under Water, Particularly Bottoms and Embankments of Waterways, Particularly Canals, a Method for Setting Up the Same, a Method for Moving the Same, a Method for Sealing Ground Surfaces Using the Same, and the Like - A working apparatus for processing, especially sealing, underwater bed areas, especially banks and bottoms of waterways, especially canals, a process for setting up said apparatus, a process for moving said apparatus and uses of said apparatus are described. The working apparatus comprises a plurality of polygonal hollow pipes arranged in parallel side by side and at least substantially without gaps, the upper ends of which form a horizontal, at least substantially flat working platform, wherein each hollow pipe has on its outer wall at least one projection extending substantially horizontally with a flange disposed on its outer end and extending vertically and at least one corresponding flange insertion aperture with a slot immediately above it which runs vertically and extends as far as the upper end of the hollow pipe, the flange insertion aperture being disposed further away from the upper end of the hollow pipe than the projection with the flange and being of greater horizontal dimensions than the slot, and wherein neighbouring hollow pipes are in engagement with one another via a respective projection on one of the hollow pipes with a corresponding slot in the other of the hollow pipes, such that the hollow pipes cannot be moved relative to one another in the horizontal direction and only at the outer edge of the working platform can at least one hollow pipe be pulled out individually in the vertically upward direction. | 04-21-2011 |
| Patent application number | Description | Published |
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| 20080212211 | IMMERSION LITHOGRAPHY OBJECTIVE - An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis. | 09-04-2008 |
| 20090002668 | Method and Device for Controlling a Plurality of Actuators and an Illumination Device for Lithography - The present invention relates to a method and a device for controlling multiple actuators with a controller and multiple actuators controllable by the controller. At least several groups of actuators are individually controllable by the controller and to each actuator or each group of actuators is assigned at least one memory storage unit, which can store at least one parameter for controlling one or more actuators. At least two parameters are assigned to each actuator or each group of actuators, with one position of the actuator(s) being assigned to each of the parameters. | 01-01-2009 |
| 20090040487 | IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY - An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis. | 02-12-2009 |
| 20090141258 | Imaging Device in a Projection Exposure Machine - An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part. | 06-04-2009 |
| 20100060873 | ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS - An illumination system for illuminating a mask in a microlithographic exposure apparatus has an optical axis and a pupil surface. The system can include an array of reflective or transparent beam deflection elements such as mirrors. Each deflection element can be adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements can be arranged in a first plane. The system can further include an optical raster element, which includes a plurality of microlenses and/or diffractive structures. The beam deflection elements), which can be arranged in a first plane, and the optical raster element, which can be arranged in a second plane, can commonly produce a two-dimensional far field intensity distribution. An optical imaging system can optically conjugate the first plane to the second plane. | 03-11-2010 |
| 20110235012 | PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY FOR THE PRODUCTION OF SEMICONDUCTOR COMPONENTS - A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus. | 09-29-2011 |
| 20110267596 | GRAVITATION COMPENSATION FOR OPTICAL ELEMENTS IN PROJECTION EXPOSURE APPARATUSES - A gravitation compensator for mounting optical elements in a projection exposure apparatus and a corresponding projection exposure apparatus are disclosed. The gravitation compensator at least partly compensates for the weight force of a mounted optical element and simultaneously enables a change in the position of the optical element without the compensated weight force being altered in an impermissible manner during the change in position. This applies, in particular, to high weight forces which are to be compensated. Furthermore, the gravitation compensator enables use in different atmospheres and the compensation of corresponding aging effects. | 11-03-2011 |
